Provided is a decorative article including a black hard coating film which is excellently inhibited from suffering a deterioration of appearance quality such as a scratch due to use thereof, and which has excellent decorativeness. The decorative article according to the present invention is a decorative article including: a base; and a black hard coating film which is formed on the base, and which includes diamond-like carbon, wherein the hydrogen content of a surface, reverse to a surface closer to the base, of the black hard coating film is more than the hydrogen content of the surface, closer to the base, of the black hard coating film; and the hydrogen content of the surface, reverse to the surface closer to the base, of the black hard coating film is 30.0 to 75.0 atm %.

Provided is a decorative article including a black hard coating film which is excellently inhibited from suffering a deterioration of appearance quality such as a scratch due to use thereof, and which has excellent decorativeness. The decorative article according to the present invention is a decorative article including: a base; and a black hard coating film which is formed on the base, and which includes diamond-like carbon, wherein the hydrogen content of a surface, reverse to a surface closer to the base, of the black hard coating film is more than the hydrogen content of the surface, closer to the base, of the black hard coating film; and the hydrogen content of the surface, reverse to the surface closer to the base, of the black hard coating film is 30.0 to 75.0 atm %.

A component of an internal combustion engine with anti-fouling (e.g., anti-coking) properties, said component comprising a metal surface; a plasma deposition formed layer comprising silicon, oxygen, and hydrogen on at least a portion of said metal surface; and an anti-fouling coating, of an at least partially fluorinated composition comprising at least one silane group, on at least a portion of a surface of said layer.

A component of an internal combustion engine with anti-fouling (e.g., anti-coking) properties, said component comprising a metal surface; a plasma deposition formed layer comprising silicon, oxygen, and hydrogen on at least a portion of said metal surface; and an anti-fouling coating, of an at least partially fluorinated composition comprising at least one silane group, on at least a portion of a surface of said layer.

A plasma-enhanced chemical vapor deposition (PE-CVD) apparatus includes a chamber including a circumferential pumping channel, a substrate support disposed within the chamber, one or more gas inlets for introducing gas into the chamber, a plasma production device for producing a plasma in the chamber, and an upper and a lower element positioned in the chamber. The upper element is spaced apart from the substrate support to confine the plasma and to define a first circumferential pumping gap, and the upper element acts as a radially inward wall of the circumferential pumping channel. The upper and lower elements are radially spaced apart to define a second circumferential pumping gap which acts as an entrance to the circumferential pumping channel, in which the second circumferential pumping gap is wider than the first circumferential pumping gap.

A plasma-enhanced chemical vapor deposition (PE-CVD) apparatus includes a chamber including a circumferential pumping channel, a substrate support disposed within the chamber, one or more gas inlets for introducing gas into the chamber, a plasma production device for producing a plasma in the chamber, and an upper and a lower element positioned in the chamber. The upper element is spaced apart from the substrate support to confine the plasma and to define a first circumferential pumping gap, and the upper element acts as a radially inward wall of the circumferential pumping channel. The upper and lower elements are radially spaced apart to define a second circumferential pumping gap which acts as an entrance to the circumferential pumping channel, in which the second circumferential pumping gap is wider than the first circumferential pumping gap.

The present invention provides a gas jetting apparatus for a film formation apparatus. The gas jetting apparatus is capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus (100) according to the present invention includes a gas jetting cell unit (23) for rectifying a gas and jetting the rectified gas into the film formation apparatus (200). The gas jetting cell unit (23) has a fan shape internally formed with a gap (d0) serving as a gas route. A gas in a gas dispersion supply unit (99) enters from a wider-width side of the fan shape into the gap (d0), and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus (200).

A break resistant sapphire plate and a corresponding production process. The sapphire plate may include a planar sapphire substrate, and at least one shock absorbing layer arranged on a surface of the substrate. The shock absorbing layer may have a thickness of between 0.1% to 10% of the thickness of the substrate. The production process for producing the sapphire plate may include providing a planar sapphire substrate, and coating at least one surface of the substrate with a shock absorbing layer. The shock absorbing layer may include a layer thickness between 0.1% to 10% of the thickness of the substrate.

A break resistant sapphire plate and a corresponding production process. The sapphire plate may include a planar sapphire substrate, and at least one shock absorbing layer arranged on a surface of the substrate. The shock absorbing layer may have a thickness of between 0.1% to 10% of the thickness of the substrate. The production process for producing the sapphire plate may include providing a planar sapphire substrate, and coating at least one surface of the substrate with a shock absorbing layer. The shock absorbing layer may include a layer thickness between 0.1% to 10% of the thickness of the substrate.

Linear coils, a first ceramic block, and a second ceramic block are arranged in an inductively-coupled plasma torch. A chamber has an annular shape. Plasma generated inside the chamber is ejected to a substrate through an opening portion in the chamber. The substrate is processed by relatively moving the chamber and the substrate in a direction perpendicular to a longitudinal direction of the opening portion. The coil is arranged inside a rotating cylindrical ceramic pipe. Accordingly, the plasma can be generated with excellent power efficiency, and fast plasma processing can be performed.