Patent classifications
C03C17/3636
Coated article having metamaterial-inclusive layer, coating having metamaterial-inclusive layer, and/or method of making the same
Certain example embodiments of this invention relate to coated articles having a metamaterial-inclusive layer, coatings having a metamaterial-inclusive layer, and/or methods of making the same. Metamaterial-inclusive coatings may be used, for example, in low-emissivity applications, providing for more true color rendering, low angular color dependence, and/or high light-to-solar gain. The metamaterial material may be a noble metal or other material, and the layer may be made to self-assemble by virtue of surface tensions associated with the noble metal or other material, and the material selected for use as a matrix. An Ag-based metamaterial layer may be provided below a plurality (e.g., 2, 3, or more) continuous and uninterrupted layers comprising Ag in certain example embodiments. In certain example embodiments, barrier layers comprising TiZrOx may be provided between adjacent layers comprising Ag, as a lower-most layer in a low-E coating, and/or as an upper-most layer in a low-E coating.
Interior coatings for glass structures in electronic devices
An electronic device may include electrical components and other components mounted within a housing. The device may have a display on a front face of the device and may have a glass layer that forms part of the housing on a rear face of the device. The glass layer and other glass structures in the electronic device may be provided with coatings. An interior coating on a glass layer may include multiple layers of material such as an adhesion promotion layer, thin-film layers of materials such as silicon, niobium oxide and other metal oxides, and metals to help adjust the appearance of the coating. A metal layer may be formed on top of the coating to serve as an environmental protection layer and opacity enhancement layer. In some configurations, the coating may include four layers.
LOW-E MATCHABLE COATED ARTICLES HAVING DOPED SEED LAYER UNDER SILVER, AND CORRESPONDING METHODS
A low-E coating has good color stability (a low E* value) upon heat treatment (HT). Thermal stability may be improved by the provision of an as-deposited crystalline or substantially crystalline layer of or including zinc oxide, doped with at least one dopant (e.g., Sn), immediately under an infrared (IR) reflecting layer of or including silver; and/or by the provision of at least one dielectric layer of or including at least one of: (a) an oxide of silicon and zirconium, (b) an oxide of zirconium, and (c) an oxide of silicon. These have the effect of significantly improving the coating's thermal stability (i.e., lowering the E* value).
Colored Coatings for Electronic Devices
An electronic device may have transparent housing structures such as walls formed of glass or sapphire. Housing structures such as transparent housing structures may have a colored coating. The colored coating may include an absorptive layer and a metal layer. The coating may exhibit a color that can be adjusted by adjusting the thickness of the thin absorptive layer. A colored layer such as a layer of colored polymer may be incorporated into the colored coating to further adjust the color of the coating. The colored coating may be formed on an inner or outer housing structure surface. The surface may have a texture to provide the coating with a matte appearance. When formed on an outer surface, a diamond-like carbon layer may protect the colored coating. When formed on an inner surface, a passivation layer may be used to prevent oxidation of the metal layer.
Bird safe glazing
Bird collisions with windows or other glazings are minimized or prevented with a glazing comprising as least one substrate with a UV reflectance coating deposited over the substrate in a patterned arrangement comprised of a plurality of stripes, and each of the plurality of stripes has a thickness that changes by 10 nm or less over every 1 mm in width. Such an arrangement of stripes having soft edges are less apparent, and thus more aesthetically pleasing, when compared with a similar arrangement of stripes formed with hard edges, while providing an effective deterrent to bird collisions. The glazing may also be utilized as part of a laminated glazing or insulated glazing unit. A method of manufacturing the glazing is also provided.
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
A reflective mask blank includes a multilayer reflective film, a first thin film, and a second thin film in this order on a main surface of a substrate, a relative reflectance R.sub.2 of the second thin film with respect to a reflectance of the multilayer reflective film in the light of 13.5 nm wavelength is 3% or more, and an extinction coefficient k.sub.1 of the first thin film in the light of 13.5 nm wavelength and a thickness d.sub.1 [nm] of the first thin film satisfy a relationship of (Formula 1).
21.5?k.sub.1.sup.2?d.sub.1.sup.2?52.5?k.sub.1?d.sub.1+32.1>R.sub.2(Formula 1)
Mask Blank Glass Substrate
A mask blank glass substrate having a maximum value of a circularly averaged power spectral density of 1,000 nm.sup.4 or less at a spatial frequency of 0.1 m.sup.1 or more and 20 m.sup.1 or less, the maximum value being obtained by measuring a surface morphology of a region of 10 m10 m with an atomic force microscope.
COATED ARTICLE HAVING METAMATERIAL-INCLUSIVE LAYER, COATING HAVING METAMATERIAL-INCLUSIVE LAYER, AND/OR METHOD OF MAKING THE SAME
Certain example embodiments of this invention relate to coated articles having a metamaterial-inclusive layer, coatings having a metamaterial-inclusive layer, and/or methods of making the same. Metamaterial-inclusive coatings may be used, for example, in low-emissivity applications, providing for more true color rendering, low angular color dependence, and/or high light-to-solar gain. The metamaterial material may be a noble metal or other material, and the layer may be made to self-assemble by virtue of surface tensions associated with the noble metal or other material, and the material selected for use as a matrix. An Ag-based metamaterial layer may be provided below a plurality (e.g., 2, 3, or more) continuous and uninterrupted layers comprising Ag in certain example embodiments. In certain example embodiments, barrier layers comprising TiZrOx may be provided between adjacent layers comprising Ag, as a lower-most layer in a low-E coating, and/or as an upper-most layer in a low-E coating.
MATRIX-EMBEDDED METAMATERIAL COATING, COATED ARTICLE HAVING MATRIX-EMBEDDED METAMATERIAL COATING, AND/OR METHOD OF MAKING THE SAME
Certain example embodiments of this invention relate to coated articles having a metamaterial-inclusive layer, coatings having a metamaterial-inclusive layer, and/or methods of making the same. Metamaterial-inclusive coatings may be used, for example, in low-emissivity applications, providing for more true color rendering, low angular color dependence, and/or high light-to-solar gain. The metamaterial material may be a noble metal or other material, and the layer may be made to self-assemble by virtue of surface tensions associated with the noble metal or other material, and the material selected for use as a matrix. An Ag-based metamaterial layer may be provided below a plurality (e.g., 2, 3, or more) continuous and uninterrupted layers comprising Ag in certain example embodiments. In certain example embodiments, barrier layers comprising TiZrOx may be provided between adjacent layers comprising Ag, as a lower-most layer in a low-E coating, and/or as an upper-most layer in a low-E coating.
High-Refractive-Index Hydrogenated Silicon Film And Methods For Preparing The Same
A preparation method for a high-refractive index hydrogenated silicon film, a high-refractive index hydrogenated silicon film, a light filtering lamination and a light filtering piece. The method includes: (a) by magnetic controlled Si target sputtering, Si deposits on a base body, forming a silicon film, which (b) forms an oxygenic hydrogenated silicon film in environment of active hydrogen and active oxygen, the amount of active oxygen accounts for 4%-99% of the total amount of active hydrogen and active oxygen, or, a nitric hydrogenated silicon film in environment of active hydrogen and active nitrogen, the amount of active nitrogen accounts for 5%-20% of the total amount of active hydrogen and active nitrogen. Sputtering and reactions are separately conducted, Si first deposits on the base body by magnetic controlled Si target sputtering, and then plasmas of active hydrogen and active oxygen/nitrogen react with silicon for oxygenic or nitric SiH.