Patent classifications
C01B33/03
Fluidized bed reactor and a process using same to produce high purity granular polysilicon
The present invention relates to a fluidized bed reactor, comprising a reaction tube, a distributor and a heating device, the reaction tube and the distributor at the bottom of the reaction tube composing a closed space, the distributor comprising a gas inlet and a product outlet, and the reaction tube comprising a tail gas outlet and a seed inlet at the top or upper part respectively, characterized in that the reaction tube comprises a reaction inner tube and a reaction outer tube, and the heating device is an induction heating device placed within a hollow cavity formed between the external wall of the reaction inner tube and the internal wall of the reaction outer tube, wherein the hollow cavity is filled with hydrogen, nitrogen or inert gas for protection, and is able to maintain a pressure of about 0.01 to about 5 MPa; and also to a process of producing high purity granular polysilicon using the reactor. The fluidized bed reactor according to the present invention uses induction heating to heat directly the silicon particles inside the reaction chamber, such that the temperature of the reaction tube is lower than that inside the reaction chamber, which accordingly avoids deposition on the tube wall and results in more uniform heating, and thus is useful for large diameter fluidized bed reactors with much increased output for a single reactor.
Fluidized bed reactor and a process using same to produce high purity granular polysilicon
The present invention relates to a fluidized bed reactor, comprising a reaction tube, a distributor and a heating device, the reaction tube and the distributor at the bottom of the reaction tube composing a closed space, the distributor comprising a gas inlet and a product outlet, and the reaction tube comprising a tail gas outlet and a seed inlet at the top or upper part respectively, characterized in that the reaction tube comprises a reaction inner tube and a reaction outer tube, and the heating device is an induction heating device placed within a hollow cavity formed between the external wall of the reaction inner tube and the internal wall of the reaction outer tube, wherein the hollow cavity is filled with hydrogen, nitrogen or inert gas for protection, and is able to maintain a pressure of about 0.01 to about 5 MPa; and also to a process of producing high purity granular polysilicon using the reactor. The fluidized bed reactor according to the present invention uses induction heating to heat directly the silicon particles inside the reaction chamber, such that the temperature of the reaction tube is lower than that inside the reaction chamber, which accordingly avoids deposition on the tube wall and results in more uniform heating, and thus is useful for large diameter fluidized bed reactors with much increased output for a single reactor.
SILICON PARTICLES HAVING A SPECIFIC CHLORINE CONTENT, AS ACTIVE ANODE MATERIAL FOR LITHIUM ION BATTERIES
An anode active material for lithium ion batteries includes one or more unaggregated silicon particles having a mass-based chlorine content of from 5 to 200 ppm and a volume-weighted particle size distribution having diameter percentiles d.sub.50 of from 0.5 μm to 10.0 μm.
SILICON PARTICLES HAVING A SPECIFIC CHLORINE CONTENT, AS ACTIVE ANODE MATERIAL FOR LITHIUM ION BATTERIES
An anode active material for lithium ion batteries includes one or more unaggregated silicon particles having a mass-based chlorine content of from 5 to 200 ppm and a volume-weighted particle size distribution having diameter percentiles d.sub.50 of from 0.5 μm to 10.0 μm.
Powder, Electrode and Battery Comprising Such a Powder
Powder comprising particles comprising a matrix material and silicon-based domains dispersed in this matrix material, whereby the matrix material is carbon or a material that can be thermally decomposed to carbon, whereby either part of the silicon-based domains are present in the form of agglomerates of silicon-based domains whereby at least 98% of these agglomerates have a maximum size of 3 μm or less, or the silicon-based domains are not at all agglomerated into agglomerates.
Powder, Electrode and Battery Comprising Such a Powder
Powder comprising particles comprising a matrix material and silicon-based domains dispersed in this matrix material, whereby the matrix material is carbon or a material that can be thermally decomposed to carbon, whereby either part of the silicon-based domains are present in the form of agglomerates of silicon-based domains whereby at least 98% of these agglomerates have a maximum size of 3 μm or less, or the silicon-based domains are not at all agglomerated into agglomerates.
METHOD OF PRODUCING NANOPARTICLES
Disclosed is a method for producing silicon nanoparticles in a plasma reactor including a reaction chamber presenting an inner surface. The method includes introducing a halogen gas into the reaction chamber of the plasma reactor. The method further includes igniting a plasma within the reaction chamber while the halogen gas is present within the reaction chamber. Atoms of the halogen gas at least partially form a coating on the inure surface of the reaction chamber. The method includes introducing a reactant gas mixture including a silicon precursor gas and a first inert gas into the reaction chamber of the plasma reactor. The method also includes forming the silicon nanoparticles in the plasma reactor. A silicon nanoparticles composition is also disclosed. The silicon nanoparticles composition comprises the silicon nanoparticles produced according to the method.
METHOD OF PRODUCING NANOPARTICLES
Disclosed is a method for producing silicon nanoparticles in a plasma reactor including a reaction chamber presenting an inner surface. The method includes introducing a halogen gas into the reaction chamber of the plasma reactor. The method further includes igniting a plasma within the reaction chamber while the halogen gas is present within the reaction chamber. Atoms of the halogen gas at least partially form a coating on the inure surface of the reaction chamber. The method includes introducing a reactant gas mixture including a silicon precursor gas and a first inert gas into the reaction chamber of the plasma reactor. The method also includes forming the silicon nanoparticles in the plasma reactor. A silicon nanoparticles composition is also disclosed. The silicon nanoparticles composition comprises the silicon nanoparticles produced according to the method.
Method for stabilizing chlorosilane polymer
This disclosure is to make it possible to easily stabilize a chlorosilane polymer while preventing a solid chlorosilane polymer from being generated. Disclosed is a method for stabilizing a chlorosilane polymer generated secondarily in a step of a chemical vapor deposition method using chlorosilane-based gas, the method including: a step of bringing alcohol into contact with the chlorosilane polymer, degrading the chlorosilane polymer to alkoxide, hydrogen chloride and hydrogen, and diluting the degraded alkoxide with the alcohol; and a step of performing hydrolysis for the alkoxide.
PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON
Polycrystalline silicon is produced in a chemical vapour deposition reactor, wherein, outside the reactor at at least one position on at least one reactor component, vibrations of the reactor are measured using a measurement device and optionally recorded. The vibrations may be used to identify rod fall over and other events occurring within the reactor.