The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft.

Cleaning compositions, which are typically self-adhering in gel form upon application to a hard surface, and which are desirably capable of being applied in aerosol form, are provided. The aqueous-based cleaning compositions include an adhesion promoter, which typically includes one or more organic molecules, each containing at least one hydrophilic group; and an anionic, nonionic, cationic, amphoteric and/or zwitterionic surfactant; and (c) a propellant. In many embodiments, the aqueous-based composition and propellant are contained within a single compartment of a dispensing device.

This invention relates to compositions, methods and systems having utility in numerous applications, and in particular, uses for compositions containing the compound cis-1,1,1,4,4,4-hexafluoro-2-butene (Z-HFO-1336mzzm), which has the following structure:

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A cleaning composition includes a peroxide, an inorganic stabilizer, and a liquid carrier, and has a pH of greater than or equal to 8. Also disclosed is a coating including the cleaning composition. A method of cleaning a substrate includes applying the cleaning composition to at least a portion of a substrate in an amount effective to form a coating from the cleaning composition, and removing at least a portion of the coating from the substrate.

A method for producing a cleaning agent composition for use in removal of, for example, a polysiloxane adhesive. The composition contains a quaternary ammonium salt, an etching rate enhancer formed of an amphoteric surfactant, and an organic solvent.

A windshield cleaning composition for freshening air in a vehicle using a windshield washing system of the vehicle includes a windshield cleaning composition. The windshield cleaning composition comprises a solution that is to be added to a wiper fluid reservoir of a vehicle. The solution comprises water, a cleaning agent, an antifreeze agent, and an aroma compound. Dispensing of the solution onto a windshield of the vehicle positions the aroma compound to be drawn into a passenger compartment of the vehicle by a heating, cooling, and air conditioning system (HVACS) of the vehicle, thereby freshening the air of the vehicle.

Proposed is a process liquid composition for improving a lifting defect level of a photoresist pattern containing a surfactant and for reducing the number of defects of the photoresist pattern, the composition containing a surfactant and having a surface tension of 40 mN/m or less and a contact angle of 60 or smaller in the photoresist pattern having hydrophobicity represented by a contact angle of 70 or greater of water with respect to a photoresist surface in a photoresist pattern process.

An object is to provide a hydrofluoroolefin-based or hydrochlorofluoroolefin-based azeotropic or azeotropic-like composition. The azeotropic or azeotropic-like composition contains trans-1-chloro-3,3,3-trifluoropropene and 1-chloro-1,3,3,3-tetrafluoropropene. In the azeotropic or azeotropic-like composition, 1-chloro-1,3,3,3-tetrafluoropropene exists in an effective amount to form an azeotropic or azeotropic-like mixture with trans-1-chloro-3,3,3-trifluoropropene.

The invention provides compositions useful in post-CMP cleaning operations where ceria is present. In one aspect, the invention provides a composition comprising a reducing agent; a chelating agent; an amino(C.sub.6-C.sub.12 alkyl)alcohol; and water; wherein the composition has a pH of less than about 8. The compositions of the invention were found to show improved ceria removal on, for example, poly silicon (poly Si) substrates. Also provided is a method for cleaning a microelectronic device substrate using such compositions and a kit comprising, in one or more containers, selected components of the compositions.

The present disclosure relates to a process solution composition for polymer treatment comprising: a fluorine compound; a ketone-based solvent; and a polar aprotic solvent, wherein the ketone-based solvent is one or more selected from the group consisting of compounds represented by Chemical Formula 1 or Chemical Formula 2, and has an effect capable of preventing damage to various types of metals while improving the power of removing an adhesive polymer remaining on the wafer circuit surface in a semiconductor manufacturing process.