Patent classifications
C08F220/16
ADDITION CURABLE SILICONE ADHESIVE COMPOSITIONS
A curable silicone adhesive composition comprising a combination of adhesion promoters is shown and described herein. The composition includes a first adhesion promoter selected from a silicon hydride adhesion promoter and a second adhesion promoter selected from an acrylate functional adhesion promoter to provide a silicone material that is curable at relatively low temperatures and shorter time and provides good adhesion to plastics and metal.
ADDITION CURABLE SILICONE ADHESIVE COMPOSITIONS
A curable silicone adhesive composition comprising a combination of adhesion promoters is shown and described herein. The composition includes a first adhesion promoter selected from a silicon hydride adhesion promoter and a second adhesion promoter selected from an acrylate functional adhesion promoter to provide a silicone material that is curable at relatively low temperatures and shorter time and provides good adhesion to plastics and metal.
Material for intraocular lens
The present invention provides a material for intraocular lens which has improved hydrolysis resistance. The material for intraocular lens according to the present invention is obtained by polymerizing a monomer composition comprising: a base monomer, a hydrophilic monomer, and a cross-likable monomer, wherein the base monomer comprises an aromatic ring-containing acrylate monomer and an alkoxyalkyl methacrylate monomer having an alkoxyalkyl group having four or less carbon atoms. A blending ratio on a molar basis of the methacrylate monomer with respect to the acrylate monomer in all the monomer components contained in the monomer composition is 0.25 to 1.00.
Air void control composition for carbonyl-containing monomer polymerization
The invention relates to the use of low levels of glycols and short chain diols to control air void formation in any polymerization reaction having carbonyl-containing monomers, and preferably carboxylic acid ester monomers, at a level of at least 10% of total monomer, where the monomer has a peak polymerization exotherm temperature of greater than the boiling point of the monomer. The glycols and short chain diols are used in the polymization mixture at levels of 0.5 to 10 weight percent, based on the carboxylic acid ester-containing monomer. It is believed the glycols and short chain diols hydrogen bond with the —(C═O)O— containing monomer to increase the monomer boiling point, and decrease or even eliminate the formation of air voids due to monomer boiling. The invention is especially useful in polymerization of methyl methacrylate polymers and copolymers, either neat, or as a polymer composite system.
OPTICALLY ANISOTROPIC LAYER, OPTICAL FILM, POLARIZING PLATE, AND IMAGE DISPLAY DEVICE
Provided is an optically anisotropic layer with which an image display device having suppressed occurrence of oblique light leakage can be manufactured; and an optical film, a polarizing plate, and an image display device, each having the optically anisotropic layer. The optically anisotropic layer is obtained by curing a polymerizable liquid crystal composition including a predetermined rod-like liquid crystal compound and a predetermined monofunctional compound, and immobilizing an alignment state of the rod-like liquid crystal compound, in which a number a1 of atoms of the rod-like liquid crystal compound and a number a2 of atoms of the monofunctional compound satisfy a relationship of Expression (1): 0.2<a2/a1≤0.68, and the rod-like liquid crystal compound is immobilized in a state of being vertically aligned with respect to the main surface of the optically anisotropic layer.
Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound
A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##
Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound
A radiation-sensitive resin composition includes: a resin containing a structural unit A represented by formula (1); at least one radiation-sensitive acid generator selected from the group consisting of a radiation-sensitive acid generator represented by formula (2-1) and a radiation-sensitive acid generator represented formula (2-2); and a solvent. At least one R.sup.3 is an acid-dissociable group; and R.sup.41 is a hydrogen atom or a protective group to be deprotected by action of an acid. At least one of R.sup.f1 and R.sup.f2 is a fluorine atom or a fluoroalkyl group; R.sup.5a is a monovalent organic group having a cyclic structure; X.sub.1.sup.+ is a monovalent onium cation; R.sup.5b is a monovalent organic group, and X.sub.2.sup.+ is a monovalent onium cation whose atom having a positive charge is not an atom forming a cyclic structure. ##STR00001##
Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process
A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.
Thermo-sensitive cell culture substrate having block copolymer
A method of preparing PNVCL block polymers as the substrate for thermo-sensitive cultureware is provided. A hydrophobic polymer of poly n-butyl mathacrylate (PBMA) is obtained by atom transfer radical polymerization (ATRP) with typical haloalkane as an initiator. Further a thermo-sensitive block copolymer of poly n-vinyl caprolactam (PNVCL) is obtained by polymerization of N-vinyl caprolactam (NVCL) monomers using the hydrophobic PBMA polymer as a macroinitiator.
CURABLE RESIN COMPOSITION, CURED OBJECT, AND THREE-DIMENSIONAL OBJECT
A curable resin composition that has low viscosity and forms a cured product having excellent mechanical physical properties, a cured product, and a three-dimensional object The curable resin composition contains a urethane resin (A) containing a (meth)acryloyl group, and a monofunctional (meth)acrylate compound (B1) and/or a bifunctional (meth)acrylate compound (B2), in which the urethane resin (A) is formed using, as essential reaction raw materials, a polyester polyol (a1), a polyisocyanate (a2), and a compound (a3) containing a hydroxyl group and a (meth)acryloyl group, and the polyester polyol (a1) is formed using, as essential reaction raw materials, a glycol (a1-1) containing a hydrocarbon group in a side chain, and a polycarboxylic acid (a1-2).