Patent classifications
C11D2111/18
Anti-fogging agent comprising a fluorosurfactant mixture
The present invention provides anti-fogging agents and cleaners that provide long-lasting prevention of fogging of glass, plastic, or other hard surfaces. The present invention relates to an anti-fogging agent or cleaner which contains: (A) a fluorinated amphoteric surfactant; (B) a fluorinated anionic or cationic surfactant; and (C) a non-fluorinated amphoteric surfactant. The present invention also relates to an eyeglass cleaner including a non-woven fabric impregnated with the anti-fogging agent or cleaner.
Label removal solution for low temperature and low alkaline conditions
According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of amide solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at lower temperatures, including below 35 C., and lower pH conditions, including from 5 to 10, from 6 to 9, and from 6 to 8, in comparison to conventional caustic-based adhesive removal compositions.
CLEANING FLUID COMPOSITIONS AND METHODS OF MAKING AND USING THE SAME
A cleaning fluid composition, a method of manufacture of the fluid composition, and a method of use thereof are provided. The fluid composition comprises 10% to 50% by weight of an alcohol based on the total weight of the fluid composition, 2% to 40% by weight of a co-solvent based on the total weight of the fluid composition, and at least 20% by weight of water based on the total weight of the fluid composition. The co-solvent is miscible with water, the fluid composition is substantially free of ethylene glycol and methanol, and the fluid composition has a viscosity less than or equal to 45 cP at 25 degrees Celsius and a freezing point less than 25 degrees Celsius.
Cleaning agent composition for glass hard disk substrate
A cleaning composition for a glass hard disk substrate has high detergency and can reduce the deterioration of the surface roughness of a substrate. In an embodiment, the present disclosure relates to a cleaning composition for a glass hard disk substrate, which contains an amine (component A) expressed by the formula (I) and a surface active agent (component B) expressed by the formula (II). ##STR00001##
METHOD FOR CLEANING A SYNTHETIC SURFACE
The invention relates to a method for cleaning a synthetic surface, in particular to remove metal dirt and/or particles therefrom, said method being characterized by the following steps: a) the synthetic surface is rinsed with deionized water; b) the synthetic surface is rinsed with electrolyzed water; and c) the synthetic surface is rinsed with deionized water.
USE OF POLYSACCHARIDE MICROGELS IN DETERGENTS
The proposed cluster of inventions relates to chemical industry, in particular to compositions of and additives in detergents designed for household, professional or personal use, to be used at home or industrially. The essence of this cluster of inventions lays in the use of polysaccharide microgels as an additive or the base in detergents, in particular as an antiresorption agent, thickener, or an agent for reducing surface tension at the interphase boundary, including also composition of detergents with polysaccharide microgels. The technological result of the application of these inventions is reduction of the quantity of surfactants in the detergent, while its detergency is no affected, which raises their ecological value and safety for the final users.
HEADLIGHT LENS CLEANING AND RESTORING COMPOSITIONS AND METHODS OF USE THEREOF
A polycarbonate headlight lens cleaning and restoring kit has a lens cleaning composition, an applicator wipe; and a lens restoring composition comprising a coating component. The polycarbonate cleaning composition contains only liquid components and is free of water. The cleaning composition has a first solvent that softens a Control Polycarbonate Substrate and has a flash point of from 58 F to 220 F; and a second solvent that does not soften a Control Polycarbonate Substrate. The first solvent and the second solvent are present in an amount effective to substantially remove discoloring contaminants from a polycarbonate headlight lens and the polycarbonate lens, and also in an amount so that, after removal of the discoloring contaminants, the polycarbonate headlight lens can be restored to a clear condition. A method of cleaning and restoring a polycarbonate headlight lens that is at least partially discolored from discoloring contaminants is also provided.
RINSE AID FORMULATION FOR CLEANING AUTOMOTIVE PARTS
Hard surface rinse aid compositions incorporating surfactant systems compatible with plastics and plastics containing metals, such as aluminum, are disclosed. The hard surface rinse aid compositions are particularly well suited for use in high concentrations at low temperatures without causing foaming and/or debris or film on the treated surface. In particular, the plastic and aluminum-compatible hard surface rinse aid compositions containing a surfactant system combining nonionic alcohol alkoxylates and a polymer surfactant can be used in treating hard surfaces requiring good sheeting, wetting and drying properties. The methods are particularly well suited for rinsing automotive parts, including those needing painting.
Cleaning Agents With Protection Against Glass Corrosion
Cleaning agents, preferably dishwashing detergents, in particular the automatic dishwashing detergent, having at least one low-water, preferably substantially anhydrous gel-like phase which contains at least one water-soluble zinc salt, preferably zinc sulfate and/or zinc acetate, particularly preferably zinc acetate.
CLEANING SOLUTION COMPOSITION
Provided is a cleaning solution composition which, when cleaning the surface of a semiconductor substrate or glass substrate, does not damage SiO.sub.2, Si.sub.3N.sub.4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.