C11D7/5027

Rinsing liquid, pattern forming method, and electronic device manufacturing method

Provided are a rinsing liquid which is used for rinsing a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and includes a hydrocarbon-based solvent having a branched alkyl group. The hydrocarbon-based solvent having a branched alkyl group contains at least one of isodecane or isododecane.

METHOD FOR TREATING A SEMICONDUCTOR DEVICE
20200088677 · 2020-03-19 ·

A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.

SOLVENT SYSTEMS AND METHODS OF USE THEREOF

A cleaning composition comprising a blend of at least one C.sub.1-C.sub.4 ester of a C.sub.16-C.sub.20 fatty acid component, at least one terpene hydrocarbon component, and optionally at least one emulsifier component. The weight percent ratio of the at least one C.sub.1-C.sub.4 ester of a C.sub.16-C.sub.20 fatty acid component to the at least one terpene hydrocarbon component is from about 10:90 weight percent to about 99:1 weight percent, based on the total weight of the blend. The weight percent ratio is such that the blend has a flash point greater than about 118 F. A method of cleaning a surface of a substrate comprising applying the cleaning composition to a substrate surface having an undesirable residue thereupon, and removing the undesirable residue from the substrate surface. The blend may be biodegradable, and has no ozone depleting compounds, no hazardous air pollutants, and no carcinogens.

Printing Press Wash
20200040286 · 2020-02-06 ·

The present invention is drawn to a wash that will effectively clean printing related equipment such as a printing press, including all of its components, of materials used in the printing process, including printing inks, paper, and fountain solutions.

COMPOSITIONS AND METHODS FOR CLEANING AUTOMOTIVE SURFACES
20200032175 · 2020-01-30 ·

An automotive surface is cleaned by applying an effective amount of a cleaning composition comprising a) at least one hydrocarbon solvent in an amount from about 3 weight percent to about 20 weight percent of the composition, b) at least one thickener/rheology modifier in an amount from about 0.01 weight percent to about 3 weight percent, c) at least one silicone fluid has a viscosity ranging from about 500 to about 20,000 centistokes at 25 C., present in an amount from about 0.1 weight percent to about 3 weight percent, d) at least one wetting agent in an amount from about 0.001 to about 2%, e) at least one hydrophobic additive in an amount from about 0.1 to about 3%, and f) water in an amount from about 60 weight percent to about 85 weight percent to the automotive surface with an application implement.

HEADLIGHT LENS CLEANING AND RESTORING COMPOSITIONS AND METHODS OF USE THEREOF
20200032176 · 2020-01-30 ·

A polycarbonate headlight lens cleaning and restoring kit has a lens cleaning composition, an applicator wipe; and a lens restoring composition comprising a coating component. The polycarbonate cleaning composition contains only liquid components and is free of water. The cleaning composition has a first solvent that softens a Control Polycarbonate Substrate and has a flash point of from 58 F to 220 F; and a second solvent that does not soften a Control Polycarbonate Substrate. The first solvent and the second solvent are present in an amount effective to substantially remove discoloring contaminants from a polycarbonate headlight lens and the polycarbonate lens, and also in an amount so that, after removal of the discoloring contaminants, the polycarbonate headlight lens can be restored to a clear condition. A method of cleaning and restoring a polycarbonate headlight lens that is at least partially discolored from discoloring contaminants is also provided.

Method for treating a semiconductor device

A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.

REMOVER REAGENT FOR CURED SILICONE SEALANT AND METHOD USING SAME
20240076586 · 2024-03-07 ·

The present disclosure provides a formula of a remover reagent for a cured silicone sealant and a method using the same. The remover reagent is prepared from an acid catalyst and a solvent each having a high boiling point and a high flash point. The acid catalyst is benzenesulfonic acid or alkylbenzenesulfonic acid. The solvent is mineral oil and/or silicone oil. The cured silicone sealant is first soaked with the remover reagent for 30 to 120 min, and then baked at a high temperature of 80 to 120? C. for 10 min or above into debris or powder, whereby the cured silicone sealant with a thickness of 10 mm or above can be removed. Moreover, the remover reagent has the advantages of readily available raw materials, high safety, environmentally friendliness, convenient preparation and good sealant removal effect, and thus, has good application prospects.

Cleaner composition and preparation of thin substrate

A cleaner composition consisting essentially of (A) 90.0-99.9 wt % of an organic solvent and (B) 0.1-10.0 wt % of a C.sub.3-C.sub.6 alcohol, and containing (C) 20-300 ppm of sodium and/or potassium is effective for cleaning a surface of a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.

PROCESS FOR FLUSHING AN OLIGOMERIZATION REACTOR AND OLIGOMERIZATION OF AN OLEFIN

A process for flushing an oligomerization reactor is described, including flushing the oligomerization reactor with a flushing medium comprising C.sub.6 linear alpha olefins, C.sub.8 linear alpha olefins, C.sub.10 linear alpha olefins, or a combination including at least one of the foregoing, to provide a purge stream comprising the C.sub.6 linear alpha olefins, C.sub.8 linear alpha olefins, C.sub.10 linear alpha olefins, or a combination including at least one of the foregoing, and a polymer byproduct of an oligomerization reaction. A process for the oligomerization of an olefin is also described, wherein the process includes oligomerizing the olefin in the reactor to form a reaction product stream comprising linear alpha olefins, and subsequently flushing the oligomerization reactor according to the process disclosed herein.