Disclosed are a coating for glass molding, a preparation method and application thereof and a mold having the coating. The coating includes a nitride layer and nano precious metal particles which are dispersed in the nitride layer. A surface roughness of the coating is 2-12 nm. The preparation method of the coating includes: cleaning a substrate and targets under an inert gas; and under a mixed atmosphere of nitrogen and the inert gas, depositing, with a high-purity W target, a high-purity Cr target and a precious metal inserted Cr target, a Cr intermediate layer, a nitride layer and nano precious metal particles on a surface of the substrate. The coating has good oxidation resistance and excellent anti-adhesion property. Moreover, the coating effectively inhibits the adhesion between the glass body and the mold.

A plasma processing device member according to the disclosure includes a base material and a film formed of an oxide, or fluoride, or oxyfluoride, or nitride of a rare-earth element, the film being disposed on at least part of the base material, the film including a surface to be exposed to plasma, the surface having an area occupancy of open pores of 8% by area or more, and an average diameter of open pores of 8 μm or less.

A plasma processing device member according to the disclosure includes a base material and a film formed of an oxide, or fluoride, or oxyfluoride, or nitride of a rare-earth element, the film being disposed on at least part of the base material, the film including a surface to be exposed to plasma, the surface having an area occupancy of open pores of 8% by area or more, and an average diameter of open pores of 8 μm or less.

The present invention concerns a method for obtaining a finished or semi-finished zirconia-based article (1), the article having a metallic external appearance and non-zero surface electrical conductivity, characterized in that the method includes the steps consisting in: taking at least one zirconia article, pre-shaped in its finished or semi-finished form; placing said article inside a chamber (10) in which a gaseous mixture is arranged, this gaseous mixture including at least a first hydrogen and carbon based gas compound in a first concentration (C1) and a second hydrogen and nitrogen based gas compound in a second concentration (C2); heating the gaseous mixture until the molecules of the first and second compounds dissociate and keeping said article in the reactive atmosphere thereby created to obtain diffusion of the carbon and nitrogen atoms in the external surface (2) of said article and to form stoichiometric carbonitride (ZrC.sub.x—N.sub.y) at the surface, and prior to the step of heating the process gases contained in the chamber, a reduction step consisting in placing said article inside a chamber into which dihydrogen is injected and in heating the dihydrogen allowing diffusion towards the surface and release of the oxygen contained in said zirconia article.

The present invention concerns a method for obtaining a finished or semi-finished zirconia-based article (1), the article having a metallic external appearance and non-zero surface electrical conductivity, characterized in that the method includes the steps consisting in: taking at least one zirconia article, pre-shaped in its finished or semi-finished form; placing said article inside a chamber (10) in which a gaseous mixture is arranged, this gaseous mixture including at least a first hydrogen and carbon based gas compound in a first concentration (C1) and a second hydrogen and nitrogen based gas compound in a second concentration (C2); heating the gaseous mixture until the molecules of the first and second compounds dissociate and keeping said article in the reactive atmosphere thereby created to obtain diffusion of the carbon and nitrogen atoms in the external surface (2) of said article and to form stoichiometric carbonitride (ZrC.sub.x—N.sub.y) at the surface, and prior to the step of heating the process gases contained in the chamber, a reduction step consisting in placing said article inside a chamber into which dihydrogen is injected and in heating the dihydrogen allowing diffusion towards the surface and release of the oxygen contained in said zirconia article.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.

Disclosed are a coating for glass molding, a preparation method and application thereof and a mold having the coating. The coating includes a nitride layer and nano precious metal particles which are dispersed in the nitride layer. A surface roughness of the coating is 2-12 nm. The preparation method of the coating includes: cleaning a substrate and targets under an inert gas; and under a mixed atmosphere of nitrogen and the inert gas, depositing, with a high-purity W target, a high-purity Cr target and a precious metal inserted Cr target, a Cr intermediate layer, a nitride layer and nano precious metal particles on a surface of the substrate. The coating has good oxidation resistance and excellent anti-adhesion property. Moreover, the coating effectively inhibits the adhesion between the glass body and the mold.

A cutting tool comprises a rake face and a flank face, the cutting tool being composed of a substrate made of a cubic boron nitride sintered material and a coating provided on the substrate, the coating including a MAIN layer, the MAIN layer including crystal grains of M.sub.xAl.sub.1-xN in the cubic crystal system, n.sub.F<n.sub.R being satisfied, where n.sub.F represents a number of voids per 100 m in length of the MAIN layer on the flank face in a cross section of the MAIN layer, and n.sub.R represents a number of voids per 100 m in length of the MAIN layer on the rake face in a cross section of the MAIN layer, n.sub.D being 3 or less, where n.sub.D represents a number of droplets per 100 m in length of the MAIN layer on the flank face in a cross section of the MAIN layer.

A cutting tool comprises a rake face and a flank face, the cutting tool being composed of a substrate made of a cubic boron nitride sintered material and a coating provided on the substrate, the coating including a MAIN layer, the MAIN layer including crystal grains of M.sub.xAl.sub.1-xN in the cubic crystal system, n.sub.F<n.sub.R being satisfied, where n.sub.F represents a number of voids per 100 m in length of the MAIN layer on the flank face in a cross section of the MAIN layer, and n.sub.R represents a number of voids per 100 m in length of the MAIN layer on the rake face in a cross section of the MAIN layer, n.sub.D being 3 or less, where n.sub.D represents a number of droplets per 100 m in length of the MAIN layer on the flank face in a cross section of the MAIN layer.