C07C309/42

PROCESS AND INTERMEDIATES FOR THE PREPARATION OF CERTAIN NEMATICIDAL SULFONAMIDES

The present invention provides a method for preparing a compound of Formula C, Formula D, or Formula F:

##STR00001##

wherein each R.sup.1, R.sup.2, and R.sup.3 is independently H, SFs, N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), C(═S)N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), SO.sub.2N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), OSO.sub.2(C.sub.1-C.sub.8 alkyl), OSO.sub.2N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), N(C.sub.1-C.sub.8 alkyl)SO.sub.2(C.sub.1-C.sub.8 alkyl), or C.sub.1-C.sub.8 alkyl, C.sub.1-C.sub.8 haloalkyl, C.sub.2-C.sub.8 alkenyl, C.sub.2-C.sub.8 alkynyl, C.sub.3-C.sub.10 cycloalkyl, C.sub.3-C.sub.10 halocycloalkyl, C.sub.4-C.sub.10 alkylcycloalkyl, C.sub.4-C.sub.10 cycloalkylalkyl, C.sub.6-C.sub.14 cycloalkylcycloalkyl, C.sub.5-C.sub.10 alkylcycloalkylalkyl, C.sub.3-C.sub.8 cycloalkenyl, C.sub.1-C.sub.8 alkoxy, C.sub.1-C.sub.8 haloalkoxy, C.sub.3-C.sub.8 cycloalkoxy, C.sub.3-C.sub.8 halocycloalkoxy, C.sub.4-C.sub.10 cycloalkylalkoxy, C.sub.2-C.sub.8 alkenyloxy, C.sub.2-C.sub.8 alkynyloxy, C.sub.1-C.sub.8 alkylthio, C.sub.1-C.sub.8 alkylsulfinyl, C.sub.1-C.sub.8 alkylsulfonyl, C.sub.3-C.sub.8 cycloalkylthio, C.sub.3-C.sub.8 cycloalkylsulfinyl, C.sub.3-C.sub.8 cycloalkylsulfonyl, C.sub.4-C.sub.10 cycloalkylalkylthio, C.sub.4-C.sub.10 cycloalkylalkylsulfinyl, C.sub.4-C.sub.10 cycloalkylalkylsulfonyl, C.sub.2-C.sub.8 alkenylthio, C.sub.2-C.sub.8 alkenylsulfinyl, C.sub.2-C.sub.8 alkenylsulfonyl, C.sub.2-C.sub.8 alkynylthio, C.sub.2-C.sub.8 alkynylsulfinyl, C.sub.2-C.sub.8 alkynylsulfonyl, or phenyl; or

two of R.sup.1, R.sup.2, and R.sup.3 on adjacent ring atoms may be taken together to form a 5- to 7 -membered carbocyclic or heterocyclic ring, each ring containing ring members selected from carbon atoms and up to 3 heteroatoms independently selected from up to 2 O, up to 2 S, and up to 3 N, wherein up to 2 carbon atom ring members are independently selected from C(═O) and C(═S) and such ring is optionally substituted with up to 3 substituents independently selected from the group consisting of C.sub.1-C.sub.4 alkyl, C.sub.1-C.sub.4 haloalkyl, C.sub.2-C.sub.4 alkenyl, C.sub.2-C.sub.4 haloalkenyl, C.sub.2-C.sub.4 alkynyl, C.sub.2-C.sub.4 haloalkynyl, C.sub.3-C.sub.7 cycloalkyl, C.sub.3-C.sub.7 halocycloalkyl, C.sub.4-C.sub.8 alkylcycloalkyl, C.sub.4-C.sub.8 haloalkylcycloalkyl, C.sub.4-C.sub.8 cycloalkylalkyl, C.sub.4-C.sub.8 halocycloalkylalkyl, C.sub.1-C.sub.8 alkoxy, C.sub.1-C.sub.8 haloalkoxy, C.sub.2-C.sub.8 alkoxycarbonyl, C.sub.2-C.sub.6 haloalkoxycarbonyl, C.sub.2-C.sub.6 alkylcarbonyl and C.sub.2-C.sub.6 haloalkylcarbonyl; and

M is an inorganic cation or organic cation.

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.

##STR00001##

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.

