The present invention relates to the use of a carboxylic-acid-containing cleaning agent for removing stains of vegetable origin and/or for decontaminating surfaces contaminated by plant-protection agents. The agent comprises 20-60 wt. % of an aliphatic C.sub.1-C.sub.10 carboxylic acid, preferably formic acid, or a mixture of two or more of such aliphatic carboxylic acids which preferably comprises formic acid, at least one surfactant, preferably an anionic surfactant and/or at least one non-ionic surfactant, and water and/or solvent as the remainder. In another aspect, the present invention relates to specific carboxylic-acid-containing cleaning agents for hard surfaces, which agents are particularly suitable for the intended use.

A wash fluid for use in an inkjet recording apparatus contains water, a coconut oil fatty acid surfactant, an organic deliquescent agent, a polyhydric alcohol, and a basic inorganic compound. The polyhydric alcohol is an alkanediol. The coconut oil fatty acid surfactant is contained in an amount of at least 0.01% by mass and no greater than 3.00% by mass. The organic deliquescent agent is contained in an amount of at least 0.10% by mass and no greater than 30.00% by mass.

The need for an acidic liquid hard surface cleaning composition which provides improved removal of grease residues, while still being effective at removing limes-scale, is met by formulating an acidic liquid hard surface cleaning composition with an alkyl pyrrolidone, and additional nonionic surfactant selected from the group consisting of: alkoxylated nonionic surfactant, alkyl polyglucoside, and mixtures thereof, while limiting the amount of anionic surfactant present.

The need for an acidic liquid hard surface cleaning composition which provides improved removal of grease residues, while still being effective at removing limes-scale, is met by formulating an acidic liquid hard surface cleaning composition with an alkyl pyrrolidone, and additional nonionic surfactant selected from the group consisting of: alkoxylated nonionic surfactant, alkyl polyglucoside, and mixtures thereof, while limiting the amount of anionic surfactant present.

Fabric treatment compositions that include benefit agent capsules and biphenyl brightener. Methods of using the same. Wash water that includes such compositions.

Fabric treatment compositions that include benefit agent capsules and biphenyl brightener. Methods of using the same. Wash water that includes such compositions.

The present disclosure provides a laundry care composition having at least one laundry care ingredient and at least one leuco composition conforming to Formula (I):
Ar.sup.1Ar.sup.2Ar.sup.3CH  (I)
wherein Ar.sup.2 and Ar.sup.3 are independently a carbocyclic aryl or heteroaryl, and Ar.sup.1 is selected from the group consisting of: unsubstituted phenyl, electron deficient carbocyclic aryl, and heteroaryl. The present disclosure also provides a method of determining an authentic laundry care composition and test kits for detecting authentic laundry care compositions.

The present disclosure provides a laundry care composition having at least one laundry care ingredient and at least one leuco composition conforming to Formula (I):
Ar.sup.1Ar.sup.2Ar.sup.3CH  (I)
wherein Ar.sup.2 and Ar.sup.3 are independently a carbocyclic aryl or heteroaryl, and Ar.sup.1 is selected from the group consisting of: unsubstituted phenyl, electron deficient carbocyclic aryl, and heteroaryl. The present disclosure also provides a method of determining an authentic laundry care composition and test kits for detecting authentic laundry care compositions.

An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a method for cleaning a semiconductor substrate.

The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a component A having two or more onium structures in a molecule, and water, and has a pH of 7.0 to 11.8 at 25° C.

An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a method for cleaning a semiconductor substrate.

The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a component A having two or more onium structures in a molecule, and water, and has a pH of 7.0 to 11.8 at 25° C.