A device including a near field transducer, the near field transducer including gold (Au), silver (Ag), copper (Cu), or aluminum (Al), and at least two other secondary atoms, the at least two other secondary atoms selected from: boron (B), bismuth (Bi), indium (In), sulfur (S), silicon (Si), tin (Sn), manganese (Mn), tellurium (Te), holmium (Ho), lutetium (Lu), praseodymium (Pr), scandium (Sc), uranium (U), barium (Ba), chlorine (Cl), cesium (Cs), dysprosium (Dy), europium (Eu), fluorine (F), germanium (Ge), hydrogen (H), iodine (I), rubidium (Rb), selenium (Se), terbium (Tb), nitrogen (N), oxygen (O), carbon (C), antimony (Sb), gadolinium (Gd), samarium (Sm), thallium (Tl), cadmium (Cd), neodymium (Nd), phosphorus (P), lead (Pb), hafnium (Hf), niobium (Nb), erbium (Er), zinc (Zn), magnesium (Mg), palladium (Pd), vanadium (V), zinc (Zn), chromium (Cr), iron (Fe), lithium (Li), nickel (Ni), platinum (Pt), sodium (Na), strontium (Sr), calcium (Ca), yttrium (Y), thorium (Th), beryllium (Be), thulium (Tm), erbium (Er), ytterbium (Yb), promethium (Pm), neodymium (Nd cobalt (Co), cerium (Ce), lanthanum (La), praseodymium (Pr), or combinations thereof.

The present invention relates to an information storage medium and a method for long-term storage of information comprising the steps of: providing a ceramic substrate; coating the ceramic substrate with a layer of a second material different from the material of the ceramic substrate, the layer having a thickness no greater than 10 m; tempering the coated ceramic substrate to form a writable plate or disc; encoding information on the writable plate or disc by using a laser and/or a focused particle beam to manipulate localized areas of the writable plate or disc.

An ion milling apparatus includes an ion irradiation source, a sample holder, a sample stage, a rotation mechanism, and a slide mechanism. The sample holder holds a sample such that the sample protrudes from a shielding plate in a direction perpendicular to an optical axis of an ion beam. The rotation mechanism is disposed such that a rotation center of a rotation shaft is perpendicular to the optical axis of the ion beam and parallel to a direction in which the sample protrudes from the shielding plate. The rotation mechanism supports the sample stage such that the sample stage is rotatable. The slide mechanism supports the sample held by the sample holder such that the sample is movable along the optical axis of the ion beam.

A method of manufacturing a component for a reference electrode assembly according to various aspects of the present disclosure includes providing a separator having first and second opposing surfaces. The method further includes sputtering a first current collector layer to the first surface via magnetron or ion beam sputtering deposition. A porosity of the separator is substantially unchanged by the sputtering. In one aspect, the method further includes sputtering a second current collector layer to the second surface via magnetron or ion beam sputtering deposition. In one aspect, the first current collector layer includes nickel and defines a first thickness of greater than or equal to about 200 nm to less than or equal to about 300 nm and the second current collector layer includes gold and defines a second thickness of greater than or equal to about 25 nm to less than or equal to about 100 nm.

Methods of bonding substrates are provided, including forming a thin film of a metal oxide on a bonding surface of both or either of a pair of substrates, at least one of which is a transparent substrate, and contacting the bonding surfaces of the pair of substrates with each other via the thin film of the metal oxide.

A covering member has a hard film on the surface of a base material, wherein the hard film comprises a layer A selected from a nitride, a carbonitride, an oxynitride, and an oxycarbonitride of Cr or CrM; a metal layer which is formed on the outer surface side of the A layer and includes Cr, Ti, or W; and a layer B which is formed on the outer surface side of the metal layer and selected from a nitride, a carbonitride, an oxynitride, and an oxycarbonitride of Cr or CrM, and wherein M is one or two or more from a Group 4 metal, a Group 5 metal, a Group 6 metal of the periodic table, Al, Si, and B, and strain is introduced in the outer surface side of the metal layer.

A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.

A method hardens an anti-reflection treatment deposited on a transparent substrate that includes a top surface and a bottom surface which extends remotely from the top surface. The anti-reflection treatment includes depositing at least one anti-reflection layer of at least one material on at least one of the top and bottom surfaces of the transparent substrate, bombarding the at least one top or bottom surface on which the at least one anti-reflection layer has been deposited using a singly-charged and/or multi-charged ion beam produced by a singly-charged and/or multi-charged ECR electron cyclotron resonance ion source. The method produces a transparent substrate having undergone an anti-reflection treatment such that at least one of the top and bottom surfaces of the transparent substrate is coated with at least one anti-reflection layer of at least one material, whereby ions are implanted in the at least one anti-reflection layer.

A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N.sub.2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 610.sup.16 ions/cm.sup.2 and 5.0010.sup.15A/kV+2.0010.sup.17 ions/cm.sup.2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.

A deposition apparatus for coating a flexible substrate is described. The deposition apparatus includes a first spool chamber housing a storage spool for providing the flexible substrate, a deposition chamber arranged downstream from the first spool chamber, and a second spool chamber arranged downstream from the deposition chamber and housing a wind-up spool for winding the flexible substrate thereon after deposition. The deposition chamber includes a coating drum for guiding the flexible substrate past a plurality of deposition units including at least one deposition unit having a graphite target. Further, the deposition chamber includes a coating treatment device configured to densify a layer deposited on the flexible substrate.