A method of manufacturing a coated glass pane comprising the following steps in sequence a) providing a glass substrate, b) depositing by chemical vapour deposition (CVD) at least one CVD coating on a surface of the glass substrate using titanium tetraisopropoxide (TTIP) as a precursor, and c) depositing by physical vapour deposition (PVD) at least one PVD coating on said at least one CVD coating.

A method of making a doped titanium oxide coating in a float glass manufacturing process and the coated glass article made thereby wherein the dopant is a niobium or tantalum compound. The doped titanium oxide coating preferably exhibits an electrical conductivity>110.sup.3 S/cm.

A glass substrate provided with a coating film, including a glass substrate and a coating film containing at least one TiO.sub.2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which includes forming a TiO.sub.2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm.Math.m/min.

The invention provides a glass sheet or another transparent substrate on which there is provided a static-dissipative coating. The static-dissipative coating includes a film comprising titania. The film comprising titania preferably is exposed so as to define an outermost face of the static-dissipative coating. The static-dissipative coating is characterized by an indoor dust collection factor of less than 0.145.

A coated article includes an applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film on the surface of the heated substrate. In another coating process, the mixed precursors are moved toward the substrate positioned in a plasma area between spaced electrodes to coat the surface of the substrate. Optionally, the substrate can be heated or maintained at room temperature. The deposited niobium doped titanium oxide film has a sheet resistance greater than 1.2 ohms/square and an index of refraction of 1.00 or greater. The chemical formula for the niobium doped titanium oxide is Nb:TiO.sub.x where X is in the range of 1.8-2.1.

A chemical vapor deposition process for depositing a titanium oxide coating is provided. The chemical vapor deposition process for depositing the titanium oxide coating includes providing a glass substrate. A gaseous mixture is formed. The gaseous mixture includes a titanium-containing compound and a fluorine-containing compound. The titanium-containing compound is an oxygen-containing compound or the gaseous mixture includes a first oxygen-containing compound. The gaseous mixture is directed toward and along the glass substrate. The mixture reacts over the glass substrate to form the titanium oxide coating thereon.

Superhydrophilic and antifogging non-porous TiO.sub.2 films for glass substrates and methods of providing the TiO.sub.2 films are provided. The TiO.sub.2 films may maintain a water contact angle less than 5 in the dark for five days after an annealing treatment, and the water contact angle of the TiO.sub.2 films may stabilize at less than 20 after ten days from the annealing treatment. The TiO.sub.2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO.sub.2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO.sub.2 film after depositing the TiO.sub.2 film on the glass substrate. The methods may not include UV radiation.

A heat insulating glass unit for vehicle includes a laminated glass in which a first glass plate and a second glass plate are bonded to each other via an intermediate film; a color tone compensation film arranged on at least one surface of the laminated glass; a transparent conductive layer mainly including an ITO arranged on the color tone compensation film; and an upper part layer arranged on the transparent conductive layer. A refraction index of the upper part layer for a light with a wavelength of 630 nm is 1.7 or less. The color tone compensation film has at least first and second layers. The first layer is arranged at a position closer to the laminated glass than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer.

A heat insulating glass unit for vehicle includes a glass plate; a color tone compensation film arranged on at least one surface of the glass plate; a transparent conductive layer arranged on the color tone compensation film, and mainly including an indium tin oxide (ITO); and an upper part layer arranged on the transparent conductive layer, a refraction index for a light with a wavelength of 630 nm being 1.7 or less. The color tone compensation film has at least a first layer and a second layer. The first layer is arranged at a position closer to the glass plate than the second layer. A refraction index of the first layer for a light with a wavelength of 630 nm is greater than a refraction index of the second layer for a light with a wavelength of 630 nm.

An optics system component has a stainable glass substrate, an optical coating comprising alternating layers of dielectric materials, and a buffer layer positioned on the stainable glass substrate between the substrate and the optical coating. The buffer layer comprises a dielectric material and has a thickness of less than about 20 nm.