The present invention relates to an active substance wafer and methods for producing such an active substance wafer. Further, the present invention relates to the use of such an active substance wafer as/in a laundry care agent, a hand laundry washing agent or a dishwashing agent and to a product selected from these agents consisting or comprising an active substance wafer.

The present invention relates to an active substance wafer and methods for producing such an active substance wafer. Further, the present invention relates to the use of such an active substance wafer as/in a laundry care agent, a hand laundry washing agent or a dishwashing agent and to a product selected from these agents consisting or comprising an active substance wafer.

A composition may include microcapsules containing at least one odor-neutralizing agent, and agents may include such a composition. Furthermore, such compositions or agents may reduce malodors and/or be used for treating a surface, for treating room air, or for washing and/or caring for textiles using such compositions or agents.

A composition may include microcapsules containing at least one odor-neutralizing agent, and agents may include such a composition. Furthermore, such compositions or agents may reduce malodors and/or be used for treating a surface, for treating room air, or for washing and/or caring for textiles using such compositions or agents.

An antimicrobial cleaning composition having a pH of from about 9 to about 14 wherein the composition comprises a bispyridinium alkane antimicrobial active and the composition is substantially free of a quaternary ammonium antimicrobial active.

An antimicrobial cleaning composition having a pH of from about 9 to about 14 wherein the composition comprises a bispyridinium alkane antimicrobial active and the composition is substantially free of a quaternary ammonium antimicrobial active.

A cleaning composition having an aqueous solutions containing amino carboxylic acid chelators comprising (a) trans-1,2-diaminocyclohexane-N,N,N′,N′-tetraacetic acid monohydrate or salt thereof or (b) iminodiacetic acid or salt thereof may be used as an alternative for phosphates, NTA, and/or EDTA. The cleaning composition is used in industrial, commercial, or residential settings.

A cleaning composition having an aqueous solutions containing amino carboxylic acid chelators comprising (a) trans-1,2-diaminocyclohexane-N,N,N′,N′-tetraacetic acid monohydrate or salt thereof or (b) iminodiacetic acid or salt thereof may be used as an alternative for phosphates, NTA, and/or EDTA. The cleaning composition is used in industrial, commercial, or residential settings.

The present invention provides a cleaning liquid for a semiconductor substrate that has been subjected to CMP, in which the cleaning liquid has an excellent selectivity for RuO.sub.2 removing performance; and a method for cleaning a semiconductor substrate that has been subjected to CMP. The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a perhalogen acid and a halogen acid.

The present invention relates to the use of a carboxylic-acid-containing cleaning agent for removing stains of vegetable origin and/or for decontaminating surfaces contaminated by plant-protection agents. The agent comprises 20-60 wt. % of an aliphatic C.sub.1-C.sub.10 carboxylic acid, preferably formic acid, or a mixture of two or more of such aliphatic carboxylic acids which preferably comprises formic acid, at least one surfactant, preferably an anionic surfactant and/or at least one non-ionic surfactant, and water and/or solvent as the remainder. In another aspect, the present invention relates to specific carboxylic-acid-containing cleaning agents for hard surfaces, which agents are particularly suitable for the intended use.