Provided are purification methods, comprising: (a) providing an organic solvent and a phenolic peroxide formation inhibitor, wherein the organic solvent has a first boiling point at standard atmospheric pressure (bp.sub.1) and the phenolic peroxide formation inhibitor has a second boiling point at standard atmospheric pressure (bp.sub.2) that satisfy the following inequality (I):

bp.sub.2(1.10)(bp.sub.1) (I); and

(b) heating the organic solvent and the phenolic peroxide formation inhibitor to a temperature causing the organic solvent and phenolic peroxide formation inhibitor to vaporize, and (ii) condensing the vaporized organic solvent and peroxide formation inhibitor to provide a purified mixture of the organic solvent and peroxide formation inhibitor. The methods find particular use in the purification of solvents that are useful in process chemicals for the manufacture of semiconductor devices.

Provided are purification methods, comprising: (a) providing an organic solvent and a phenolic peroxide formation inhibitor, wherein the organic solvent has a first boiling point at standard atmospheric pressure (bp.sub.1) and the phenolic peroxide formation inhibitor has a second boiling point at standard atmospheric pressure (bp.sub.2) that satisfy the following inequality (I):

bp.sub.2(1.10)(bp.sub.1) (I); and

(b) heating the organic solvent and the phenolic peroxide formation inhibitor to a temperature causing the organic solvent and phenolic peroxide formation inhibitor to vaporize, and (ii) condensing the vaporized organic solvent and peroxide formation inhibitor to provide a purified mixture of the organic solvent and peroxide formation inhibitor. The methods find particular use in the purification of solvents that are useful in process chemicals for the manufacture of semiconductor devices.

An object of the present invention is to provide a constitutive 1,4-dioxane-degrading bacteria offering excellent maximum relative rates of degradation of 1,4-dioxane. As a means for achieving the object, the present invention provides a constitutive 1,4-dioxane-degrading bacteria being strain N23 deposited as Accession No. NITE BP-02032.

An object of the present invention is to provide a constitutive 1,4-dioxane-degrading bacteria offering excellent maximum relative rates of degradation of 1,4-dioxane. As a means for achieving the object, the present invention provides a constitutive 1,4-dioxane-degrading bacteria being strain N23 deposited as Accession No. NITE BP-02032.

A method includes the step of contacting an olefin, an alcohol, a metallosilicate catalyst and a solvent, wherein the solvent comprises structure (I) wherein R.sub.1 is selected from the group consisting of a hydrogen or an alkyl group and R.sub.2 is selected from the group consisting of an alkyl group or an alkoxy group.

##STR00001##

A method includes the step of contacting an olefin, an alcohol, a metallosilicate catalyst and a solvent, wherein the solvent comprises structure (I) wherein R.sub.1 is selected from the group consisting of a hydrogen or an alkyl group and R.sub.2 is selected from the group consisting of an alkyl group or an alkoxy group.

##STR00001##

The present invention provides a fluorine-containing ether compound represented by the following formula.

R.sup.1CH.sub.2R.sup.2CH.sub.2R.sup.3CH.sub.2R.sup.4CH.sub.2R.sup.5CH.sub.2R.sup.6CH.sub.2R.sup.7

(In Formula (1), R.sup.2, R.sup.4, and R.sup.6 are perfluoropolyether chains, R.sup.3 is Formula (2), R.sup.5 is Formula (3), and R.sup.1 and R.sup.7 are each independently a terminal group having two or three polar groups, in which individual polar groups are bound to different carbon atoms and the carbon atoms to which the polar groups are bound are bound to each other via a linking group containing a carbon atom to which no polar group is bound).

##STR00001##

Disclosed are novel bridged bi-aromatic phenol ligands and transition metal compounds derived therefrom. Also disclosed are methods of making the ligands and transition metal compounds.

The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1). ##STR00001##
(In the formula, R.sup.1 and R.sup.2 are each a C.sub.1-C.sub.33 aliphatic hydrocarbon group, the total number of carbons of in R.sup.1 and R.sup.2 is 14-34, X is a single bond or a C.sub.1-C.sub.5 aliphatic hydrocarbon group, and A is OCH.sub.2CH(OH)CH.sub.2OH or OCH(CH.sub.2OH).sub.2).

The present invention provides: a compound that has a low melting point and is capable of forming a film of high hydrophobicity, and a composition containing this compound. The compound of the present invention is represented by chemical formula (1). ##STR00001##
(In the formula, R.sup.1 and R.sup.2 are each a C.sub.1-C.sub.33 aliphatic hydrocarbon group, the total number of carbons of in R.sup.1 and R.sup.2 is 14-34, X is a single bond or a C.sub.1-C.sub.5 aliphatic hydrocarbon group, and A is OCH.sub.2CH(OH)CH.sub.2OH or OCH(CH.sub.2OH).sub.2).