A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N.sub.2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×10.sup.16 ions/cm.sup.2 and −5.00×10.sup.15×A/kV+2.00×10.sup.17 ions/cm.sup.2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.

Methods, systems, and apparatuses for coating flexible substrates are provided. A coating system includes an unwinding module housing a feed reel capable of providing a continuous sheet of flexible material, a winding module housing a take-up reel capable of storing the continuous sheet of flexible material, and a processing module arranged downstream from the unwinding module. The processing module includes a plurality of sub-chambers arranged in sequence, each configured to perform one or more processing operations to the continuous sheet of flexible material. The processing module includes a coating drum capable of guiding the continuous sheet of flexible material past the plurality of sub-chambers along a travel direction. The sub-chambers are radially disposed about the coating drum and at least one of the sub-chambers includes a deposition module. The deposition module includes a pair of electron beam sources positioned side-by-side along a transverse direction perpendicular to the travel direction.

The present invention discloses an optical bandpass filter structure targeting an arbitrary combination of the spectral ranges of R (red), G (green), B (blue) and IR (infrared) light, which comprises a substrate that is a wafer-based semiconductor sensing element, and a filter layer that is formed on one side of the substrate. The filter layer includes a plurality of basic units organized as a two-dimensional array, in which each of the basic units is composed of a plurality of pixel filter films fabricated by a vacuum coating method.

A film includes a base layer, where each of front and back sides of the base layer is provided with a bonding layer, a composite structure layer, an aluminum material layer, and an anti-oxidation layer in sequence. The composite structure layer includes at least two structure layers. Each structure layer is composed of an aluminum material layer and a reinforcement layer, and the structure layers are stacked. With the composite structure layer, the new film has a resistivity as low as 4.5×10.sup.−8 Ω.Math.m, a peel force as high as 4.8 N to 5.2 N, and improved bonding force and compactness.

A film includes a base layer, where each of front and back sides of the base layer is provided with a bonding layer, a composite structure layer, an aluminum material layer, and an anti-oxidation layer in sequence. The composite structure layer includes at least two structure layers. Each structure layer is composed of an aluminum material layer and a reinforcement layer, and the structure layers are stacked. With the composite structure layer, the new film has a resistivity as low as 4.5×10.sup.−8 Ω.Math.m, a peel force as high as 4.8 N to 5.2 N, and improved bonding force and compactness.

The present invention relates to an inorganic alignment film forming apparatus for forming an inorganic alignment film on a substrate, the apparatus comprising: a sputtering means; and an ion beam irradiation means for performing surface treatment on an inorganic alignment film formed by the sputtering means, wherein the sputtering means comprises a stage on which a substrate for forming the inorganic alignment film is arranged, at least one sputtering gun, and a sputtering mask arranged between the stage and the sputtering gun, the ion beam irradiation means comprises a stage on which the substrate is arranged, an ion beam emission unit for generating ions and irradiating the substrate with ions, and an ion beam irradiation mask arranged between the stage and the ion beam emission unit, and the sputtering mask and the ion beam irradiation mask have a plurality of inclined opening parts.

Optical-quality mirrors having an energetically bonded oleophobic/hydrophobic (O/H) coating are provided, as are methods for making and using such coatings and mirrors. The O/H coating is a thin-film coating that causes water and oils to form beads and become easily removable from the mirror surface, and thus improves the cleanability, contamination resistance, and usable life of the mirror.

Embodiments described herein include a method for depositing a material layer on a substrate while controlling a bow of the substrate and a surface roughness of the material layer. A bias applied to the substrate while the material layer is deposited is adjusted to control the bow of the substrate. A bombardment process is performed on the material layer to improve the surface roughness of the material layer. The bias and bombardment process improve a uniformity of the material layer and reduce an occurrence of the material layer cracking due to the bow of the substrate.

The present disclosure relates to a laminate and a method for preparing the same. The laminate comprises a substrate, a coating layer, and a water-repellent layer sequentially laminated, the coating layer comprises a first coating layer and a second coating layer laminated one or more times alternately, the first coating layer comprises at least one metal oxide selected from a group consisting of a lanthanide metal oxide, a transition metal oxide, and a composite metal oxide comprising lanthanum metal and transition metal, the second coating layer comprises an alkaline earth metal fluoride and a transition metal oxide.

Disclosed are methods and systems for filling a gap. The methods and systems are useful, for example, in the field of integrated circuit manufacture.