Provided is a process for silver nanowire production in which the major-axis length of the silver nanowires can be controlled in a wide range and an agent for controlling the growth of silver nanowires. A process for silver nanowire production which is characterized in that an agent for controlling the growth of silver nanowires which comprises a polymer obtained by polymerizing one or more polymerizable monomers comprising an N-substituted (meth)acrylamide is reacted with a silver compound in a polyol at 25-180 C. The agent for controlling the growth of silver nanowires is characterized by comprising a polymer which has units of an N-substituted (meth)acrylamide as a polymerizable monomer.

Provided is a process for silver nanowire production in which the major-axis length of the silver nanowires can be controlled in a wide range and an agent for controlling the growth of silver nanowires. A process for silver nanowire production which is characterized in that an agent for controlling the growth of silver nanowires which comprises a polymer obtained by polymerizing one or more polymerizable monomers comprising an N-substituted (meth)acrylamide is reacted with a silver compound in a polyol at 25-180 C. The agent for controlling the growth of silver nanowires is characterized by comprising a polymer which has units of an N-substituted (meth)acrylamide as a polymerizable monomer.

This invention relates to a polymer composition comprising a water-soluble anionic P2 polymer obtained by radical polymerization of at least one anionic monomer, in the presence of a water-soluble homopolymer P1 with a weight-average molecular weight of between 5,000 and 100,000 daltons

said water-soluble anionic P2 polymer having a weight-average molecular weight of greater than 100,000 dalton and less than or equal to 40 million daltons,
said water-soluble P1 homopolymer having been prepared from 2-acrylamido-2-methylpropanesulphonic acid in salified form and in the presence of 200 to 20,000 ppm by weight of 2-methyl-2-propenylsulphonic acid in salified form.

A polymerizable composition includes a water-soluble monofunctional acrylamide compound, a water-soluble photoradical initiator, a water-soluble photosensitizer, and an aqueous solvent.

A cleaning solution that is used, inter alia, for removal of residue of a photoresist pattern or etching residue, and has exceptional anticorrosion properties with respect to silicon nitride; and a method for cleaning a substrate using the cleaning solution. In a cleaning solution containing a hydrofluoric acid and a solvent, a polymer that includes units derived from a compound of a specific structure having a carboxylic acid amide bond (CON<) and an unsaturated double bond is blended as an anticorrosive agent. Polyvinylpyrrolidone is preferred as the polymer used as the anticorrosive agent.

Provided is a polishing composition which contains a water-soluble polymer and is suitable for reducing LPDs. The polishing composition provided in this application includes an abrasive, a water-soluble polymer, and a basic compound. In the polishing composition, the content of a reaction product of a polymerization initiator and a polymerization inhibitor is 0.1 ppb or less of the polishing composition on a weight basis.

A membrane obtainable from curing a composition comprising: (i) a curable compound comprising at least two (meth)acrylic groups and a sulphonic acid group and having a molecular weight which satisfies the equation:
MW<(300+300n) wherein: MW is the molecular weight of the said curable compound; and n has a value of 1, 2, 3 or 4 and is the number of sulphonic acid groups present in the said curable compound; and optionally (ii) a curable compound having one ethylenically unsaturated group; wherein the molar fraction of curable compounds comprising at least two (meth)acrylic groups, relative to the total number of moles of curable compounds present in the composition, is at least 0.25.

A membrane obtainable from curing a composition comprising: (i) a curable compound comprising at least two (meth)acrylic groups and a sulphonic acid group and having a molecular weight which satisfies the equation:
MW<(300+300n) wherein: MW is the molecular weight of the said curable compound; and n has a value of 1, 2, 3 or 4 and is the number of sulphonic acid groups present in the said curable compound; and optionally (ii) a curable compound having one ethylenically unsaturated group; wherein the molar fraction of curable compounds comprising at least two (meth)acrylic groups, relative to the total number of moles of curable compounds present in the composition, is at least 0.25.

The disclosed technology relates to water soluble, or partially water soluble, chain transfer agents for preparing water soluble polymers by Reversible Addition-Fragmentation Chain Transfer (RAFT) polymerization in an aqueous medium.

The disclosed technology relates to water soluble, or partially water soluble, chain transfer agents for preparing water soluble polymers by Reversible Addition-Fragmentation Chain Transfer (RAFT) polymerization in an aqueous medium.