A substrate, a method for separating the substrate, and a display panel are provided. The substrate is disposed on a glass substrate. The substrate includes a substrate layer and a sacrificial layer. The sacrificial layer disposed between the substrate layer and the glass substrate, and is configured to share the force exerted on the substrate layer when the substrate is being separated from the glass substrate.

Multilayer metallo-dielectric energy control coatings are disclosed in which one or more layers are formed from a hydrogenated metal nitride dielectric, which may be hydrogenated during or after dielectric deposition. Properties of the multilayer coating may be configured by appropriately tuning the hydrogen concentration (and/or the spatial profile thereof) in one or more hydrogenated metal nitride dielectric layers. One or more metal layers of the multilayer coating may be formed on a hydrogenated nitride dielectric layer, thereby facilitating adhesion of the metal with a low percolation threshold and enabling the formation of thin metal layers that exhibit substantial transparency in the visible spectrum. Optical properties of the coating may be tuned through modulation of metal-dielectric interface roughness and dispersion of metal nanoparticles in the dielectric layer. Electrical busbars and micro-nano electrical grids may be integrated with one or more metal layers to provide functionality such as de-icing and defogging.

Provided is a carrier-attached metal foil which can suppress the number of foreign matter particles on the surface of a metal layer to enhance circuit formability, and can keep stable releasability even after heating at a high temperature of 240° C. or higher (for example, 260° C.) for a long period of time. The carrier-attached metal foil includes a carrier, a release functional layer provided on the carrier, the release functional layer including a metal oxynitride, and a metal layer provided on the release functional layer.

A glass substrate with a silica film according to the present invention includes a glass substrate and a silica film formed using a silica film-forming composition, in which the composition includes at least one kind selected from the group consisting of a hydrolyzable compound, a hydrolyzate thereof, and a hydrolysis condensation compound thereof, and at least one kind selected from the group consisting of a silica particle and a zirconia particle, the hydrolyzable compound consisting of a tetraalkoxysilane, a compound (compound I) represented by formula I: (R.sub.3-p(L).sub.pSi-Q-Si(L).sub.pR.sub.3-p), optionally a fluoroalkylsilane having a hydrolysable group, and optionally a zirconium compound having a hydrolyzable group, and the contents of the tetraalkoxysilane, the compound I, and the at least one kind selected from the group consisting of a silica particle and a zirconia particle in terms of SiO.sub.2/ZrO.sub.2 fall within specified ranges, respectively.

A glazing includes at least one transparent substrate comprising a first major surface and an opposing second major surface, wherein said first major surface is coated with an electrically conductive layer and the electrically conductive layer is absent in one or more regions of the first major surface. At least a portion of the one or more regions of the first major surface, and/or corresponding regions of the opposing second major surface, bears a low-emissivity material, and the one or more regions permit the passage of electromagnetic radiation through the glazing.

A glass article having anti-sun properties includes a glass substrate having a stack of layers, which includes, successively from the surface of the substrate: a first module M.sub.1 having a layer based on a dielectric material with a thickness e.sub.1 or of a set of layers, a layer TN.sub.1 including titanium nitride with a thickness of between 2 nanometers and 80 nanometers, a second module M.sub.2 including a layer based on a dielectric material with a thickness e.sub.2 or of a set of layers based on dielectric materials with a cumulative thickness e.sub.2, an intermediate layer including at least one element selected from silicon, aluminum, titanium or a mixture of at least two of these elements is deposited between the layer TN.sub.1 and the first module M.sub.1 and/or between the layer TN.sub.1 and the second module M.sub.2, the intermediate layer having a thickness of between 0.2 nm and 6 nm.

The present invention relates to a liquid crystal display panel having a predetermined size, containing a wiring film formed of a metal, an insulating film containing an inorganic substance and a substrate formed of a non-alkali glass, in which the metal has the product of a Young's modulus (E) and a thermal expansion coefficient (α) at room temperature falling within a predetermined range, α of the inorganic substance is smaller than that of the non-alkali glass, the non-alkali glass has E of from 70 GPa to 95 GPa and a of from 32×10.sup.−7 to 45×10.sup.−7 (1/° C.) in which E and α satisfies a predetermined formula, and has a predetermined composition.

A material includes a glass sheet coated on at least part of one of the faces thereof with a stack of thin layers, the stack of thin layers being coated on at least part of the surface thereof with an enamel layer not including bismuth, the enamel layer being coated with a non-stick layer.

A material includes a transparent substrate coated with a stack of thin layers acting on infrared radiation including at least one functional layer. The stack includes a carbon-based upper protective layer within which the carbon atoms are essentially in an sp.sup.2 hybridization state and the upper protective layer is deposited above at least a part of the functional layer and exhibits a thickness of less than 1 nm.

A coated article includes a substrate and a coating over at least a portion of the substrate. The coating includes a first dielectric layer over at least a portion of the substrate; a first metallic layer over at least a portion of the first dielectric layer; a second dielectric layer over at least a portion of the first metallic layer; and an overcoat over at least a portion of the second dielectric layer. A light absorbing layer is between second dielectric layer and the overcoat or is part of the overcoat. The light absorbing layer includes Ge, GeO.sub.x, Hf, HfO.sub.x, HfO.sub.2, NbN.sub.x, NbN.sub.xO.sub.y, Si.sub.aAl.sub.b, Si.sub.aAl.sub.bO.sub.x, Si.sub.aCo.sub.b, Si.sub.aCo.sub.bO.sub.x, Si.sub.aCo.sub.bCu.sub.c, Si.sub.aCo.sub.bCu.sub.cO.sub.x, Si.sub.aCr.sub.b, Si.sub.aCr.sub.bO.sub.x, Si.sub.aNi.sub.b, SiNiO.sub.x, SiO.sub.x, SnN.sub.x, SnO.sub.x, SnO.sub.xN.sub.y, TiN.sub.x, Ti.sub.aNb.sub.bN.sub.x, Ti.sub.aNb.sub.bO.sub.x, Ti.sub.aNb.sub.bO.sub.xN.sub.y, TiO.sub.xN.sub.y, WO.sub.x, WO.sub.2, ZnO:Co, ZnO:Fe, ZnO:Mn, ZnO:Ni, ZnO:V, ZnO:Cr, Zn.sub.aSn.sub.b, Zn.sub.aSn.sub.bO.sub.x, or any combination thereof.