A method for producing a doping raw-material solution for film formation includes a step of firstly mixing a solute including a halogen-containing organic dopant compound or a dopant halide with a first solvent, but not with other solvents to prepare a dopant precursor solution separately from a film-forming raw material, where an acidic solvent is used as the first solvent. A method for producing a doping raw-material solution for film formation enables stable formation of a high-quality thin film having excellent electric characteristics.

High-purity gallium nitride particles having a low oxygen content suitable for a raw material or a sintered body is provided. Gallium nitride particles characterized in that the oxygen content is 0.5 at % or less and the total impurity amount of elements, Si, Ge, Sn, Pb, Be, Mg, Ca, Sr, Ba, Zn and Cd, is less than 10 wtppm are used.

A rapid method of synthesizing nanoflowers made of nanoflakes of nickel molybdate (NiMoO.sub.4) directly on nickel foam (NF) through an aerosol-assisted chemical vapor deposition (AACVD) process is disclosed. The nickel molybdate nanoflowers were grown on NF by varying the deposition time for 60 and 120 min at a fixed temperature of 480° C. and their efficiency was investigated as oxygen evolution reaction (OER) catalysts in 1 M KOH electrolyte. The NiMoO.sub.4 nanoflowers of NF obtained after 60 minutes of AACVD process showed OER performance with lowest overpotential of 320 mV to reach standard current density of 10 mA cm.sup.−2. The catalyst continuously performed the OER for 15 h, signifying its prominent stability under electrochemical conditions.

A CaTiO.sub.3—TiO.sub.2 composite electrode and method of making is described. The composite electrode comprises a substrate with an average 2-12 μm thick layer of CaTiO.sub.3—TiO.sub.2 composite particles having average diameters of 0.2-2.2 μm. The method of making the composite electrode involves contacting the substrate with an aerosol comprising a solvent, a calcium complex, and a titanium complex. The CaTiO.sub.3—TiO.sub.2 composite electrode is capable of being used in a photoelectrochemical cell for water splitting.

A particle deposition system can have a particle source providing a nanomaterial at a controlled rate and a gas distribution system coupled with the particle source and operable to receive the nanomaterial aerosol. A high pressure chamber can be coupled with the gas distribution system, and a nozzle can be disposed between the high pressure chamber and a low pressure chamber. The nozzle can have a nozzle opening allowing fluidic communication of a nanomaterial aerosol between the high pressure chamber and the low pressure chamber and the opening can have a length exceeding a width.

Provided is a semiconductor film having a corundum-type crystal structure composed of α-Ga.sub.2O.sub.3 or an α-Ga.sub.2O.sub.3 solid solution, and an X-ray rocking curve full width at half maximum of a (104) plane on at least one surface of the semiconductor film is 500 arcsec or less.

Various embodiments include an exemplary design of an apparatus and related process to reduce or eliminate de-gassing from a liquid precursor during dispensing of the liquid precursor under vacuum. In one embodiment, the apparatus includes a liquid-flow controller configured to be coupled to a liquid-supply vessel containing the liquid precursor, and at least one valve hydraulically coupled downstream of and to the liquid-flow controller by a liquid line. The at least one valve is to be opened and closed to maintain a minimum pressure that is sufficiently high enough to reduce or prevent degassing of the liquid precursor throughout the liquid line. An atomizer is hydraulically coupled downstream of and to the at least one valve. The atomizer can produce droplets of the liquid precursor and is further to be coupled on a downstream side to a vacuum source. Other methods and apparatuses are disclosed.

Process for manufacturing a nuclear component that includes i) a support containing a substrate based on a metal, the substrate being coated or not coated with as interposed layer positioned between the substrate and at least one protective layer and ii) the protective layer composed of a protective material including partially metastable chromium; the process includes a step a) of vaporizing a mother solution followed by a step b) of depositing the protective layer onto the support via a process of chemical vapor deposition of an organometallic compound by direct liquid injection (DLI-MOCVD).

A two-step method is provided for the immobilization of a biomolecule through a linking molecule on a sample surface of a substrate by generating and maintaining a non-thermal atmospheric pressure plasma at a temperature between room temperature and 60° C. The preferred plasma temperature is room temperature. The method comprises of a first step and second step, which are sequentially carried out. In the first step of the method, the linking molecule is deposited onto the sample surface through exposing the sample surface to a first plasma jet and the linking molecule, generating a linking layer onto the sample surface. In a second sequential step of the method, the biomolecule is deposited onto the linking layer through exposing the linking layer to a second plasma jet and the biomolecule.

A precursor diffusion device configured to diffuse a growth precursor towards an external growth surface included on an external growth member, the diffusion device including a container including at least one porous element having a porosity configured to allow or prevent the passage of a precursor fluid through a thickness of the porous element, the porous element being configured so that the precursor fluid which passes through the thickness of the porous element generates an aerosol by fragmentation of the precursor fluid, the aerosol being formed of droplets of the precursor fluid. Also, a method for depositing a layer on a growth surface by such a diffusion device.