A salt represented by formula (1), an acid generator, a resin, and a resist composition including the same.

##STR00001##

wherein R.sup.1 to R.sup.3 each represent a hydroxy group, etc.; R.sup.4 to R.sup.9 each represent a halogen atom, etc.; R.sup.10 represents an acid-labile group; A.sup.1 to A.sup.3 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; Q.sup.b1 and Q.sup.b2 each represent a hydrogen atom, etc.; L.sup.b1 represents a saturated hydrocarbon group; Y.sup.b1 represents a single bond or an alicyclic hydrocarbon group; R.sup.bb1 represents a hydrogen atom, etc.; X.sup.10 represents a single bond, etc.; and L.sup.10 represents a single bond or a hydrocarbon group.

A salt represented by formula (1), an acid generator, a resin, and a resist composition including the same.

##STR00001##

wherein R.sup.1 to R.sup.3 each represent a hydroxy group, etc.; R.sup.4 to R.sup.9 each represent a halogen atom, etc.; R.sup.10 represents an acid-labile group; A.sup.1 to A.sup.3 each represent a hydrocarbon group; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; Q.sup.b1 and Q.sup.b2 each represent a hydrogen atom, etc.; L.sup.b1 represents a saturated hydrocarbon group; Y.sup.b1 represents a single bond or an alicyclic hydrocarbon group; R.sup.bb1 represents a hydrogen atom, etc.; X.sup.10 represents a single bond, etc.; and L.sup.10 represents a single bond or a hydrocarbon group.

An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

A resist composition containing a compound represented by the general formula (bd1-1), (bd1-2) or (bd1-3); in the formula, Rx.sup.1 to Rx.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure; Ry.sup.1 to Ry.sup.2 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure, Rz.sup.1 to Rz.sup.4 represent a hydrocarbon group or a hydrogen atom or may be mutually bonded to form a ring structure. At least one of Rx.sup.1 to Rx.sup.4, Ry.sup.1 to Ry.sup.2 and Rz.sup.1 to Rz.sup.4 has an anion group, M.sub.1.sup.m+ represents a sulfonium cation having a sulfonyl group, R.sup.001 to R.sup.003 each independently represent a monovalent organic group; provided that at least one of R.sup.001 to R.sup.003 is an organic group having an acid dissociable group; and M.sub.3.sup.m+ represents an m-valent organic cation having an electron-withdrawing group. ##STR00001##

A salt represented by formula (I), an acid generator and a resist composition:

##STR00001##

wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, —O—R.sup.10, —O—CO—O—R.sup.10 or —O-L.sup.1-CO—O—R.sup.10, L.sup.1 represents an alkanediyl group, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R.sup.10 represents an acid-labile group, X.sup.1, X.sup.2 and X.sup.3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

The present invention is an anti-staining agent containing, (a) a sulfosuccinic acid branched alkyl ester in which the branched alkyl group is a branched alkyl group with 8 or more and 13 or less carbons [hereinafter referred to as component (a)]. Further, the present invention is an anti-staining method including bringing a treatment liquid into contact with an object to be treated, the treatment liquid containing component (a).

The present invention is an anti-staining agent containing, (a) a sulfosuccinic acid branched alkyl ester in which the branched alkyl group is a branched alkyl group with 8 or more and 13 or less carbons [hereinafter referred to as component (a)]. Further, the present invention is an anti-staining method including bringing a treatment liquid into contact with an object to be treated, the treatment liquid containing component (a).

A process for producing a surfactant having two head groups and a single tail group per molecule, including steps of: producing a compound of Formula (1) from ethanol and carbon disulfide; producing a compound of Formula (2) from a carboxylic acid and bromine; producing a compound of Formula (3) from the compound of Formula (2) and methanol; producing a compound of Formula (4) from the compound of Formula (1) and the compound of Formula (3); and producing a compound of Formula (5) from the compound of Formula (4) by a direct oxidation process or by a peracid oxidation process. The surfactant produced by the process has lower critical micelle concentration and enables a lower surface tension of a liquid as compared with prior surfactants with two head groups per molecule, thereby enabling the amount of surfactant required and thus the cost to be substantially reduced.

A process for producing a surfactant having two head groups and a single tail group per molecule, including steps of: producing a compound of Formula (1) from ethanol and carbon disulfide; producing a compound of Formula (2) from a carboxylic acid and bromine; producing a compound of Formula (3) from the compound of Formula (2) and methanol; producing a compound of Formula (4) from the compound of Formula (1) and the compound of Formula (3); and producing a compound of Formula (5) from the compound of Formula (4) by a direct oxidation process or by a peracid oxidation process. The surfactant produced by the process has lower critical micelle concentration and enables a lower surface tension of a liquid as compared with prior surfactants with two head groups per molecule, thereby enabling the amount of surfactant required and thus the cost to be substantially reduced.