A gas barrier film has, in sequence, a support, an inorganic layer disposed on one surface side of the support, an adhesive layer disposed on a surface of the inorganic layer, and a resin layer disposed on a surface of the adhesive layer in which the adhesive layer has a thickness of 15 μm or less, and the adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less. A method for producing a gas barrier film includes an inorganic layer deposition step and a bonding step in a vacuum.

Disclosed is a degradable film (1) in which a barrier layer (3) is disposed on a surface of a water-soluble polymer layer (2). The water-soluble polymer layer (2) is made of a water-soluble polymer such as polyvinyl alcohol or polyvinyl pyrrolidone. The barrier layer (3) is made of silicon oxide or silicon oxynitride. The barrier layer (3) is formed on the water-soluble polymer layer (2) by a CVD process with the supply of a raw material gas containing a precursor of a substance that forms the barrier layer (3), an ozone gas with an oxygen concentration of 20 vol % or higher and an unsaturated hydrocarbon gas to the water-soluble polymer layer (2).

The present disclosure relates to a laminated body including at least a base material layer containing at least a flexible base material and an inorganic thin film layer, in which a distribution curve of I.sub.O2/I.sub.Si has at least one maximum value (I.sub.O2/I.sub.Si).sub.maxBD in a region BD between a depth B and a depth D, where ionic strengths of Si.sup.−, C.sup.−, and O.sub.2.sup.− are each denoted as I.sub.Si, I.sub.C, and I.sub.O2 in a depth profile measured from a surface of the laminated body on an inorganic thin film layer side in a thickness direction using a time-of-flight secondary ion mass spectrometer (TOF-SIMS), an average ionic strength in a region A1 in which an absolute value of a coefficient of variation of an ionic strength value on a base material layer side is within 5% is denoted as I.sub.CA1, a depth that is closest to the region A1 on a surface side of the inorganic thin film layer with respect to the region A1 and exhibits an ionic strength to be 0.5 times or less the I.sub.CA1 is denoted as A2, and a depth that is closest to A2 on a surface side of the inorganic thin film layer with respect to A2 and exhibits a minimum value is denoted as A3 in an ionic strength curve of C.sup.−, and a depth that is closest to A3 on a surface side of the inorganic thin film layer with respect to A3 and has a differential value of 0 or more is denoted as B, a depth that is closest to A3 on a base material layer side with respect to A3 and exhibits a maximum value d(I.sub.C).sub.max of differential distribution value is denoted as C, and a depth that is closest to C on a base material layer side with respect to C and has an absolute value of differential value to be 0.01 times or less the d(I.sub.C).sub.max is denoted as D in a first-order differential curve of ionic strength of C.sup.−.

Treatment solutions and methods for treating a substrate including forming a first layer on a surface of the substrate, providing a process gas to the one or more plasma sources, the process gas includes a gas mixture of a reactive gas species and an inert gas species; forming a plasma under vacuum in the one or more plasma sources; and exposing the substrate to the plasma under vacuum to treat the first layer on the surface of the substrate.

A method of coating an interior surface of a housing defining a volume includes partitioning the volume into a first zone and a second zone, the first zone isolated from fluid communication with the second zone; introducing one or more reactant gases, plasma, ions, or a combination thereof to the first zone and the second zone; and forming one or more coating layers on all or a portion of the interior surface within the first and second zones via reaction of the reactant gases, the plasma, or the combination thereof. A device for coating an interior surface of a housing is also provided.

A multilayer electrically conductive wire includes a central support core, and a set of pairs of layers each including at least one intercalary layer made of a non-carbon material, wherein the first layer of the first pair of layers is deposited on the outer surface of the central core and the first layer of the N+1 pair of layers is deposited on the second layer of the N pair of layers such that each graphene layer of each N pair is separated from another graphene layer of another pair of layers by an intercalary layer of another non-carbon based material.

A method for deposition of nitrogen-doped nanocarbon comprises disposing molten polymer and a heated substrate in a plasma reactor; providing dense nitrogen-containing plasma in the plasma reactor in a space between the molten polymer and the heated substrate; and allowing the dense nitrogen-containing plasma to interact with both the molten polymer and the heated substrate to form a film of nitrogen-containing nanocarbon on the heated substrate.

An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.

A method is provided for growing a fiber structure, where the method includes: obtaining a substrate, growing an array of pedestal fibers on the substrate, growing fibers on the pedestal fibers, and depositing a coating surrounding each of the fibers. In another aspect, a method of fabricating a fiber structure includes obtaining a substrate and growing a plurality of fibers on the substrate according to 1½D printing. In another aspect, a multilayer functional fiber is provided produced by, for instance, the above-noted methods.

A method of fabricating a CMC part, includes coating a plurality of tows with an interphase by transporting the tows through a treatment chamber in which a gas phase is injected, the tows being tensioned during their transport and the interphase being formed by vapor deposition from the injected gas phase; forming a fiber preform by performing three-dimensional weaving using the tows coated with the interphase; and forming a consolidated fiber preform by treating the fiber preform by chemical vapor infiltration to form a consolidation phase on the interphase, the consolidation phase comprising silicon carbide and having a Young's modulus greater than or equal to 350 GPa.