Described herein is an enzyme preparation including component (a): at least one compound according to general formula (I)

##STR00001## wherein R.sup.1 is H; R.sup.2, R.sup.3, R.sup.4 are independently from each other selected from the group consisting of H, linear C.sub.1-C.sub.8 alkyl, and branched C.sub.3-C.sub.8 alkyl, C.sub.6-C.sub.10-aryl, non-substituted or substituted with one or more carboxylate or hydroxyl groups, and C.sub.6-C.sub.10-aryl-alkyl, wherein an alkyl of the C.sub.6-C.sub.10-aryl-alkyl is selected from the group consisting of linear C.sub.1-C.sub.8 alkyl and branched C.sub.3-C.sub.8 alkyl, wherein at least one of R.sup.2, R.sup.3, and R.sup.4 is not H; component (b): at least one enzyme selected from the group consisting of hydrolases (EC 3); and optionally component (c): at least one compound selected from the group consisting of solvents, enzyme stabilizers different from component (a), and compounds stabilizing the enzyme preparation.

An object of the present invention is to provide a cleaning liquid for semiconductor substrates with a change in the pH of the cleaning liquid caused by dilution being suppressed. A cleaning liquid of the invention is a cleaning liquid for semiconductor substrates that contains a chelating agent, and an acidity constant (pKa) of the chelating agent and a pH of the cleaning liquid satisfy a condition defined by Formula (A):

pKa−1<pH<pKa+1  (A)

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

A rubber cleaning composition includes water, a cleaning and oxidation removal agent, a conditioning agent, and a drying agent. The cleaning agent includes citric acid. The conditioning agent includes glycerin. The cleaning and oxidation removal agent is present in a water:cleaning and oxidation removal agent volume ratio of about 100:1 to about 300:1. The conditioning agent is present in a water:conditioning agent volume ratio of about 7:1 to about 8:1. The drying agent is present in a water:drying agent volume ratio of about 1:1 to about 2:1. The composition cleans, protects, and improves performance of rubber, such as climbing shoe rubber.

The invention relates to a fluid comprising or consisting of glycerol and potassium acetate in a weight ratio interval of 3:2 to 1:6 with a water content of 55-80 w %, wherein the combined weight of glycerol and potassium acetate constitutes 20-45 w %, up to a maximum or total of 100 w %. The inventive fluid is useful as a heat transfer fluid, a deicing fluid or a windscreen washing fluid. A method for producing the inventive fluid is also provided.

Linen treatment compositions and linen processes are disclosed which help to prevent iron deposition from wash water, and/or redeposition after iron containing stain (such as blood) removal by alkaline detergents. The linen treatment composition is a combination of a hydroxycarboxylic acid and an acid source, which may be organic or inorganic. The invention provides for effective iron control in a phosphorus-free formula that is also free of toxic or hazardous chemicals and includes sustainable, environmentally friendly ingredients, while still providing effective iron control.

A produce wash system, method, and short-term wash treatment are provided. For example, the produce wash system includes a produce line including a short-term wash device followed by a wash device, a short-term wash treatment that is applied by the short-term wash device to a product, wherein the short-term wash treatment is applied using a spray device that creates micrometer sized droplets, and wherein the short-term wash treatment remains on the product for a pretreatment time that lasts until the product reaches the wash device, and a wash treatment that is applied by the wash device to the product, wherein the wash treatment rinses the short-term wash treatment from the product defining the end of the pretreatment time. The pretreatment time is set at or below a damage threshold time beyond which the short-term wash treatment damages the product beyond a damage threshold.

Stable, solid triamine compositions are disclosed. The pressed, cast, extruded or other solid compositions are suitable for antimicrobial, sanitizing and disinfectant applications. Ready-to-use solutions are obtained by dissolving the solid triamine compositions with water and the methods of use thereof are particularly suitable for cleaning, disinfecting, sanitizing, rinsing and/or lubricating. Beneficially, the solid triamine compositions are at least partially neutralized, allowing activity of 90% and greater of the biocidal triamine, and provide at least substantially similar or superior performance and micro efficacy to liquid formulations.

Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.

A cleaning solution, composition, and portable cleaner are provided that is all natural, safe, non-toxic, edible, anti-bacterial, anti-viral, anti-microbial, deodorizing, and further includes a pleasant fragrance and taste. In addition, the cleaning composition can be free from sugar, alcohol, surfactants, and other harmful or harsh ingredients. In addition, the cleaning composition allows for quick cleaning of any type of object that may be placed in the mouth, such as pacifiers, toys, candy, eating utensils, musical instruments, and mouth-pieces, among others.