Patent classifications
C11D7/266
SILOXANE COMPOSITIONS AND CLEANING METHOD USING THE SAME
The compositions include a methylated siloxane liquid and a solvent comprising at least one of a ketone or ester each having up to six carbon atoms, a halogenated alkane having up to two carbon atoms, tetrachloroethene, 1-chloro-4-trifluoromethyl benzene, or ethane. The compositions can also include hydrocarbon solvent comprising at least one of toluene, xylene, or a saturated hydrocarbon represented by formula C.sub.xH.sub.2x+y, wherein x is from 5 to 8, and wherein y is 0 or 2 and/or propellant. The method can include applying the composition to a brake system component to clean the brake system component. The method can also include applying a composition including hexamethyldisiloxane to a brake system component to clean the brake system component.
POLYSTYRENE AND/OR STYRENE COPOLYMERS SOLUBILIZING COMPOSITION
A composition for solubilizing polystyrene and/or styrene copolymers, including a first component and a second component, in which the first component is selected from solvents having a flashpoint of at least 25? C., and the second component is soluble in the first component. The use of the composition as a cleaning composition for the removal of polystyrene and/or styrene copolymers from a surface and a method for the removal of polystyrene and/or styrene copolymers from a surface.
COMPOSITION AND METHOD FOR REMOVING A COATING FROM A SURFACE
A composition includes methyl acetate, dimethyl carbonate, acetone, or a combination thereof, dimethyl sulfoxide, methyl glyoxal, propylene carbonate, gamma butyrolactone, ethylene carbonate, 2-chloro-1-propanol, or a combination thereof, and optionally thiophene, 1,3-dioxolane, thioacetic acid, or a combination thereof. The respective amounts of each solvent are further described herein, and the total amounts of methyl acetate, dimethyl carbonate, acetone, dimethyl sulfoxide, methyl glyoxal, propylene carbonate, thiophene, 1,3-dioxolane, and thioacetic acid sum to at least 90 volume percent of the total volume of the composition. The composition can be particularly useful for removal of a coating from a surface. Accordingly, a method of removing a coating from a surface is also disclosed.
EXTERIOR CLEANING COMPOSITION FOR A VEHICLE
Disclosed is an exterior chemical cleaning composition for a vehicle. The chemical cleaning composition may be capable of functioning as a universal cleaning solvent includes 2% hydrogen peroxide by volume, predetermined quantities of acetone water, propylene carbonate, dimethyl glutamate, dimethyl adipate, glycerin, panthenol, tocopheryl acetate, desired amount of distilled water, 1% by volume of acetate fragrance, 5 benzophenone-1, benzoate, yellow 11 and remaining water content. The chemical cleaning composition may be utilized for forming an effective solvent for cleaning a variety of surfaces including car body, kitchen hood, and other surfaces subjected to deposition of all kinds of stain, dirt, oil, marks, droppings and other coatings. The chemical cleaning composition may be used as an effective, simple and quick means for cleaning a vehicle body without affecting the underlying paint coating on the vehicle body.
DISSOLVENT COMPOSITION, STABLE UNDER COLD CONDITIONS
A composition comprising: at least 25% of a fatty acid methyl ester having from 6 to 14 carbon atoms, or a mixture of such methyl esters; at least 15% of dimethyl sulfoxide, or DMSO; and at least 5% of a glyceryl fatty acid monoester having from 6 to 14 carbon atoms or a mixture of such glyceryl monoesters; the percentages being percentages by weight relative to the total weight of the composition. This composition is stable at low temperature and may be used as a cleaning, dissolvent, dispersant and/or diluent composition, especially for active principles in the plant protections field.
COMPOSITION FOR CLEANING SKIN STRIPS OF SKIN SKIS
Provided herein is a composition for cleaning skin strips of skin skis, in particular for removing hydrophobic compounds, such as oils, resins, grease, and/or waxes, from the surface of the skin strips. The composition comprises (a) C.sub.1-6-alcohol; (b) at least 10% by weight of the total weight of the composition of dibasic ester(s) of formula R.sup.1OC(O)(CH.sub.2).sub.nC(O)OR.sup.1, wherein n is 2 to 4; and each R.sup.1 is independently C.sub.1-6-alkyl, (c) 0 to 5% by weight of the total weight of the composition of alkoxyalkanol(s) of formula R.sup.2O(CH.sub.2).sub.mOH wherein m is 1 to 4, preferably 2 or 3, and R.sup.2 is C.sub.1-6-alkyl, preferably C.sub.3-6-alkyl; and (d) 0 to 5% by weight of the total weight of the composition of tri(C.sub.1-6-alkanol) amine(s).
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A CLEANING COMPOSITION FOR AN ADHESIVE LAYER
Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less thaadminn 90 wt %, quaternary ammonium salt, and primary amine.
Method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer
Embodiments of the inventive concepts provide a method of manufacturing a semiconductor device and a cleaning composition for an adhesive layer. The method includes preparing a semiconductor substrate to which an adhesive layer adheres, removing the adhesive layer from the semiconductor substrate, and applying a cleaning composition to the semiconductor substrate to remove a residue of the adhesive layer. The cleaning composition includes a solvent including a ketone compound and having a content that is equal to or greater than 40 wt % and less than 90 wt %, quaternary ammonium salt, and primary amine.
LACQUER FOR TREATING 3D PRINTING-CREATED PRINTED MATTER
Proposed is a lacquer for treating a 3D printing-created printed matter that is configured to contain a perfluorinated acrylic resin having a relatively high surface hardness and excellent water resistance and contamination resistance, as well as an excellent force of adhesion to a printing resin making up a 3D printed matter. While the 3D printed matter that is printed through a photocuring-type 3D printer is cleaned and rinsed, an uncured resin remaining on the 3D printed matter is removed, and at the same time, a protective film layer is formed on a surface of the 3D printed matter by being coated thereon. As a result, the surface of the 3D printed matter is protected from damage during a post curing process. Furthermore, the 3D printed matter, which is to be manufactured, is also effectively safeguarded against quality degradation that is caused by contamination through the surface thereof and subsequent discoloration.
THINNER COMPOSITION FOR REMOVING PHOTOSENSITIVE RESIN INCLUDING COLORANT
The present disclosure relates to a thinner composition for cleaning SUS pipes and discharge nozzles in a process using a colored photosensitive composition, and to solve the problem of color mixing or particle generation due to colored residues in the subsequent process. That is, the composition within the range according to the present disclosure can effectively clean a colored photosensitive composition containing organic or inorganic pigments and organic or inorganic dyes, and can increase the yield in display production without residues, dark spots, etc.