##STR00001##

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS

An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

##STR00001##

ONIUM SALT, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS

An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

##STR00001##

PROCESS AND INTERMEDIATES FOR THE PREPARATION OF CERTAIN NEMATICIDAL SULFONAMIDES

The present invention provides a method for preparing a compound of Formula C, Formula D, or Formula F:

##STR00001## wherein each R.sup.1, R.sup.2, and R.sup.3 is independently H, SF.sub.5, N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), C(═S)N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), SO.sub.2N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), OSO.sub.2(C.sub.1-C.sub.8 alkyl), OSO.sub.2N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), N(C.sub.1-C.sub.8 alkyl)SO.sub.2(C.sub.1-C.sub.8 alkyl), or C.sub.1-C.sub.8 alkyl, C.sub.1-C.sub.8 haloalkyl, C.sub.2-C.sub.8 alkenyl, C.sub.2-C.sub.8 alkynyl, C.sub.3-C.sub.10 cycloalkyl, C.sub.3-C.sub.10 halocycloalkyl, C.sub.4-C.sub.10 alkylcycloalkyl, C.sub.4-C.sub.10 cycloalkylalkyl, C.sub.6-C.sub.14 cycloalkylcycloalkyl, C.sub.5-C.sub.10 alkylcycloalkylalkyl, C.sub.3-C.sub.8 cycloalkenyl, C.sub.1-C.sub.8 alkoxy, C.sub.1-C.sub.8 haloalkoxy, C.sub.3-C.sub.8 cycloalkoxy, C.sub.3-C.sub.8 halocycloalkoxy, C.sub.4-C.sub.10 cycloalkylalkoxy, C.sub.2-C.sub.8 alkenyloxy, C.sub.2-C.sub.8 alkynyloxy, C.sub.1-C.sub.8 alkylthio, C.sub.1-C.sub.8 alkylsulfinyl, C.sub.1-C.sub.8 alkylsulfonyl, C.sub.3-C.sub.8 cycloalkylthio, C.sub.3-C.sub.8 cycloalkylsulfinyl, C.sub.3-C.sub.8 cycloalkylsulfonyl, C.sub.4-C.sub.10 cycloalkylalkylthio, C.sub.4-C.sub.10 cycloalkylalkylsulfinyl, C.sub.4-C.sub.10 cycloalkylalkylsulfonyl, C.sub.2-C.sub.8 alkenylthio, C.sub.2-C.sub.8 alkenylsulfinyl, C.sub.2-C.sub.8 alkenylsulfonyl, C.sub.2-C.sub.8 alkynylthio, C.sub.2-C.sub.8 alkynylsulfinyl, C.sub.2-C.sub.8 alkynylsulfonyl, or phenyl; or two of R.sup.1, R.sup.2, and R.sup.3 on adjacent ring atoms may be taken together to form a 5- to 7-membered carbocyclic or heterocyclic ring, each ring containing ring members selected from carbon atoms and up to 3 heteroatoms independently selected from up to 2 O, up to 2 S, and up to 3 N, wherein up to 2 carbon atom ring members are independently selected from C(═O) and C(═S) and such ring is optionally substituted with up to 3 substituents independently selected from the group consisting of C.sub.1-C.sub.4 alkyl, C.sub.1-C.sub.4 haloalkyl, C.sub.2-C.sub.4 alkenyl, C.sub.2-C.sub.4 haloalkenyl, C.sub.2-C.sub.4 alkynyl, C.sub.2-C.sub.4 haloalkynyl, C.sub.3-C.sub.7 cycloalkyl, C.sub.3-C.sub.7 halocycloalkyl, C.sub.4-C.sub.8 alkylcycloalkyl, C.sub.4-C.sub.8 haloalkylcycloalkyl, C.sub.4-C.sub.8 cycloalkylalkyl, C.sub.4-C.sub.8 halocycloalkylalkyl, C.sub.1-C.sub.8 alkoxy, C.sub.1-C.sub.8 haloalkoxy, C.sub.2-C.sub.8 alkoxycarbonyl, C.sub.2-C.sub.6 haloalkoxycarbonyl, C.sub.2-C.sub.6 alkylcarbonyl and C.sub.2-C.sub.6 haloalkylcarbonyl; and M is an inorganic cation or organic cation.

