Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.

A metal cleanser composition includes: (A) at least one carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and a neutral salts thereof; (B) a specific oxyalkylene group-containing compound; and (C) at least one compound selected from the group consisting of a specific organic phosphonic acid and a salt thereof, and a specific nitrogen-containing heterocycle-containing compound.

The present disclosure is directed to wipes that include aqueous compositions and methods for coating, particularly protecting and optionally cleaning, surfaces, particularly metallic surfaces.

The present invention relates to improved ophthalmic solutions that employ select B vitamins; pyridoxine and its salts; and thiamine and its salts in order to more effectively preserve solutions and to reduce the degree to which cationic preservatives will deposit on contact lenses. Ophthalmic solutions are here understood to include contact lens treatment solutions, such as cleaners, soaking solutions, conditioning solutions and lens storage solutions, as well as wetting solutions and in-eye solutions for treatment of eye conditions.

The invention pertains to degreasing compositions, process for producing and uses thereof. The composition comprises: from about 4% to about 16% by weight of the composition of a first anionic surfactant having HLB value less than 12; from about 1% to about 5% by weight of the composition of a second anionic surfactant having HLB value more than 12; from about 1% to about 4% by weight of the composition of a weak acid; from about 2% to about 6% by weight of the composition of urea; from about 1% to about 5% by weight of the composition of trisodium phosphate; about 1% to about 4% of the composition, of an inorganic base; and from about 60% by weight to about 90% by weight of the composition of water.

A wet wipe with a substrate having cellulosic fibers and a lotion is provided. The lotion may have between about 96.0% and about 99.5%, by weight of the lotion, of water. The lotion may have a preservative system having benzoic acid and/or a salt thereof, succinic acid and/or a salt thereof, and phytic acid and/or a salt thereof. The lotion may also have a surfactant, pH buffering system, and a pH of about 3.5 to about 5.

A multiuse, high efficiency and environment-friendly cleaning solution and preparation method therefor, the cleaning solution comprising the following components: sodium polyacrylate, surface active agent and deionized water. The surface active agent comprises a combination of any two or more of alkyl-polyoxyethylene ether acetate, plant polyenoid phenol polyoxyethylene ether or laurinol polyoxyethylene ether. The cleaning solution has a wide range of cleaning uses, and may exhibit a good cleaning effect when applied in multiple fields.

Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.

A composition for use in recycled food and beverage containers is disclosed. A mixture of a strong sequestrant, a weak sequestrant, a polymer, an antiscalant and a surfactant is disclosed. Methods directed to using the composition are also disclosed. A composition that cleans and also reduces the defects present on the external surface of containers during a wash cycle is disclosed. The composition may or may not have metallic salts.

A sanitizing formulation for removing contaminated residue from metal, glass, porcelain, polymeric and textile surfaces includes a non-ionic surfactant; water soluble preservative; pH reducer, chelating agent; glycerin; water; and optionally an edible fragrance. Optionally, the exemplary formulation includes from about 2.7 to about 3.3 wt. % isopropyl alcohol, or about 3 wt. %. Optionally, the surfactant is selected from the group consisting of sodium benzoate and potassium sorbate. In another exemplary embodiment, convenient wipes are provided that are impregnated with the formulation.