A method for making a plasmonic mushroom array includes: forming a plurality of metal nano-islands each having nanometer-range dimensions on a surface of a glass substrate; and subjecting to the glass substrate having the plurality of metal nano-islands formed thereon to reactive ion etching such that the plurality of metal nano-islands are converted to a plurality of mushroom-shaped structures each having a metal cap supported by a pillar made of a material of the glass substrate and each having dimensions smaller than the dimensions of the nano-islands, the plurality of mushroom-shaped structures being arranged in a substantially regular pattern with intervals smaller than average intervals between the nano-islands, thereby forming the plurality of nano-scale mushroom-shaped structures on the glass substrate that can exhibit localized surface plasmon resonance.

A method of fabricating a cover glass includes preparing a base member including a first area and a second area, wherein a surface of the base member is substantially parallel to a direction in the first area and is inclined with respect to the direction in the second area, and forming an ink layer on the surface of the base member in the second area, and forming a first print layer by removing a portion of the ink layer and forming a second print layer on the first print layer.

A method for preparing an optically transparent, superomniphobic coating on a substrate, such as an optical substrate, is disclosed. The method includes providing a glass layer disposed on a substrate, the glass layer having a first side adjacent the substrate and an opposed second side, the glass layer comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, such that a glass layer has a composition in a spinodal decomposition region. The method further includes heating the second side of the glass layer to form a phase-separated portion of the layer, the phase-separated portion comprising an interpenetrating network of silicon oxide domains and boron oxide domains, and removing at least a portion of the boron oxide domains from the phase-separated portion to provide a graded layer disposed on the substrate. The graded layer has a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide, and opposite the first side, a porous second side comprising at least 45 wt. % silicon oxide and no more than 5 wt. % boron oxide.

Disclosed herein are graphene coatings characterized by a porous, three-dimensional, spherical structure having a hollow core, along with methods for forming such graphene coatings on glasses, glass-ceramics, ceramics, and crystalline materials. Such coatings can be further coated with organic or inorganic layers and are useful in chemical and electronic applications.

An apparatus for recovering a quartz part includes a processing tank for providing a space accommodating a hydrofluoric acid aqueous solution such that a quartz part to be processed may be immersed, a liquid supply line supplying the hydrofluoric acid aqueous solution to the processing tank, and a heater heating the hydrofluoric acid aqueous solution in the processing tank.

A method for activating an inner surface of a hollow glass substrate tube for manufacturing an optical fiber preform including depositing a plurality of activation glass layers on the inner surface of the hollow substrate tube by a PCVD process, wherein a total thickness of the deposited activation glass layers is between 10 microns and 250 microns, and etching the deposited activation glass layers to remove at least 30% of the deposited activation glass layers.

A low reflectivity coating (20) is formed of a layer of carbon nanostructures (20) over a contact surface (14) of a substrate (10), from a spray incorporating the carbon nanostructures in suspension in a solvent. The carbon nanostructure layer provides a very low reflectivity coating which may be further enhanced by etching the outer surface of the coating. The layer may be etched for reduced reflectivity. Very low reflectivity coatings have been achieved.

A glazing, comprising a glass substrate on which is deposited in succession, from a first surface of said substrate: a first coating comprising a layer having infrared-reflecting properties or a set of layers, at least one layer of which has infrared-reflecting properties, a second coating on top of said first coating comprising an organic or mineral layer, said second coating having a relief texture, said texture being such that its mean slope P.sub.m is less than or equal to 15°, and the percentage of the textured surface having a slope of greater than 5° is greater than 5%.

Patterned and plasma-treated coatings for surfaces of electronic devices are disclosed. The patterned and plasma-treated coatings may include a linear fluorinated oligomer or linear fluorinated polymer and may be transparent. Regions of a patterned coating may be micro-sized. The pattern defined by the coating may not be visually discernable, but may affect the frictional properties of the coating.

Provided is a polarizing plate having a wire grid structure, comprising a transparent substrate, a first antireflection film laminated on the first surface of the transparent substrate, a plurality of protrusions protruding from the first antireflection film, a second antireflection layer laminated on a second surface opposite to the first surface, wherein the plurality of protrusions are periodically arranged at a pitch shorter than a wavelength of light in a use band, each of the protrusions extends in in a first direction and includes a reflective layer, a dielectric layer, and an absorption layer in order from the first direction, and both the first antireflection layer and the second antireflection layer have high refractive index layers and low refractive index layers that are alternately laminated.