Provided herein are compounds of (I-A), (I-B), or (II), and pharmaceutically acceptable salts, solvates, hydrates, poly-morphs, co-crystals, tautomers, stereoisomers, isotopically labeled derivatives, and prodrugs thereof. Also provided are methods, uses, and kits involving the inventive compounds and pharmaceutical compositions thereof for treating and/or preventing diseases (e.g., proliferative diseases (e.g., cancers), inflammatory diseases (e.g., fibrosis), autoimmune diseases (e.g., sclerosis)) in a subject. Provided are methods of inhibiting the activity of a transcription factor (e.g., TEAD, such as TEAD1, TEAD2, TEAD3, TEAD4) and/or inhibiting the transcription of a gene (e.g., a gene controlled or regulated by a transcription factor (e.g., TEAD)) in a subject.

The invention relates to Fatty Acid Acetylated Salicylate Derivatives; compositions comprising an effective amount of a Fatty Acid Acetylated Salicylate Derivative; and methods for treating or preventing an inflammatory disorder comprising the administration of an effective amount of a Fatty Acid Acetylated Salicylate Derivative.

The present invention relates to aromatic ring or heteroaromatic ring derivatives, a preparation method therefor and applications thereof in medicine. Specifically, the present invention relates to aromatic ring or heteroaromatic ring derivatives represented by general formula (I), a preparation method therefor and pharmaceutically acceptable salts thereof, as well as a use thereof as therapeutic agents, especially uses as angiotensin II type 2 receptor (AT.sub.2R) antagonists, wherein the definition of each substituent in the general formula (I) is the same as the definition thereof in the description.

The present invention relates to aromatic ring or heteroaromatic ring derivatives, a preparation method therefor and applications thereof in medicine. Specifically, the present invention relates to aromatic ring or heteroaromatic ring derivatives represented by general formula (I), a preparation method therefor and pharmaceutically acceptable salts thereof, as well as a use thereof as therapeutic agents, especially uses as angiotensin II type 2 receptor (AT.sub.2R) antagonists, wherein the definition of each substituent in the general formula (I) is the same as the definition thereof in the description.

A resist underlayer film material used in multilayer resist method contains (A) compound shown by following general formula (1), and (B) organic solvent, where X independently represents monovalent organic group shown by following general formula (2); W contains an “m” number of partial structures each independently shown by following formula (3); “m” and “n” each represent an integer of 1 to 10; broken lines represent bonding arms; Z represents aromatic group; A represents single bond or —O—(CH.sub.2).sub.p—; “k” represents integer of 1 to 5; “p” represents integer of 1 to 10; R.sup.01 represents hydrogen atom or monovalent organic group having 1 to 10 carbon atoms. Material is capable of forming resist underlayer film excellent in planarizing property in fine patterning process by multilayer resist method in semiconductor-device manufacturing process; and patterning processes and methods for forming resist underlayer film use material.

##STR00001##

A resist underlayer film material used in multilayer resist method contains (A) compound shown by following general formula (1), and (B) organic solvent, where X independently represents monovalent organic group shown by following general formula (2); W contains an “m” number of partial structures each independently shown by following formula (3); “m” and “n” each represent an integer of 1 to 10; broken lines represent bonding arms; Z represents aromatic group; A represents single bond or —O—(CH.sub.2).sub.p—; “k” represents integer of 1 to 5; “p” represents integer of 1 to 10; R.sup.01 represents hydrogen atom or monovalent organic group having 1 to 10 carbon atoms. Material is capable of forming resist underlayer film excellent in planarizing property in fine patterning process by multilayer resist method in semiconductor-device manufacturing process; and patterning processes and methods for forming resist underlayer film use material.

##STR00001##

An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a composition formed of the compound, a cured product, an optically anisotropic body, and a reflective film.

The compound of the present invention is a compound represented by General Formula (1).

##STR00001##

A compound has a strong HTP and a high temperature dependence of HTP. In addition, a liquid crystal composition, a cured substance, an optical anisotropic boy, and a reflection film the above-described compound. The compound is represented by General Formula (1), wherein X.sup.1 and X.sup.2 each independently represent —CH═CH—or C≡C—. ##STR00001##

The present invention relates to a vinylarene deriv. which modulates or inhibits the enzymic activity of indoleamine 2,3-dioxygenase 1 (IDO-1), and the use thereof, and further relates to a vinylarene deriv. and the use thereof. The vinylarene deriv. and its stereoisomer, cis- or trans-isomer, or tautomer thereof and pharmaceutically acceptable salt thereof, has an IDO-1 enzyme inhibitory activity, and is expected to provide brand new therapeutic methods and schemes for related diseases caused by IDO enzymes. ##STR00001##

The present invention relates to a vinylarene deriv. which modulates or inhibits the enzymic activity of indoleamine 2,3-dioxygenase 1 (IDO-1), and the use thereof, and further relates to a vinylarene deriv. and the use thereof. The vinylarene deriv. and its stereoisomer, cis- or trans-isomer, or tautomer thereof and pharmaceutically acceptable salt thereof, has an IDO-1 enzyme inhibitory activity, and is expected to provide brand new therapeutic methods and schemes for related diseases caused by IDO enzymes. ##STR00001##