PROCESS AND INTERMEDIATES FOR THE PREPARATION OF CERTAIN NEMATICIDAL SULFONAMIDES

The present invention provides a method for preparing a compound of Formula C, Formula D, or Formula F:

##STR00001## wherein each R.sup.1, R.sup.2, and R.sup.3 is independently H, SF.sub.5, N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), C(═S)N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), SO.sub.2N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), OSO.sub.2(C.sub.1-C.sub.8 alkyl), OSO.sub.2N(C.sub.1-C.sub.8 alkyl)(C.sub.1-C.sub.8 alkyl), N(C.sub.1-C.sub.8 alkyl)SO.sub.2(C.sub.1-C.sub.8 alkyl), or C.sub.1-C.sub.8 alkyl, C.sub.1-C.sub.8 haloalkyl, C.sub.2-C.sub.8 alkenyl, C.sub.2-C.sub.8 alkynyl, C.sub.3-C.sub.10 cycloalkyl, C.sub.3-C.sub.10 halocycloalkyl, C.sub.4-C.sub.10 alkylcycloalkyl, C.sub.4-C.sub.10 cycloalkylalkyl, C.sub.6-C.sub.14 cycloalkylcycloalkyl, C.sub.5-C.sub.10 alkylcycloalkylalkyl, C.sub.3-C.sub.8 cycloalkenyl, C.sub.1-C.sub.8 alkoxy, C.sub.1-C.sub.8 haloalkoxy, C.sub.3-C.sub.8 cycloalkoxy, C.sub.3-C.sub.8 halocycloalkoxy, C.sub.4-C.sub.10 cycloalkylalkoxy, C.sub.2-C.sub.8 alkenyloxy, C.sub.2-C.sub.8 alkynyloxy, C.sub.1-C.sub.8 alkylthio, C.sub.1-C.sub.8 alkylsulfinyl, C.sub.1-C.sub.8 alkylsulfonyl, C.sub.3-C.sub.8 cycloalkylthio, C.sub.3-C.sub.8 cycloalkylsulfinyl, C.sub.3-C.sub.8 cycloalkylsulfonyl, C.sub.4-C.sub.10 cycloalkylalkylthio, C.sub.4-C.sub.10 cycloalkylalkylsulfinyl, C.sub.4-C.sub.10 cycloalkylalkylsulfonyl, C.sub.2-C.sub.8 alkenylthio, C.sub.2-C.sub.8 alkenylsulfinyl, C.sub.2-C.sub.8 alkenylsulfonyl, C.sub.2-C.sub.8 alkynylthio, C.sub.2-C.sub.8 alkynylsulfinyl, C.sub.2-C.sub.8 alkynylsulfonyl, or phenyl; or two of R.sup.1, R.sup.2, and R.sup.3 on adjacent ring atoms may be taken together to form a 5- to 7-membered carbocyclic or heterocyclic ring, each ring containing ring members selected from carbon atoms and up to 3 heteroatoms independently selected from up to 2 O, up to 2 S, and up to 3 N, wherein up to 2 carbon atom ring members are independently selected from C(═O) and C(═S) and such ring is optionally substituted with up to 3 substituents independently selected from the group consisting of C.sub.1-C.sub.4 alkyl, C.sub.1-C.sub.4 haloalkyl, C.sub.2-C.sub.4 alkenyl, C.sub.2-C.sub.4 haloalkenyl, C.sub.2-C.sub.4 alkynyl, C.sub.2-C.sub.4 haloalkynyl, C.sub.3-C.sub.7 cycloalkyl, C.sub.3-C.sub.7 halocycloalkyl, C.sub.4-C.sub.8 alkylcycloalkyl, C.sub.4-C.sub.8 haloalkylcycloalkyl, C.sub.4-C.sub.8 cycloalkylalkyl, C.sub.4-C.sub.8 halocycloalkylalkyl, C.sub.1-C.sub.8 alkoxy, C.sub.1-C.sub.8 haloalkoxy, C.sub.2-C.sub.8 alkoxycarbonyl, C.sub.2-C.sub.6 haloalkoxycarbonyl, C.sub.2-C.sub.6 alkylcarbonyl and C.sub.2-C.sub.6 haloalkylcarbonyl; and M is an inorganic cation or organic cation.

High solubility thioether quinones

Substituted hydroquinones and quinones and methods of synthesizing such compounds are disclosed herein. The substituted hydroquinones have the formula: ##STR00001##
while the substituted quinones have the corresponding oxidized structure (1,4-benzoquinones). One, two, three, or all four of R.sup.1, R.sup.2, R.sup.3 and R.sup.4 comprise a thioether moiety and a sulfonate moiety, and wherein each R.sup.1, R.sup.2, R.sup.3 and R.sup.4 that does not comprise a thioether and a sulfonate moiety sulfonate moiety is independently a hydrogen, an alkyl or an electron withdrawing group. The substituted hydroquinones and quinones are soluble in water, stable in aqueous acid solutions, and have a high reduction potential in the oxidized form. Accordingly, they can be used as redox mediators in emerging technologies, such as in mediated fuel cells or organic-mediator flow batteries.