The present disclosure relates to a cleaning liquid composition and a cleaning method using the same. A polishing slurry composition according to an embodiment of the present disclosure includes: a chelating agent containing an organic salt; and an anionic surfactant.

The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 300° F.) but also shows enhanced cleaning at ambient temperatures.

A stabilized antifoaming composition having at least three components. The first component is an antifoaming agent. The second component is an ethylene-(meth)acrylic acid copolymer. The third component is a salt.

The invention includes a solid rinse aid that is particularly designed for extrusion solid formation and which is effective for creating spotless surfaces after rinsing. According to the invention, application has identified the critical combination of solid surfactants, coupling agents, hydrotrope, and hardening agents that is acceptable in the extrusion process to create a solid. The hydrotrope includes one or more short-chain alkylbenzene and/or alkyl naphthalene sulfonates. The composition hardens quickly but not so quick as to negatively impact the extrusion process. The compositions may also be used to form pressed or cast solids.

The present invention relates to a pearly liquid detergent composition comprising a thickener, a pearlescent agent and perfume capsules. The present invention further relates to a method for cleaning textiles using such a pearly liquid detergent composition.

Stabilized hydrogen peroxide-containing compositions and methods of making same are disclosed. The compositions contain a stabilizer system made up of a disulfonate surfactant, a diester solvent, and a sulfonic acid or a salt thereof in a sufficient quantity to provide the stabilized hydrogen peroxide with an acidic pH value. The compositions are suitable for use as disinfectants, as cleaning agents, and in various personal care applications such as hair care and tooth whitening.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

The present invention herein provides a disinfectant composition containing a) an effective amount of a hydrogen peroxide source, b) a blend of at least one aromatic alcohol and at least one glycol or glycol ether, c) at least one nonionic and/or anionic surfactant and d) at least one acid. Furthermore a method of using the disinfectant composition is also provided, whereby the composition can be applied to any surface and effectively kill a majority of tuberculosis and/or M. terrae microbes; resulting in a >5 log reduction at a contact time of 5 minutes or less.

The present disclosure relates to a process solution for polymer processing, containing a polar aprotic solvent, a fluorine-based compound, and a sulfur-containing compound. The process solution for polymer processing may have excellent storage stability and minimize damage to the metal layer while improving an ability to remove the adhesive polymer remaining on a circuit surface of a semiconductor wafer.

A cooling agent composition contains a 2,2,6-trimethylcyclohexanecarboxylic acid derivative represented by the following general formula (1). The symbol * represents an asymmetric carbon atom. X represents NH, N(ZAr.sup.2), O or S, Z represents a single bond or an alkylene group having 1 to 3 carbon atoms which may have a substituent, Ar.sup.2 represents an aryl group having 6 to 20 carbon atoms which may have a substituent or an aromatic heterocyclic group having 2 to 15 carbon atoms which may have a substituent. Y each independently represents a methylene group which may have a substituent, and n represents an integer of 0 to 3. Ar.sup.1 represents an aryl group having 6 to 20 carbon atoms which may have a substituent or an aromatic heterocyclic group having 2 to 15 carbon atoms which may have a substituent. ##STR00001##