C23C16/545

Plasma reactor with electrode assembly for moving substrate

A processing tool for a plasma process includes a chamber body that has an interior space that provides a plasma chamber and that has a ceiling and an opening on a side opposite the ceiling, a workpiece support to hold a workpiece such that at least a portion of a front surface of the workpiece faces the opening, an actuator to generate relative motion between the chamber body and the workpiece support such that the opening moves laterally across the workpiece, a gas distributor to deliver a processing gas to the plasma chamber, an electrode assembly comprising a plurality of coplanar filaments extending laterally through the plasma chamber between the workpiece support and the ceiling, each of the plurality of filaments including a conductor, and a first RF power source to supply a first RF power to the conductors of the electrode assembly to form a plasma.

METHOD FOR FUNCTIONALIZING A POLYMER-BASED SUBSTRATE BY CHEMICAL DEPOSITION OF A THIN LAYER

A method for functionalizing a cellulose-based substrate by chemical deposition of at least one thin layer, from gaseous precursors. The method includes the provision of a substrate including at least one sheet having a first face and a second face, of surface roughness greater than or equal to 0.1 μm. The first face has a part superposed to another part belonging to the first face or to the second face. A spacing between said parts is conserved at least locally, so as to enable a diffusion of the gaseous precursors. The method also includes the gaseous chemical deposition of at least one thin layer on the substrate such as provided by diffusion of the gaseous precursors, the gaseous precursors diffusing at least in each spacing.

CLEANING MATERIALS AND PROCESSES FOR LITHIUM PROCESSING EQUIPMENT

Exemplary methods of removing lithium-containing deposits may include heating a surface of a lithium-containing deposit. The surface may include oxygen or nitrogen, and the lithium-containing deposit may be disposed on a surface of a processing chamber. The methods may include contacting the surface of the lithium-containing deposit with a hydrogen-containing precursor. The contacting may hydrogenate the surface of the lithium-containing deposit. The methods may include contacting the lithium-containing deposit with a nitrogen-containing precursor to form volatile byproducts. The methods may include exhausting the volatile byproducts of the lithium-containing deposit from the processing chamber.

PLASMA COATING WITH NANOMATERIAL

A coating which can be applied an article. The coating may comprise an upper side and a lower side. The coating may be applied to at least one surface of the article, and wherein the coating may be formed from a monomer and a nanomaterial which have been exposed to a plasma, in which the monomer is at least partially polymerised by the plasma.

PROTECTION LAYER SOURCES

Methods, systems, and apparatuses for coating flexible substrates are provided. A coating system includes an unwinding module housing a feed reel capable of providing a continuous sheet of flexible material, a winding module housing a take-up reel capable of storing the continuous sheet of flexible material, and a processing module arranged downstream from the unwinding module. The processing module includes a plurality of sub-chambers arranged in sequence, each configured to perform one or more processing operations to the continuous sheet of flexible material. The processing module includes a coating drum capable of guiding the continuous sheet of flexible material past the plurality of sub-chambers along a travel direction. The sub-chambers are radially disposed about the coating drum and at least one of the sub-chambers includes a deposition module. The deposition module includes a pair of electron beam sources positioned side-by-side along a transverse direction perpendicular to the travel direction.

Methods for treating a substrate and method for making articles comprising bonded sheets

Described herein are articles and methods of making articles, for example glass articles, including a sheet and a carrier, wherein the sheet and carrier are bonded together using a coating layer, which is, for example, a fluorocarbon polymer coating layer, and associated deposition methods and inert gas treatments that may be applied on the sheet, the carrier, or both, to control the fluorine content of the coating layer and van der Waals, hydrogen and covalent bonding between the sheet and the carrier. The coating layer bonds the sheet and carrier together with sufficient bond strength to prevent delamination of the sheet and the carrier during high temperature processing to while preventing a permanent bond at during high temperature processing while at the same time maintaining a sufficient bond to prevent delamination during high temperature processing.

METHOD OF MANUFACTURING GAS BARRIER FILM
20230257874 · 2023-08-17 · ·

A method of manufacturing a gas barrier film comprises, a first film forming step of forming a base layer; a second film forming step of forming a silicon nitride layer on a surface of the base layer; and a third film forming step of forming a protective inorganic layer on a surface of the silicon nitride layer, wherein each of the second film forming step and the third film forming step includes film forming by plasma CVD, wherein the gas barrier film includes the substrate, the base layer, the silicon nitride layer, and the protective inorganic layer, in which the protective inorganic layer formed of silicon oxide, a thickness of the silicon nitride layer is 3 nm to 100 nm, and a ratio t.sub.2/t.sub.1 of a thickness t.sub.2 of the protective inorganic layer to the thickness t.sub.1 of the silicon nitride layer 3 to 80.

ROLL TO ROLL ATOMIC LAYER DEPOSITION APPARATUS
20220136105 · 2022-05-05 · ·

Proposed is a roll to roll atomic layer deposition apparatus, which deposits an atomic layer on a porous material, the roll to roll atomic layer deposition apparatus including: a pair of winding rollers disposed to be spaced apart from each other and configured to allow two opposite side portions of the porous material in a longitudinal direction to be wound therearound, the pair of winding rollers being configured to reciprocatingly move the porous material in the longitudinal direction; one or more source substance supply units disposed between the pair of winding rollers and configured to supply a source substance to the porous material; and one or more pumps configured to suck the source substance supplied from the one or more source substance supply units, in which the one or more pumps are disposed to correspond to the one or more source substance supply units.

A METHOD OF FORMING A DIAMOND COATING ON A CARBON MATERIAL

Disclosed is a method of forming a conductive diamond layer on a surface of a carbon fibre substrate that is used as a component of an electrode for neural stimulation and/or electrochemical sensing. The method comprises functionalising at least a portion of the surface with a functionalising agent to facilitate coating the surface with the conductive diamond layer. The method also comprises providing a diamond precursor and depositing the diamond precursor over the functionalising agent to form the conductive diamond layer. The disclosure also relates to an electrode that is used as a component of an electrode for neural stimulation and/or electrochemical sensing.

WATER BARRIER LAMINATE

A water barrier laminate including inorganic barrier and water-trapping layers alternately arranged in order from the side facing the device to the outer side: a first inorganic barrier layer, a first water-trapping layer, a second inorganic barrier layer, a second water-trapping layer and a third inorganic barrier layer. A water-permeable underlying plastic layer is provided on one side of these inorganic barrier layers; a distance L1a between the first water-trapping layer and the first inorganic barrier layer and a distance L2a between the second water-trapping layer and the second barrier satisfy formulas (1) and (2):


L1a<3 μm  (1)


L2a<3 μm  (2)

and a distance L1b between the second inorganic barrier layer and the first water-trapping layer satisfies formula (3):


L1b≤3 μm  (3)

by interposing a water-permeable organic layer therebetween.