C23C16/4486

Vapor delivery device, methods of manufacture and methods of use thereof

A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

METHOD FOR PRODUCING LIQUID TRANSPORT APPARATUS
20230182469 · 2023-06-15 · ·

There is provided a method for producing a liquid transport apparatus includes: a pressure chamber plate partially defining a pressure chamber that communicates with a nozzle for ejecting liquid; an insulating ceramics layer located on a surface of the pressure chamber plate to cover the pressure chamber; a piezoelectric layer located on the insulating ceramics layer; and a first electrode located on the piezoelectric layer. The method includes: forming the insulating ceramics layer on the pressure chamber plate by heating an insulating ceramic material; forming the piezoelectric layer and the first electrode on the insulating ceramics layer; forming the piezoelectric layer including annealing the piezoelectric layer at the annealing temperature; and forming the pressure chamber by removing a part of the pressure chamber plate so that a part of the insulating ceramics layer is exposed on the pressure chamber.

SYSTEM AND METHODS FOR DEPOSITION SPRAY OF PARTICULATE COATINGS
20170348726 · 2017-12-07 ·

A particle deposition system can have a particle source providing a nanomaterial at a controlled rate and a gas distribution system coupled with the particle source and operable to receive the nanomaterial aerosol. A high pressure chamber can be coupled with the gas distribution system, and a nozzle can be disposed between the high pressure chamber and a low pressure chamber. The nozzle can have a nozzle opening allowing fluidic communication of a nanomaterial aerosol between the high pressure chamber and the low pressure chamber and the opening can have a length exceeding a width.

Method for forming palladium thin film on glass substrate

A method of making a nanostructured palladium thin film electrode is described. The method involves contacting a substrate with an aerosol comprising a solvent and a Pd(II) compound. The substrate is heated, and no hydrogen gas or an additional reducing agent is required to reduce the Pd(II) to form the deposited thin film. The nanostructured palladium thin film electrode is capable of detecting compounds such as hydrazine in an aqueous sample with a 10 nM limit of detection.

Method for forming palladium thin film on glass substrate

A method of making a nanostructured palladium thin film electrode is described. The method involves contacting a substrate with an aerosol comprising a solvent and a Pd(II) compound. The substrate is heated, and no hydrogen gas or an additional reducing agent is required to reduce the Pd(II) to form the deposited thin film. The nanostructured palladium thin film electrode is capable of detecting compounds such as hydrazine in an aqueous sample with a 10 nM limit of detection.

Method of forming metal film
09828694 · 2017-11-28 · ·

Provided is a metal film forming method which can form a metal film having excellent adhesion industrially advantageously and a metal film formed by using the method. A method of forming a metal film on a base includes an atomization step of atomizing a raw-material solution into a mist, in which the raw-material is prepared by dissolving or dispersing a metal in an organic solvent containing an oxidant, a chelating agent, or a protonic acid; a carrier-gas supply step of supplying a carrier gas to the mist; a mist supply step of supplying the mist onto the base using the carrier gas; and a metal-film formation step of forming the metal film on part or all of a surface of the base to causing the mist to thermally react.

AEROSOL ASSISTED DEPOSITION PROCESS FOR FORMING PALLADIUM THIN FILM ELECTRODE

A method of making a nanostructured palladium thin film electrode is described. The method involves contacting a substrate with an aerosol comprising a solvent and a Pd(II) compound. The substrate is heated, and no hydrogen gas or an additional reducing agent is required to reduce the Pd(II) to form the deposited thin film. The nanostructured palladium thin film electrode is capable of detecting compounds such as hydrazine in an aqueous sample with a 10 nM limit of detection.

AEROSOL ASSISTED DEPOSITION PROCESS FOR FORMING PALLADIUM THIN FILM ELECTRODE

A method of making a nanostructured palladium thin film electrode is described. The method involves contacting a substrate with an aerosol comprising a solvent and a Pd(II) compound. The substrate is heated, and no hydrogen gas or an additional reducing agent is required to reduce the Pd(II) to form the deposited thin film. The nanostructured palladium thin film electrode is capable of detecting compounds such as hydrazine in an aqueous sample with a 10 nM limit of detection.

DERIVATIZATION APPARATUS AND METHOD

A derivatization apparatus and method for coating a sample carrier with a reagent solution. The derivatization apparatus consists of a closed system in which a small quantity of reagent solution is sprayed into a closed container via a spray nozzle. A sample carrier is located in the closed container and is coated as homogeneously as possible with the reagent solution.

FILM FORMING APPARATUS

The present invention provides a film forming apparatus having a mist spray nozzle which enables a prevention of a generation of a clogging. The film forming apparatus according to the present invention is provided with a mist spray head (100) for spraying a raw material. The mist spray head (100) includes a raw material spray nozzle (N1) and a raw material ejection part (7) for ejecting an atomized raw material, and the raw material spray nozzle (N1) includes a cavity (2, 3) and a raw material discharge part (5) which is drilled in a side surface of the cavity (2, 3), being away from a bottom surface of the cavity (2, 3), and is connected to the raw material ejection part (7).