A composition for inhibiting corrosion and/or removing hydrocarbonaceous deposits in oil and gas applications is provided. The composition comprises an iron sulfide dissolver, an organic solvent, and a corrosion inhibitor.

This invention provides a liquid composition that removes titanium nitride from a substrate without corroding tungsten or a low-k interlayer dielectric also present on said substrate. Said liquid composition has a pH between 0 and 4, inclusive, and contains the following: at least one oxidizing agent (A) selected from the group consisting of potassium permanganate, ammonium peroxodisulfate, potassium peroxodisulfate, and sodium peroxodisulfate; a fluorine compound (B); and a tungsten-corrosion preventer (C). The tungsten-corrosion preventer (C) either contains at least two different compounds selected from a group of compounds (C1) consisting of alkylamines, salts thereof, fluoroalkylamines, salts thereof, and the like or contains at least one compound selected from said group of compounds (C1) and at least one compound selected from a group of compounds (C2) consisting of polyoxyalkylene alkylamines, polyoxyalkylene fluoroalkylamines, and the like. The mass concentration of potassium permanganate in the abovementioned oxidizing agent (A) is between 0.001% and 0.1%, inclusive, and the mass concentration of the abovementioned fluorine compound (B) is between 0.01% and 1%, inclusive.

Methods of inhibiting corrosion in a benzene distillation or dryer unit are provided wherein alkenyl succinic acids or anhydrides (ASA) are brought into contact with metal surfaces thereby protecting the metal from an acidic corrosive medium flowing through the overhead. The benzene distillation column or drying tower may be utilized to purify benzene for subsequent feed of the purified benzene to an alkylation process such as in the alkylation of benzene by ethene to form ethylbenzene utilizing a zeolite alkylation catalyst.

Methods of inhibiting corrosion in a benzene distillation or dryer unit are provided wherein alkenyl succinic acids or anhydrides (ASA) are brought into contact with metal surfaces thereby protecting the metal from an acidic corrosive medium flowing through the overhead. The benzene distillation column or drying tower may be utilized to purify benzene for subsequent feed of the purified benzene to an alkylation process such as in the alkylation of benzene by ethene to form ethylbenzene utilizing a zeolite alkylation catalyst.

A corrosion inhibitor composition, which includes i) an aqueous alcohol base fluid, ii) a mixture of at least three polysaccharides selected from carboxymethyl cellulose, gum arabic, pectin, a salt of alginic acid, chitosan, dextran, hydroxyethyl cellulose, and soluble starch, with each polysaccharide that is present in the mixture being present in an amount of 0.05 to 0.5 wt. %, based on a total weight of the corrosion inhibitor composition, iii) silver nanoparticles, and iv) a pineapple leaves extract. A method of inhibiting corrosion of metal during acid cleaning/pickling whereby the metal is treated with an acidic treatment fluid containing an acid and the corrosion inhibitor composition.

A corrosion inhibitor composition, which includes i) an aqueous alcohol base fluid, ii) a mixture of at least three polysaccharides selected from carboxymethyl cellulose, gum arabic, pectin, a salt of alginic acid, chitosan, dextran, hydroxyethyl cellulose, and soluble starch, with each polysaccharide that is present in the mixture being present in an amount of 0.05 to 0.5 wt. %, based on a total weight of the corrosion inhibitor composition, iii) silver nanoparticles, and iv) a pineapple leaves extract. A method of inhibiting corrosion of metal during acid cleaning/pickling whereby the metal is treated with an acidic treatment fluid containing an acid and the corrosion inhibitor composition.

A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10.sup.−10 to 1.0×10.sup.−4.

A treatment liquid is a treatment liquid for a semiconductor device, containing a fluorine-containing compound, a corrosion inhibitor, and calcium, in which the mass content ratio of the calcium to the fluorine-containing compound in the treatment liquid is 1.0×10.sup.−10 to 1.0×10.sup.−4.

The present invention provides a surface treatment agent which is capable of efficiently removing oily substances from the surface of a metal material, while removing scales and fumes therefrom at the same time.

A surface treatment agent which contains a chelating agent, a nonionic surfactant and an anionic surfactant, and which is configured such that the anionic surfactant is composed of at least one surfactant that is selected from the group consisting of phosphoric acid ester surfactants, carboxylic acid surfactants, sulfonic acid surfactants and sulfuric acid ester surfactants.

An inhibition corrosion package for use with an acidic composition, where the package comprises a terpene component; a propargyl alcohol or derivative thereof; at least one amphoteric surfactant; and a solvent. Also disclosed are acidic compositions combining the corrosion inhibition package according to a preferred embodiment of the present invention for use in various industrial operations including but not limited to oil and gas operations. Also disclosed are methods of use of such compositions.