The present disclosure provides liquid and unit dose laundry detergent compositions. Provided herein is a laundry detergent composition including: (a) at least one anionic surfactant, (b) at least one non-ionic surfactant, (c) at least one cationic cellulosic polymer, (d) at least one dye transfer inhibitor polymer, (e) at least one anti-redeposition polymer, and (f) water. The present disclosure also provides a unit dose laundry detergent product including: a water-soluble polymeric film; a detergent composition encapsulated by the water-soluble polymeric film, the detergent composition including: (a) at least one anionic surfactant, (b) at least one non-ionic surfactant, (c) at least one cationic cellulosic polymer, (d) at least one dye transfer inhibitor polymer, (e) at least one anti-redeposition polymer, and (g) water. Methods of making and using the disclosed laundry detergent compositions are also provided.

The present disclosure provides a polyetheramine alkoxylate compound containing aromatic groups in the hydrophobe allowing the compound to exhibit unique functionality, high performance and low cost, but without the toxicity and/or skin and eye irritation problems associated with conventional polyetheramine compounds.

The present disclosure provides a laundry care composition having at least one laundry care ingredient and at least one leuco composition conforming to Formula (I):
Ar.sup.1Ar.sup.2Ar.sup.3CH  (I)
wherein Ar.sup.2 and Ar.sup.3 are independently a carbocyclic aryl or heteroaryl, and Ar.sup.1 is selected from the group consisting of: unsubstituted phenyl, electron deficient carbocyclic aryl, and heteroaryl. The present disclosure also provides a method of determining an authentic laundry care composition and test kits for detecting authentic laundry care compositions.

An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a method for cleaning a semiconductor substrate.

The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a component A having two or more onium structures in a molecule, and water, and has a pH of 7.0 to 11.8 at 25° C.

The present invention provides: a cleaning liquid for semiconductor substrates having undergone CMP, the cleaning liquid being excellent in temporal stability and cleaning performance; and a method of cleaning such semiconductor substrates. A cleaning liquid of the invention contains: a first amine compound which is represented by Formula (1) and whose conjugated acid has a first acidity constant of not less than 8.5; and a second amine compound (provided that the first amine compound is excluded). The mass ratio of the first amine compound content to the second amine compound content is 1 to 100, and the cleaning liquid has pH of 6.0-12.0 at 25° C.

##STR00001##

Novel methods and compositions for treating textiles and other materials are disclosed in which persistent odor or other symptoms of biofilm presence can be reduced through the use of compositions comprising N-acetyl cysteine or other agents in combination with certain enzymes.

Self-invertible inverse latex including as an inverting agent for surfactant species of the alkylpolyglycoside family, the alkyl chain of which includes from 8 to 18 carbon atoms, and use thereof as thickener and/or emulsifier and/or stabilizer for a detergent or cleaning formulation for industrial or household use.

Solid rinse aid compositions, methods of use, and methods of making said composition are disclosed. Rinse aid is provided by a solidification agent, a sheeting agent, a defoamer component, and a polyacrylic acid homopolymer or alkali metal salt thereof forming a solid composition. Preferred solidification agents include aromatic sulfonates. Preferred sheeting agents include one or more alcohol ethoxylates. Preferred defoamer components include a polymer compound including one or more ethylene oxide groups. The solid rinse aid compositions are preferably substantially free of sulfate and sulfate-containing compounds.

The present invention relates to treatment compositions containing polymer systems that provide stability and benefit agent deposition as well as methods of making and using same. Such treatment compositions may be used for example as through the wash and/or through the rinse fabric enhancers as well as unit dose treatment compositions.

Solid rinse aid compositions, methods of use, and methods of making said composition are disclosed. Rinse aid is provided by a solidification agent, a sheeting agent, a defoamer component, and a polyacrylic acid homopolymer or alkali metal salt thereof forming a solid compositions. Preferred solidification agents include aromatic sulfonates. Preferred sheeting agents include one or more alcohol ethyoxylates. Preferred defoamer components include a polymer compound including one or more ethylene oxide groups. The solid rinse aid compositions are preferably substantially free of sulfate and sulfate-containing compounds.