The present invention provides two-dimensional polymers P1 and P2 of pyromellitic diimide and hexaamino benzene and derivatives thereof, from monomer of Formula (M), which are used to synthesize composites for supercapacitor applications. M

The present invention provides two-dimensional polymers P1 and P2 of pyromellitic diimide and hexaamino benzene and derivatives thereof, from monomer of Formula (M), which are used to synthesize composites for supercapacitor applications. M

Disclosed are naphthalimide derivatives and in particular e.g. N-aryl-substituted naphthalimidopropylamine derivatives (i.e. 2-[3-(amino)propyl]-1H-benz[de]isoquinoline-1,3(2H)-dione derivatives) such as e.g. such as e.g. (Formula I) or (Formula III) as anti-parasitic agents for the treatment of Leishmaniasis. The compounds could also be useful to treat viral, bacterial and/or neoplastic diseases. The description discloses exemplary synthesis as well as biological tests against Leishmania infantum parasites (e.g. pages 54 to 58; examples 1 to 7). Exemplary compounds are: (example 3)(example 4) 2-(3-((5-amino naphthalene-1-yl)amino)propyl)-1H-benzo[de]isoquinoline-1, 3(2H)-dione (example 5) 2-(3-((5-amino naphthalene-1-yl)amino)propyl)-1H-benzo[de]isoquinoline-1,3(2H)-dione (example 6).

Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R.sup.1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y.sup.1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R.sup.11 and R.sup.12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R.sup.13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R.sup.2 to R.sup.7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R.sup.1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R.sup.1 is optionally substituted with —O— or the like). ##STR00001##

Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R.sup.1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y.sup.1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R.sup.11 and R.sup.12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R.sup.13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R.sup.2 to R.sup.7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R.sup.1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R.sup.1 is optionally substituted with —O— or the like). ##STR00001##

The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.

The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.

A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R.sup.1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y.sup.1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R.sup.11 and R.sup.12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R.sup.13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R.sup.2 to R.sup.7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R.sup.1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R.sup.1 is optionally substituted with —O— or the like). ##STR00001##

A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R.sup.1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y.sup.1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R.sup.11 and R.sup.12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R.sup.13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R.sup.2 to R.sup.7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R.sup.1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R.sup.1 is optionally substituted with —O— or the like). ##STR00001##

Provided is a fused ring diimide derivative having a chemical structure of formula I. Further provided is a preparation method therefor. The fused ring diimide derivative has excellent anti-tumor activity, and the anti-proliferative activity on various cancer cells is significantly better than that of similar compounds.

##STR00001##