Disclosed herein are biodegradable compositions comprising 1,3-propanediol, wherein the 1,3-propanediol in said biodegradable composition has a bio-based carbon content of about 1% to 100%. In addition, it is preferred that the 1,3-propanediol be biologically-derived, and wherein upon biodegradation, the biologically-derived 1,3-propanediol contributes no anthropogenic CO2 emissions to the atmosphere.

Biodegradable pharmaceutical compositions comprising 1,3-propanediol and its esters are provided. The 1,3-propanediol and its esters in the pharmaceutical composition are biologically derived, and as such, the pharmaceutical compositions exhibit a low anthropogenic CO.sub.2 emission profile.

The invention relates to cleaning and/or treatment compositions comprising tannins and methods of making and using same. Such cleaning and/or treatment compositions can mitigate/neutralize malodors without imparting color to an article that is treated with such cleaning and/or treatment composite. In addition, such the appearance of such compositions is not adversely impacted by the tannins that they contain.

A cleaning composition is particularly suited for cleaning dirty intake valves. The cleaning composition includes a high solvency surfactant/solvent which has a Kb greater than 100 or polar Hansen solubility parameter greater than 6. The surfactant/solvent is combined with a carrier such as water or an organic carrier and a surfactant. A wetting agent may also be employed. The cleaning composition is added to the intake air as a mist as the engine is running. Aqueous and non-aqueous versions are disclosed.

A solvent composition and system is disclosed having a composition including n-propyl bromide and a propionate containing liquid and/or a butyrate containing liquid. The solvent system may include approximately 35 to 92.5 weight percent propionate containing liquid and approximately 7.5 to 65 weight percent n-propyl bromide. Alternatively, the solvent system may include approximately 40 to 85 weight percent butyrate containing liquid and 15 to 60 weight percent, n-propyl bromide. The solvent system may incorporate a polymer, such as a synthetic rubber polymer. Further the solvent system preferably has high solvency while maintaining desirable evaporation rates and is preferably nonflammable, combustible, or minimally a class IC flammable liquid.

The invention discloses cleaning compositions which employ a synergistic combination of an ester solvent, preferably a fatty acid methyl ester in combination with one or more linear alkyl amines. The alkyl amines act as to remove and suspend organic oils which have been burnt or adhered to a surface with heat and may even be used alone as a soil removal agent. The cleaning compositions have particular use in cleaning of distillation towers associated with biofuel, and vegetable oil refining, but also find use in cleaning ovens, food cooking surfaces and even dry cleaning.

The present invention relates to a method for imparting a fragrance to a fabric comprising the steps: (i) providing a composition comprising or consisting of one or more fragrance compound(s) and at least one polyol ester of the formula (I) as defined herein; (ii) contacting the composition from step (i) with the fabric; and (iii) optionally, drying the fabric. Furthermore, the present invention provides a fragrant object obtained or obtainable by the method according to the invention, a composition comprising or consisting of one or more fragrance compound(s) and at least one polyol ester of the formula (I), a product comprising a composition according to the invention as well as the use of a polyol ester of the formula (I) for enhancing deposition of a fragrance on a fabric.

A rinse material composition used in a process of forming a pattern using lithography includes a dry development rinse material (DDRM) compound and a solvent. The DDRM compound is designed to form hydrogen bonds, van der Waals bonds, coordination bonds, or ionic bonds with photosensitive crosslinkable molecules of a resist pattern. The resist pattern contains an organometallic material. The DDRM compound is dissolved in the solvent.

The present disclosure relates to a thinner composition for removing a resist and a processing method of a semiconductor substrate using the thinner composition. Particularly, the thinner composition includes (a) propylene glycol monoalkyl ether, (b) propylene glycol monoalkyl ether acetate, (c) cyclohexanone, and (d) cyclopentanone. In addition, the processing method of a semiconductor substrate includes applying a resist composition on a semiconductor substrate and removing the applied resist composition using the thinner composition of the present invention.

A cleaning composition includes an alkanol having 1 to 6 carbon atoms, an acetate compound and water. A content of water may be 50 wt % to 95 wt % based on a total weight of the cleaning composition. In a method of forming a photoresist pattern, a photoresist film is formed on a substrate, the photoresist film is partially removed to form a photoresist pattern, and the substrate on which the photoresist pattern is formed is cleaned using the cleaning composition.