Patent classifications
C04B35/117
MANUFACTURING METHOD FOR DISPERSION BODY AND MANUFACTURING METHOD FOR CERAMIC SINTERED BODY
In a manufacturing method for manufacturing a dispersion body, a plurality of types of solid particles, water, and a liquid other than water are mixed. The solid particles and the liquid are selected such that Hansen spheres of at least two types of the solid particles and a Hansen sphere of at least one type of the liquid mutually overlap, and a Hansen solubility parameter distance to water of at least one type of the solid particles of which the Hansen spheres overlap that of the liquid is greatest among all solid particles used in manufacturing of the dispersion body, and used to manufacture the dispersion body.
MANUFACTURING METHOD FOR DISPERSION BODY AND MANUFACTURING METHOD FOR CERAMIC SINTERED BODY
In a manufacturing method for manufacturing a dispersion body, a plurality of types of solid particles, water, and a liquid other than water are mixed. The solid particles and the liquid are selected such that Hansen spheres of at least two types of the solid particles and a Hansen sphere of at least one type of the liquid mutually overlap, and a Hansen solubility parameter distance to water of at least one type of the solid particles of which the Hansen spheres overlap that of the liquid is greatest among all solid particles used in manufacturing of the dispersion body, and used to manufacture the dispersion body.
Member for plasma processing devices
A member for a plasma processing device of the present disclosure is a member for a plasma processing device made of ceramics and having a shape of a cylindrical body with a through hole in an axial direction. The ceramics is mainly composed of aluminum oxide, and has a plurality of crystal grains and a grain boundary phase that is present between the crystal grains. An inner peripheral surface of the cylindrical body has an arithmetic average roughness Ra of 1 μm or more and 3 μm or less, and an arithmetic height Rmax of 30 μm or more and 130 μm or less.
Member for plasma processing devices
A member for a plasma processing device of the present disclosure is a member for a plasma processing device made of ceramics and having a shape of a cylindrical body with a through hole in an axial direction. The ceramics is mainly composed of aluminum oxide, and has a plurality of crystal grains and a grain boundary phase that is present between the crystal grains. An inner peripheral surface of the cylindrical body has an arithmetic average roughness Ra of 1 μm or more and 3 μm or less, and an arithmetic height Rmax of 30 μm or more and 130 μm or less.
CERAMIC JOINED BODY, ELECTROSTATIC CHUCK DEVICE, AND METHOD FOR PRODUCING CERAMIC JOINED BODY
A ceramic joined body (1) includes: a pair of ceramic plates (2,3) that include a conductive material; and a conductive layer (4) and an insulating layer (5) that are interposed between the pair of ceramic plates (2, 3), a porosity at an interface between the pair of ceramic plates (2, 3) and the insulating layer (5) is 4% or less, and a ratio of an average primary particle diameter of an insulating material which forms the insulating layer (5) to an average primary particle diameter of an insulating material which forms the ceramic plates (2, 3) is more than 1.
CERAMIC JOINED BODY, ELECTROSTATIC CHUCK DEVICE, AND METHOD FOR PRODUCING CERAMIC JOINED BODY
A ceramic joined body (1) includes: a pair of ceramic plates (2,3) that include a conductive material; and a conductive layer (4) and an insulating layer (5) that are interposed between the pair of ceramic plates (2, 3), a porosity at an interface between the pair of ceramic plates (2, 3) and the insulating layer (5) is 4% or less, and a ratio of an average primary particle diameter of an insulating material which forms the insulating layer (5) to an average primary particle diameter of an insulating material which forms the ceramic plates (2, 3) is more than 1.
Method for manufacturing an elastic ceramic matrix composite
Disclosed are: damage-resistant ECMCs that need to work and remain elastic between minus 120° C. and positive 300° C.; ECMCs that need to be able to contain a flame of 1900° C. for more than 90 minutes; and composite structures, especially highly stressed structures. One of the characteristic problems of ceramic matrices is their fragility. Indeed, when a fracture starts, it propagates easily in the matrix. Disclosed are elastic ceramic matrix composites (ECMCs), for which: the ceramic matrix is split into solid “ceramic microdomains” (CMDs); the CMDs are connected to one another by a dense network of “elastic microelements” (EMEs); and the bonds between the EMEs and the CMDs are strong chemical bonds, preferably covalent.
Method for manufacturing an elastic ceramic matrix composite
Disclosed are: damage-resistant ECMCs that need to work and remain elastic between minus 120° C. and positive 300° C.; ECMCs that need to be able to contain a flame of 1900° C. for more than 90 minutes; and composite structures, especially highly stressed structures. One of the characteristic problems of ceramic matrices is their fragility. Indeed, when a fracture starts, it propagates easily in the matrix. Disclosed are elastic ceramic matrix composites (ECMCs), for which: the ceramic matrix is split into solid “ceramic microdomains” (CMDs); the CMDs are connected to one another by a dense network of “elastic microelements” (EMEs); and the bonds between the EMEs and the CMDs are strong chemical bonds, preferably covalent.
PHOSPHOR PLATE AND LIGHT EMITTING DEVICE
A phosphor plate includes a plate-like composite including a base material and an α-type sialon phosphor present in the base material, in which, in an X-ray diffraction analysis pattern using a Cu-Kα ray, in a case in which peak intensity corresponding to the α-type sialon phosphor having a diffraction angle 2 θ in a range of 30.2° or more and 30.4° or less is defined as I.sub.α and peak intensity of a peak having a diffraction angle 2 θ in a range of 26.6° or more and 26.8° or less is defined as I.sub.β, I.sub.α, and I.sub.β satisfy 0<I.sub.β/I.sub.α≤10.
PHOSPHOR PLATE AND LIGHT EMITTING DEVICE
A phosphor plate includes a plate-like composite including a base material and an α-type sialon phosphor present in the base material, in which, in an X-ray diffraction analysis pattern using a Cu-Kα ray, in a case in which peak intensity corresponding to the α-type sialon phosphor having a diffraction angle 2 θ in a range of 30.2° or more and 30.4° or less is defined as I.sub.α and peak intensity of a peak having a diffraction angle 2 θ in a range of 26.6° or more and 26.8° or less is defined as I.sub.β, I.sub.α, and I.sub.β satisfy 0<I.sub.β/I.sub.α≤10.