Patent classifications
C23C22/24
METHOD FOR MANUFACTURING A PROCESS APPARATUS AND A PROCESS APPARATUS
The invention concerns a method for manufacturing a process apparatus for moving liquid in high temperature liquid immersion under aggressive chemical environment and dynamic stress, wherein the method comprises the step of lining the process apparatus formed of stainless steel with rubber, wherein the method further comprises the step of forming a passivation layer on a surface of the process apparatus in an acid bath prior to lining the process apparatus comprising the passivation layer with rubber. The invention also concerns a process apparatus.
STAINLESS STEEL PLATE
Provided is a stainless steel plate having superior galling resistance and press formability during press forming even using general-purpose stainless steel and using an extreme pressure additive, such as a non-chlorine-based additive, and low viscosity press oil. On one main surface of the stainless steel, a cross-sectional triangular-shaped depression is formed along a grain boundary exposed on a base surface of the stainless steel. A surface coating is formed on the one main surface of the stainless steel, which contains the surface of the depression. The surface film is an oxide and/or a hydroxide with Fe and Cr as main components, and the surface film has a thickness of 0.1-3.0 m. Furthermore, this surface film contains an atomic percent of Cr of 10% or greater with the remainder being substantially Fe and has an oxide coating and/or hydroxide coating with a thickness of 0.1-3.0 m.
SURFACE TREATMENT METHOD FOR NICKEL-BASED METALLIC GLASSES TO REDUCE NICKEL RELEASE
Surface treatment methods for Ni-based metallic glasses are provided that promote passivation and decrease the amount of Ni released when the Ni-based metallic glass is exposed to a saline containing environment.
Lithium-ion secondary battery, electrode for the secondary battery, and electrolytic copper foil for electrode for the secondary battery
To provide an electrolytic copper foil for a negative electrode for a lithium-ion secondary battery with which it is possible to produce a long-life lithium-ion secondary battery in which there is no decline in the capacity retention ratio even when the charge-discharge cycling is repeated, that has long life, and no deformation of a negative electrode current collector occurs. The electrolytic copper foil constituting the negative electrode current collector for the lithium-ion secondary battery has, after heat treatment at from 200 to 400 C., a 0.2% proof stress of 250 N/mm.sup.2 or more, and elongation of 2.5% or more; and the surface on which an active material layer of the electrolytic copper foil is provided has been rust-proofed, or roughened and rust-proofed. As a result of analysis of the depth profile (depth direction) obtained by performing secondary ion mass spectrometry (SIMS) in the thickness direction of the copper foil, the copper foil including: chlorine (Cl), carbon (C), and oxygen (O) each in a concentration of 10.sup.17 to 510.sup.20 atoms/cm.sup.3, and sulfur (S) and nitrogen (N) each in a concentration of 10.sup.15 to 10.sup.19 atoms/cm.sup.3.
Lithium-ion secondary battery, electrode for the secondary battery, and electrolytic copper foil for electrode for the secondary battery
To provide an electrolytic copper foil for a negative electrode for a lithium-ion secondary battery with which it is possible to produce a long-life lithium-ion secondary battery in which there is no decline in the capacity retention ratio even when the charge-discharge cycling is repeated, that has long life, and no deformation of a negative electrode current collector occurs. The electrolytic copper foil constituting the negative electrode current collector for the lithium-ion secondary battery has, after heat treatment at from 200 to 400 C., a 0.2% proof stress of 250 N/mm.sup.2 or more, and elongation of 2.5% or more; and the surface on which an active material layer of the electrolytic copper foil is provided has been rust-proofed, or roughened and rust-proofed. As a result of analysis of the depth profile (depth direction) obtained by performing secondary ion mass spectrometry (SIMS) in the thickness direction of the copper foil, the copper foil including: chlorine (Cl), carbon (C), and oxygen (O) each in a concentration of 10.sup.17 to 510.sup.20 atoms/cm.sup.3, and sulfur (S) and nitrogen (N) each in a concentration of 10.sup.15 to 10.sup.19 atoms/cm.sup.3.
MANUFACTURING METHOD FOR TINPLATE
Disclosed is a manufacturing method for a tinplate, relating to the technical field of steel plate manufacturing. With regard to the manufacturing method for a tinplate: in the step of flattening a base plate, double stands are used for flattening, a first stand working roller have a surface roughness value Ra of 1.6-1.7 m and a rolling force of 5000-6000 kN, and a second stand working roller have a surface roughness value Ra of 0.5-0.6 m and a rolling force of 3000-4000 kN; in the step of electroplating the base plate, an electroplating solution have a Sn.sup.2+ concentration of 14-19 g/L; and in the step of passivating the base plate, a passivation solution have a temperature of 41-43 C., a pH value of 4.4-4.6, and a concentration of 16-18 g/L, the passivation electric charge density being 120-180 C/m.sup.2.
MANUFACTURING METHOD FOR TINPLATE
Disclosed is a manufacturing method for a tinplate, relating to the technical field of steel plate manufacturing. With regard to the manufacturing method for a tinplate: in the step of flattening a base plate, double stands are used for flattening, a first stand working roller have a surface roughness value Ra of 1.6-1.7 m and a rolling force of 5000-6000 kN, and a second stand working roller have a surface roughness value Ra of 0.5-0.6 m and a rolling force of 3000-4000 kN; in the step of electroplating the base plate, an electroplating solution have a Sn.sup.2+ concentration of 14-19 g/L; and in the step of passivating the base plate, a passivation solution have a temperature of 41-43 C., a pH value of 4.4-4.6, and a concentration of 16-18 g/L, the passivation electric charge density being 120-180 C/m.sup.2.
Acidic treatment liquid processing apparatus, acidic treatment liquid processing method, surface treatment system, and surface treatment method
An acidic treatment liquid processing apparatus includes: a tank having an interior space; a diaphragm permeable to a metal cation and separating the interior space of the tank into a first chamber and a second chamber; a first electrode disposed in the first chamber; a second electrode disposed in the second chamber; a power supply configured to apply a voltage while using the first electrode as an anode and the second electrode as a cathode; a first liquid passing part configured to pass an acidic treatment liquid containing a dichromate ion and a metal cation into the first chamber; and a second liquid passing part configured to pass an acid aqueous solution into the second chamber.
Acidic treatment liquid processing apparatus, acidic treatment liquid processing method, surface treatment system, and surface treatment method
An acidic treatment liquid processing apparatus includes: a tank having an interior space; a diaphragm permeable to a metal cation and separating the interior space of the tank into a first chamber and a second chamber; a first electrode disposed in the first chamber; a second electrode disposed in the second chamber; a power supply configured to apply a voltage while using the first electrode as an anode and the second electrode as a cathode; a first liquid passing part configured to pass an acidic treatment liquid containing a dichromate ion and a metal cation into the first chamber; and a second liquid passing part configured to pass an acid aqueous solution into the second chamber.
Metal Material and Use Thereof in Preparing Metal Model
The present invention provides a metal material and use thereof in preparing a metal model. The metal material comprises the following ingredients in percentage by weight: C0.06%, Si1.00%, 1.00%Mn4.00%, P0.045%, S0.005%, 20.00%Cr22.00%, 8.50%Ni10.50%, 1.00%Mos2.50%, 1.00%Cu3.50%, 0.20%N0.30%, with the balance being Fe; the pitting resistance equivalent number (PREN) of the metal material is calculated according to the formula: PREN=Cr %+3.3M0%+16N %, and the result is PREN30.0%