C03C17/3615

LOW EMISSIVITY COATINGS, GLASS SURFACES INCLUDING THE SAME, AND METHODS FOR MAKING THE SAME
20200079688 · 2020-03-12 ·

A substrate having a coating is disclosed. The coating is formed of a plurality of layers. A base layer of the plurality of layers includes an alloy, and at least two additional layers include silver. A coating for a substrate is also disclosed. A method of coating a substrate is further disclosed.

Interior coatings for glass structures in electronic devices
10556823 · 2020-02-11 · ·

An electronic device may include electrical components and other components mounted within a housing. The device may have a display on a front face of the device and may have a glass layer that forms part of the housing on a rear face of the device. The glass layer and other glass structures in the electronic device may be provided with coatings. An interior coating on a glass layer may include multiple layers of material such as an adhesion promotion layer, thin-film layers of materials such as silicon, niobium oxide and other metal oxides, and metals to help adjust the appearance of the coating. A metal layer may be formed on top of the coating to serve as an environmental protection layer and opacity enhancement layer. In some configurations, the coating may include four layers.

Coated article having low-E coating with IR reflecting layer(s) and high index nitrided dielectric film having multiple layers

A coated article includes a low emissivity (low-E) coating having at least one infrared (IR) reflecting layer of a material such as silver, gold, or the like, and at least one high refractive index dielectric multilayer film. The high index dielectric multilayer film may be of or include a first high index layer of or including ZrSiN and/or ZrSiAlN, and a second high index layer of or including titanium oxide (e.g., TiO.sub.2). The first high index layer of or including ZrSiN and/or ZrSiAlN may be amorphous or substantially amorphous, and the second high index layer of or including titanium oxide may be substantially crystalline in certain example embodiments. The low-E coating may be used in applications such as monolithic or insulating glass (IG) window units, vehicle windows, or the like.

Method for partially coating a surface of an object

The invention relates to a method for partially coating a surface of an object, comprising the following steps: (a) optional hydrophobization of the surface of the object; (b) partial application of (b1) a liquid and subsequent application of a powderous or granular substance or (b2) a solution or suspension of said powderous or granular substance in a liquid; (c) drying the surface to form spatially-delimited salt or powder crusts; (d) coating the surface with at least one layer of a metal or a metal compound; and (e) removing the salt or powder crusts that have been produced. The invention also relates to products that have been produced according to the claimed method.

Low emissivity coatings, glass surfaces including the same, and methods for making the same

A substrate having a coating is disclosed. The coating is formed of a plurality of layers. A base layer of the plurality of layers includes an alloy, and at least two additional layers include silver. A coating for a substrate is also disclosed. A method of coating a substrate is further disclosed.

Articles having improved corrosion resistance

A method for enhancing metal corrosion resistance of a metal deposited on a substrate is provided. The method includes contacting the metal coated substrate with a treating composition including metal oxide nano-particles. Furthermore, a method for making a mirror comprising a substrate having a metal coated thereon is provided, wherein the method includes contacting the metal coated substrate with a treating composition including metal oxide nano-particles. Preferably, the metal oxide nano-particles are selected from one or more oxides of zinc, iridium, tin, aluminum, cerium, chromium, vanadium, titanium, iron, indium, copper, gold, palladium, platinum, manganese, cobalt, nickel, zirconium, molybdenum, rhodium, silver, indium, wolfram, iridium, lead, bismuth, samarium, erbium, or mixtures of these materials. In addition, products obtainable by these methods are provided.

Low-Emissivity Coating for a Glass Substrate

The present invention relates to a glass substrate provided with a stack of thin coating layers formed by a first layer of anti-reflective dielectric material, with a refractive index of 1.65 to 2.65, located above the glass substrate. At least one structure of two layers formed by a first layer of an anti-reflective transparent dielectric material with a refractive index of 1.32 to 1.55, located in the bottom position, and a second layer of a metal functional layer with reflective properties in the infrared range, located in the top position, said structure being located above the first layer of anti-reflective dielectric material. A second layer of absorbent material forming an anti-corrosion barrier for protecting the metal functional layer against oxidation and corrosion. A third layer of an anti-reflective material, said layer being selected from a metal oxide with a refractive index of 1.32 to 1.55, a metal oxide with a refractive index of 1.65 to 1.95 or an aluminum-doped zinc oxide (AZO); and a fourth protective layer made of an anti-reflective material, for increasing the transmission of visible light and the scratch resistance of the substrate, having high transmission of visible light (60%), a solar transmission of less than 60%, a resistance of less than 10 per square and an emissivity of less than 0.10.

OXIDE SINTERED MATERIAL AND METHOD OF MANUFACTURING THE SAME, SPUTTERING TARGET, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
20190292103 · 2019-09-26 ·

There are provided an oxide sintered material containing an In.sub.2O.sub.3 crystal phase, a Zn.sub.4In.sub.2O.sub.7 crystal phase and a ZnWO.sub.4 crystal phase, and a method of producing the oxide sintered material. The method includes forming the oxide sintered material by sintering a molded body containing In, W and Zn, and forming the oxide sintered material including placing the molded body at a first constant temperature selected from a temperature range of 500? C. or more and 1000? C. or less for 30 minutes or longer.

Methods for encapsulating silver mirrors on optical structures

Embodiments of the present disclosure generally relate to encapsulated optical devices and methods for fabricating the encapsulated optical devices. In one or more embodiments, a method for encapsulating an optical device includes depositing a metallic silver layer on a substrate, depositing a barrier layer on the metallic silver layer, where the barrier layer contains silicon nitride, a metallic element, a metal nitride, or any combination thereof, and depositing an encapsulation layer containing silicon oxide on the barrier layer.

INVISIBLE LIGHT BLOCKING STRUCTURE
20190162886 · 2019-05-30 ·

An invisible light blocking structure includes a first transparent substrate, a metal layer, a transparent protecting layer and an invisible light blocking unit. The first transparent substrate has a first bottom side and a first upper side. The metal layer is disposed on the first bottom side and has a first metal side facing away from the first transparent substrate. The first upper side faces away from the metal layer. The transparent protecting layer is disposed on the first metal side. The transparent protecting layer has a first protecting side facing away from the first transparent substrate. The invisible light blocking unit is disposed on at least one of a first protecting side and the first upper side. The invisible light blocking unit has cesium tungstate.