Embodiments disclosed herein generally relate to a gas distribution assembly for providing improved uniform distribution of processing gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a blocker plate, and a dual zone showerhead. The gas distribution assembly provides for independent center to edge flow zonality, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.

Herein disclosed are systems and methods related to remote delivery systems using solid source chemical bulk fill vessels. The delivery system can include a vapor deposition reactor, two or more bulk fill vessels remote from the vapor deposition reactor, an interconnect line, a line heater, and a gas panel comprising one or more valves. Each bulk fill vessel is configured to hold solid source chemical reactant therein. The bulk fill vessels can each include fluid outlets. The interconnect line can fluidly connect the vapor deposition reactor with each bulk fill vessel. The line heater can heat at least a portion of the interconnect line to at least a minimum line temperature. The one or more valves of the gas panel can switch a flow of vaporized chemical reactant through the interconnect line from being from one fluid outlet to being from another fluid outlet.

A vaporizer system is provided that allows for rapid shifts in the flow rate of a vaporized reactant while maintaining a constant overall flow rate of vaporized reactant and carrier gas.

[Problem] To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened.

[Means for Resolution] The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.

Gas distribution assemblies are described including an annular body, an upper plate, and a lower plate. The upper plate may define a first plurality of apertures, and the lower plate may define a second and third plurality of apertures. The upper and lower plates may be coupled with one another and the annular body such that the first and second apertures produce channels through the gas distribution assemblies, and a volume is defined between the upper and lower plates.

Various embodiments include systems and apparatuses for divertless dosing of process gases, including divertless dosing of precursor gases in deposition systems. In one example, the disclosed subject matter is a divertless, pressure-based gas-dosing system that includes a process gas inlet coupled to an inlet valve, a flow controller coupled to be downstream of the inlet valve, and a line charge-volume (LCV) coupled to be downstream of the inlet valve and the flow controller. The LCV is to receive an initial single-dose of the process gas. A pressure sensor is coupled to the LCV to determine a pressure level within the LCV and an outlet valve is pneumatically coupled to be downstream of the LCV. The outlet valve is to be coupled pneumatically on a downstream side of the outlet valve to a process chamber. Other systems, apparatuses, and methods are disclosed.

Various embodiments include an apparatus to supply gases to a tool. In various examples, the apparatus includes a point-of-use (POU) valve manifold that includes a manifold body to couple to a chamber of the tool. The manifold body has multiple gas outlet ports. A purge-gas outlet port of the manifold body is directed substantially toward the outlet ports. For each of multiple gases to be input to the POU-valve manifold, the POU-valve manifold further includes: a first valve coupled to the manifold body and a divert valve coupled to the first valve. The first valve can be coupled to a gas supply and has a separate gas flow path internal to the manifold body and separate from remaining ones of the gas flow paths. The divert valve diverts the gas during a period when the precursor gas is not to be directed into the chamber by the first valve. Other examples are disclosed.

A source gas supply method for supplying a source gas to a processing part through a line by a carrier gas is provided. The source gas is generated by vaporizing a film forming source by heating a source container in which the film forming source is stored and a filling gas is filled. The method comprises replacing the filling gas in the source container with a replacement gas that does not deteriorate the source gas, determining whether or not the replacement with the replacement gas has been performed by measuring a pressure in the line using a pressure gauge, and heating the source container and supplying the source gas when it is determined that the replacement with the replacement gas has been performed.

An ozone supply system includes a supply path configured to supply a gas, and an ozone generator, provided in the supply path, and configured to generate ozone using oxygen gas supplied from an upstream end of the supply path, and supply an ozone-containing gas containing the ozone to a downstream end of the ozone generator. The supply path branches into a plurality of branching paths on the downstream end. At least one branching path of the plurality of branching paths is a process branching path connected to a processing part that uses the ozone-containing gas, and a remaining branching path, other than the at least one branching path, of the plurality of branching paths is a waste branching path connected to a waste part configured to discharge the ozone-containing gas. The waste branching path includes a waste flow controller configured to control a flow rate of the ozone-containing gas.

An actuator includes a casing having a first annular groove formed in an inner peripheral portion thereof; a piston having a second annular groove formed in an outer peripheral portion thereof, provided in the casing to form a pressure chamber together with the casing, and driven by a drive fluid from an outside of the actuator; and an annular seal member having a first fitting portion to be fitted into the first annular groove and a second fitting portion to be fitted into the second annular groove to seal the pressure chamber.