Provided are: a novel compound that has excellent activity of dissolving a silicone compound and thereby solubilizing the silicone compound in an organic solvent; and a cleaner that contains the compound and can completely and rapidly remove the silicone compound deposited/remained on a mold and/or a molded article obtained using the mold. The novel compound is represented by Formula (1). The silicone-dissolvative cleaner contains (A) a silicone surfactant represented by Formula (1); and (B) an organic solvent. Formula (1) is expressed as follows:

##STR00001##

wherein A represents an ionic group selected from the group consisting of a sulfonic ion, a carboxylic ion, and a quaternary ammonium cation; and B represents a counter-ion to A and is selected from an alkali metal ion and a halide ion.

Provided is a cleaning solution used for cleaning an ink containing a resin in an amount of 5 percent by mass or greater, the cleaning solution including a mixture solvent containing water and a solvent, wherein a hydrogen bond term of a Hansen solubility parameter of the mixture solvent is 7.0 (cal/cm.sup.3).sup.1/2 or less.

Hard surface, in particular glass, cleaners having an ease in wipe-out while providing good cleaning with a streak-free, glossy shine are described. The cleaner includes at least one fluorosurfactant including a fluorinated functional group with 2 to 6 carbon atoms, and a hydrophilic moiety; at least one non-fluorinated surfactant; a combination of solvents; a combination of cleaning agents; and water.

The present application provides tertiary azeotrope or azeotrope-like compositions comprising trans-dichloroethylene and two additional components. Methods of using the compositions provided herein in cleaning, defluxing, deposition, and carrier fluid applications are also provided.

This application provides azeotropic and near-azeotropic compositions of Z-1233zd and a second component selected from the group consisting of Z-1336mzz, Isopentane, E-1438ezy, E-1233zd and HBFO-1233xfB. The inventive compositions are useful as aerosol propellants, refrigerants, cleaning agents, expansion agents for thermoplastic and thermoset foams, solvents, heat transfer media, gaseous dielectrics, fire extinguishing and suppression agents, power cycle working fluids, polymerization media, particulate removal fluids, carrier fluids, buffing abrasive agents, and displacement drying agents. The compositions were modeled based on Vapor-Liquid Equilibria data such as those of the Z-1233zd/Isopentane system shown in FIG. 3.

The present invention relates to an etching composition and a method of producing a MXene. The etching composition of the present invention can stably and quickly produce a MXene at high temperature. The etching composition of the present invention can produce a MXene in high yield. The etching composition of the present invention can easily produce various types of MXenes. A method using the etching composition of the present invention can produce a MXene having excellent electrochemical and mechanical properties.

A composition, kit and method useful in a multi-stage washing method for cleaning an aluminum or aluminum alloy containers while reducing hazardous exposure of workers to toxic levels of hydrogen fluoride or ammonium bifluoride employs a stable, neutralized ammonium bifluoride-containing accelerator solution for addition to an acidic wash solution.

The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft.

Disclosed are the use of fluorine substituted olefins, including tetra- and penta-fluoropropenes, in a variety of applications, including in methods of depositing catalyst on a solid support, methods of sterilizing articles, cleaning methods and compositions, methods of applying medicaments, fire extinguishing/suppression compositions and methods, flavor formulations, fragrance formulations and inflating agents.

A pre-fill solution for application onto a substrate surface prior to a fill operation is provided, the fill operation defined by application of an electroless deposition solution onto the substrate surface to deposit a metallic material in an etched feature, the substrate surface having metallic contaminants generated from an etch operation that generated the etched feature in the substrate surface, the pre-fill solution effective for preventing the electroless deposition solution from depositing on the metallic contaminants, the pre-fill solution comprising: a surfactant, the surfactant configured to enhance wetting of the substrate surface, the concentration of the surfactant in the solution being approximately in the range of 10 ppm to 2000 ppm, wherein the surfactant is an amphoteric surfactant; oxalic acid dihydrate; and hypophosphorous acid as a pH adjusting agent configured to reduce the pH of the solution to approximately less than 2 during the application onto the substrate surface.