The present disclosure relates to a mixture that includes a perovskite precursor, a solvent, and an additive that includes at least one of a first amine, a ketone, an aldehyde, a non-nucleophilic sterically hindered base, and/or a halogen-containing compound, where, upon removal of the solvent and the additive, the perovskite precursor is capable of being transformed into a perovskite.

A coated article is provided with at least one infrared (IR) reflecting layer. The IR reflecting layer may be of silver or the like. In certain example embodiments, a titanium oxide layer is provided over the IR reflecting layer, and it has been found that this surprisingly results in an IR reflecting layer with a lower specific resistivity (SR) thereby permitting thermal properties of the coated article to be improved.

A cooking apparatus capable of satisfying a heat reflection function while securing a transmittance by applying a variable layer to a glass sheet forming a door includes a cooking chamber, and a door configured to open and close the cooking chamber and provided with a plurality of glass sheets, the door including a variable layer provided on at least one of the plurality of glass sheets and a visible light transmittance variable depending on a temperature.

A coated article includes a substrate and a coating over at least a portion of the substrate. The coating includes a first dielectric layer over at least a portion of the substrate; a first metallic layer over at least a portion of the first dielectric layer; a second dielectric layer over at least a portion of the first metallic layer; and an overcoat over at least a portion of the second dielectric layer. A light absorbing layer is between second dielectric layer and the overcoat or is part of the overcoat. The light absorbing layer includes Ge, GeO.sub.x, Hf, HfO.sub.x, HfO.sub.2, NbN.sub.x, NbN.sub.xO.sub.y, Si.sub.aAl.sub.b, Si.sub.aAl.sub.bO.sub.x, Si.sub.aCo.sub.b, Si.sub.aCo.sub.bO.sub.x, Si.sub.aCo.sub.bCu.sub.c, Si.sub.aCo.sub.bCu.sub.cO.sub.x, Si.sub.aCr.sub.b, Si.sub.aCr.sub.bO.sub.x, Si.sub.aNi.sub.b, SiNiO.sub.x, SiO.sub.x, SnN.sub.x, SnO.sub.x, SnO.sub.xN.sub.y, TiN.sub.x, Ti.sub.aNb.sub.bN.sub.x, Ti.sub.aNb.sub.bO.sub.x, Ti.sub.aNb.sub.bO.sub.xN.sub.y, TiO.sub.xN.sub.y, WO.sub.x, WO.sub.2, ZnO:Co, ZnO:Fe, ZnO:Mn, ZnO:Ni, ZnO:V, ZnO:Cr, Zn.sub.aSn.sub.b, Zn.sub.aSn.sub.bO.sub.x, or any combination thereof.

An opaque cover is provided for a capacitive sensor. The cover includes a transparent substrate, and at least one white coating layer including white pigments disposed over at least one portion of the transparent substrate. The cover also includes a non-conductive mirror structure disposed over the at least one white coating layer. The non-conductive mirror structure includes a number of first dielectric layers having a first refractive index interleaved with second dielectric layers having a second refractive index. The first and second dielectric layers have dielectric constants below a threshold.

The object is to provide a mask blank substrate, a mask blank, and a transfer mask which can achieve easy correction of a wavefront by a wavefront correction function of an exposure apparatus. The further object is to provide methods for manufacturing them. A virtual surface shape, which is an optically effective flat reference surface shape defined by a Zernike polynomial, is determined, wherein the Zernike polynomial is composed of only terms in which the order of variables related to a radius is second or lower order and includes one or more terms in which the order of the variables related to a radius is second-order; and the mask blank substrate, in which difference data (PV value) between the maximum value and the minimum value of difference shape between a virtual surface shape and a composite surface shape obtained by composing respective surface shapes of two main surfaces is 25 nm or less, is selected.

A glazing includes at least one transparent substrate comprising a first major surface and an opposing second major surface, wherein said first major surface is coated with an electrically conductive layer and the electrically conductive layer is absent in one or more regions of the first major surface. At least a portion of the one or more regions of the first major surface, and/or corresponding regions of the opposing second major surface, bears a low-emissivity material, and the one or more regions permit the passage of electromagnetic radiation through the glazing.

A laminate can comprise an oxide disposed over a first major surface of a substrate. The oxide layer can comprise a thickness of about 40 nanometers or less. The oxide layer can comprise oxygen and a first element. The first element can comprise at least one of titanium, tantalum, silicon, or aluminum. The oxide layer can comprise an atomic ratio of oxygen to the another element of about 1.5 or less. The laminate can comprise a peel strength between the substrate and the oxide layer of about 1.3 Newtons per centimeter or more. Methods of making a laminate can comprise providing a substrate comprising a first major surface and depositing an oxide layer over the first major surface of the substrate by sputtering from an elemental target comprising an another element in an oxygen environment.

A proposed fabrication technique for a polarization-absorbing wire grid polarizer avoids the need to etch through the multilayer stack of materials to form the grid structure. Initial reflective metal and dielectric buffer layers are patterned and etched in a conventional manner to create the desired grid topology. A small-angle coating process is then used to complete the fabrication process by first coating the top surface of the patterned dielectric with a polarization-absorbing metal. A second coating process is used to cover the created metal coating with a dielectric cladding material. Maintaining a small angle of incidence between the coating source and the wire grid structure ensures that top portions of the grid are suitably covered to create the desired multilayer wire configuration.

A double-layer system includes a metal layer facing away from a viewer and a coating facing the viewer. In order to make the layer system production process as simple as possible and to provide a sputter deposition method that dispenses entirely with the use of reactive gases in the sputtering atmosphere or requires only a small amount thereof, the coating is in the form of an optically partially absorbing layer which has an absorption coefficient kappa of less than 0.7 at a wavelength of 550 nm and a thickness ranging from 30 to 55 nm.