There are provided A pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units.

Compared to the prior art, this invention provides a functionalized highly syndiotactic polystyrene, comprising a repeating unit having a structure represented by formula (I), or comprising a repeating unit having a structure represented by formula (I) and a repeating unit having a structure represented by formula (II). It is indicated by the experimental results that the syndiotacticity selectivity of the highly syndiotactic polymer provided by this invention is no less than 90%, and the proportion of the repeating unit having a structure represented by formula (I) in the polymer may be arbitrarily adjusted and may be up to 100%. Meanwhile, the oxygen- or sulfur-containing groups in the polymer may increase the polarity of the highly syndiotactic polystyrene so as to increase the blendability of the highly syndiotactic polystyrene with other polymers.

##STR00001##

Compared to the prior art, this invention provides a functionalized highly syndiotactic polystyrene, comprising a repeating unit having a structure represented by formula (I), or comprising a repeating unit having a structure represented by formula (I) and a repeating unit having a structure represented by formula (II). It is indicated by the experimental results that the syndiotacticity selectivity of the highly syndiotactic polymer provided by this invention is no less than 90%, and the proportion of the repeating unit having a structure represented by formula (I) in the polymer may be arbitrarily adjusted and may be up to 100%. Meanwhile, the oxygen- or sulfur-containing groups in the polymer may increase the polarity of the highly syndiotactic polystyrene so as to increase the blendability of the highly syndiotactic polystyrene with other polymers.

##STR00001##

There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).

There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).

A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.

Disclosed are ion-sensitive polymers and methods for their use for monitoring biological phenomena associated with ion fluxes, as well as organic electrochemical transistors including such polymers.

A method for making a conductive polymer for electromagnetic shielding purposes includes steps of mixing liquid crystal monomers, a silver complex, an initiator, and a catalytic agent in certain proportions by weight to form a mixture. A solvent is added into the mixture, the mixture and the solvent being in a ratio from 3:17 to 1:3 by weight. The mixture is heated to undergo an atom transfer radical polymerization.

An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher: (a) the weight-average molecular weight is 3,000 or more and 6,500 or less, and (b) the glass transition temperature (Tg) is 140° C. or higher.

An actinic ray sensitive or radiation sensitive resin composition contains a polymer compound (A) having a phenolic hydroxyl group and satisfying the following (a) and (b), a compound (B) capable of generating an acid upon irradiation with actinic rays or radiation, and a crosslinking agent (C) for crosslinking the polymer compound (A) by the action of an acid and having a glass transition temperature (Tg) of 200° C. or higher: (a) the weight-average molecular weight is 3,000 or more and 6,500 or less, and (b) the glass transition temperature (Tg) is 140° C. or higher.