Disclosed is a composition for removing polymers. The composition contains a fluorinated alkyl compound, a polar aprotic solvent, and an acyclic secondary or tertiary amine compound.

A composition includes a compound having structural formula (I): Rf—S—Rh (I) wherein (i) Rf is a partially fluorinated or perfluorinated group having 2 to 6 carbon atoms and optionally comprises one or more catenated heteroatoms, and (ii) Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms and optionally comprises one or more catenated heteroatoms. The composition further includes an organic lubricant contaminant.

The present disclosure relates to a process solution composition for polymer treatment comprising: a fluorine compound; a ketone-based solvent; and a polar aprotic solvent, wherein the ketone-based solvent is one or more selected from the group consisting of compounds represented by Chemical Formula 1 or Chemical Formula 2, and has an effect capable of preventing damage to various types of metals while improving the power of removing an adhesive polymer remaining on the wafer circuit surface in a semiconductor manufacturing process.

A cleaning composition for post-etch or post ash residue removal from a substrate used in semiconductor industry and a corresponding use of said cleaning composition is described. Further described is a process for the manufacture of a semiconductor device from a semiconductor substrate, comprising the step of post-etch or post ash residue removal from a substrate by contacting the substrate with a cleaning composition according to the invention.

The present application provides processes and intermediates for preparing (E)-1,1,1,4,4,4-hexafluoro-2-butene and compositions which may be useful in applications including refrigerants, high-temperature heat pumps, organic Rankine cycles, as fire extinguishing/fire suppression agents, propellants, foam blowing agents, solvents, and/or cleaning fluids.

A composition, kit and method useful in a multi-stage washing method for cleaning an aluminum or aluminum alloy containers while reducing hazardous exposure of workers to toxic levels of hydrogen fluoride or ammonium bifluoride employs a stable, neutralized ammonium bifluoride-containing accelerator solution for addition to an acidic wash solution.

There is provided a water-soluble film containing polyvinyl alcohol resin, wherein the ratio of fluorine element to the total amount of elements (F1S) found at the time of analyzing a first surface of the water-soluble film through X-ray Photoelectron Spectroscopy is 1 mol % or greater and 25 mol % or less; and ratio of the fluorine element to the total amount of elements (F1B) found at the time of analyzing a surface 0.1 μm deep from the first surface through X-ray Photoelectron Spectroscopy is 0.5 mol % or less. As a result, a water-soluble film having excellent detachability from the support, as well as excellent transparency and sealing property, and a packaging body for chemicals may be provided using this film.

A cleaning composition for post-etch or post ash residue removal from a substrate used in semiconductor industry and a corresponding use of said cleaning composition is described. Further described is a process for the manufacture of a semiconductor device from a semiconductor substrate, comprising the step of post-etch or post ash residue removal from a substrate by contacting the substrate with a cleaning composition according to the invention.

Described herein is a fluorinated diaminoolefin of formula (I) (R.sub.f.sup.1CF.sub.2)(R.sub.f.sup.2)NCH.sub.2CH═CHCH.sub.2N(R.sub.f.sup.4)(CF.sub.2R.sub.f.sup.3) where: R.sub.f.sup.1 and R.sub.f.sup.3, are independently selected from F, a linear or branched perfluorinated alkyl group comprising 1-7 carbon atoms, or a linear or branched perfluorinated alkyl group comprising 1-7 carbon atoms comprising at least one catenated atom selected from O, N, S or combinations thereof; and R.sub.f.sup.2 and R.sub.f.sup.4 are independently selected from a linear or branched perfluorinated alkyl group comprising 1-7 carbon atoms, or a linear or branched perfluorinated alkyl group comprising 1-7 carbon atoms comprising at least one catenated atom selected from O, N, S or combinations thereof or at least one of (i) R.sub.f.sup.1CF.sub.2 and R.sub.f.sup.2 and (ii) R.sub.f.sup.3CF.sub.2 and R.sub.f.sup.4 are bonded together to form a fluorinated ring structure comprising 4-8 carbon atoms and optionally comprising at least one catenated atom selected from O, N, S or combinations thereof.

A detergent composition for dry cleaning is disclosed. The detergent composition for dry cleaning includes a) 5 to 10% by weight of a fluorinated (fluoro-based) solvent, b) 1 to 2% by weight of a cleaning booster, c) 5 to 10% by weight of an anti-shrinkage agent, d) 40 to 50% by weight of a water-soluble solvent, and e) 30 to 40% by weight of water.