Bulk acoustic wave resonator structures include a bulk layer with inclined c-axis hexagonal crystal structure piezoelectric material supported by a substrate. The bulk layer may be prepared without first depositing a seed layer on the substrate. The bulk material layer has a c-axis tilt of about 32 degrees or greater. The bulk material layer may exhibit a ratio of shear coupling to longitudinal coupling of 1.25 or greater during excitation. A method for preparing a crystalline bulk layer having a c-axis tilt includes depositing a bulk material layer directly onto a substrate at an off-normal incidence. The deposition conditions may include a pressure of less than 5 mTorr and a deposition angle of about 35 degrees to about 85 degrees.

A structure includes a substrate including a wafer or a portion thereof; and a piezoelectric bulk material layer comprising a first portion deposited onto the substrate and a second portion deposited onto the first portion, the second portion comprising an outer surface having a surface roughness (Ra) of 4.5 nm or less. Methods for depositing a piezoelectric bulk material layer include depositing a first portion of bulk layer material at a first incidence angle to achieve a predetermined c-axis tilt, and depositing a second portion of the bulk material layer onto the first portion at a second incidence angle that is smaller than the first incidence angle. The second portion has a second c-axis tilt that substantially aligns with the first c-axis tilt.

An optical article includes a substrate with front and rear main faces, one main face coated with a columnar micro- or nano-structured coating. The substrate and optical article are transparent in at least a part of the visible region ranging from 380 to 780 nm, along at least one incidence angle. The columnar micro- or nano-structured coating includes an array of columns including each a core and an upper layer covering the core, the core and the upper layer being structurally and/or chemically different and have light absorbing properties with an extinction coefficient “k” ≥10-2 in the spectrum 250-2500 nm and are able to cause a change in transmission or in reflection of incident light through the optical article as a function of the angle of incidence of light. Also disclosed is a method for manufacturing an optical article including a columnar micro- or nano-structured coating.

An optical element including a substrate that is transparent to light at a using wavelength band, an antireflection layer, a matching layer, and a birefringent layer formed of an oblique angle vapor deposition film, wherein an optical loss in the optical element at the using wavelength band is 1.0% or less, and the optical loss is calculated using the following formulae from intensity of transmitted light and intensity of reflected light measured by S-polarized light at an incident angle of 5° in the optical element,

Transmittance=intensity of transmitted light/intensity of incident light (%)

Reflectance=intensity of reflected light/intensity of incident light (%)

Optical loss (%)=100%−transmittance (%)−reflectance (%).

An article includes a substrate that is substantially opaque to visible light and a coating disposed on the substrate. The coating includes a coating material having an inherent index of refraction, wherein the coating has an effective index of refraction that is less than the inherent index of refraction, and wherein the effective index of refraction is less than 1.8.

A structure includes a substrate including a wafer or a portion thereof; and a piezoelectric bulk material layer comprising a first portion deposited onto the substrate and a second portion deposited onto the first portion, the second portion comprising an outer surface having a surface roughness (Ra) of 4.5 nm or less. Methods for depositing a piezoelectric bulk material layer include depositing a first portion of bulk layer material at a first incidence angle to achieve a predetermined c-axis tilt, and depositing a second portion of the bulk material layer onto the first portion at a second incidence angle that is smaller than the first incidence angle. The second portion has a second c-axis tilt that substantially aligns with the first c-axis tilt.

An optical article includes a substrate with front and rear main faces, one main face coated with a columnar micro- or nano-structured coating. The substrate and optical article are transparent in at least a part of the visible region ranging from 380 to 780 nm, along at least one incidence angle. The columnar micro- or nano-structured coating includes an array of columns including each a core and an upper layer covering the core, the core and the upper layer being structurally and/or chemically different and have light absorbing properties with an extinction coefficient k 10-2 in the spectrum 250-2500 nm and are able to cause a change in transmission or in reflection of incident light through the optical article as a function of the angle of incidence of light. Also disclosed is a method for manufacturing an optical article including a columnar micro- or nano-structured coating.

The present application provides a light emitting device and a manufacturing method for the same. The light emitting device includes a substrate and an anode structure disposed on the substrate, which is formed by depositing particles on a surface of the substrate through a deposition source. During the process of the anode structure, the substrate is disposed obliquely with respect to the deposition source such that the particles of the functional film layers of the anode structure are arranged in a fixed direction, thereby increasing the work function of the anode structure.

Systems and methods for growing hexagonal crystal structure piezoelectric material with a c-axis that is tilted (e.g., 25 to 50 degrees) relative to normal of a face of a substrate are provided. A deposition system includes a linear sputtering apparatus, a translatable multi-aperture collimator, and a translatable substrate table arranged to hold multiple substrates, with the substrate table and/or the collimator being electrically biased to a nonzero potential. An enclosure includes first and second deposition stations each including a linear sputtering apparatus, a collimator, and a deposition aperture.

There is provided a film forming apparatus, including: a processing chamber having a processing space in which a film forming process is performed on a substrate; a substrate support part configured to support the substrate inside the processing chamber; at least one sputtering particle emission part including a target and configured to emit sputtering particles to the substrate from the target; and at least one etching particle emission part configured to emit etching particles having an etching action with respect to the substrate, wherein the sputtering particles emitted from the at least one sputtering particle emission part are deposited on the substrate to form a film, and a portion of the film is etched by the etching particles emitted from the at least one etching particle emission part.