An object of the present invention is to provide an optical laminate in which optically anisotropic layers exhibiting reverse wavelength dispersibility have excellent moisture-heat resistance, and the adhesiveness between a first optically anisotropic layer and a second optically anisotropic layer is excellent; and a polarizing plate and an image display device, each using the optical laminate. The optical laminate according to an embodiment of the present invention is an optical laminate having a first optically anisotropic layer and a second optically anisotropic layer, in which both of the first optically anisotropic layer and the second optically anisotropic layer are directly laminated and consist of a liquid crystal layer, at least one of the first optically anisotropic layer or the second optically anisotropic layer exhibits reverse wavelength dispersibility, a photo-alignment polymer having a photo-alignment group and a fluorine atom or a silicon atom is present on a surface of the second optically anisotropic layer on a side in contact with the first optically anisotropic layer, and an element ratio of fluorine or silicon on the surface of the second optically anisotropic layer on the side in contact with the first optically anisotropic layer is 0.05% to 15.00% by atom.

An object of the present invention is to provide an optical laminate in which optically anisotropic layers exhibiting reverse wavelength dispersibility have excellent moisture-heat resistance, and the adhesiveness between a first optically anisotropic layer and a second optically anisotropic layer is excellent; and a polarizing plate and an image display device, each using the optical laminate. The optical laminate according to an embodiment of the present invention is an optical laminate having a first optically anisotropic layer and a second optically anisotropic layer, in which both of the first optically anisotropic layer and the second optically anisotropic layer are directly laminated and consist of a liquid crystal layer, at least one of the first optically anisotropic layer or the second optically anisotropic layer exhibits reverse wavelength dispersibility, a photo-alignment polymer having a photo-alignment group and a fluorine atom or a silicon atom is present on a surface of the second optically anisotropic layer on a side in contact with the first optically anisotropic layer, and an element ratio of fluorine or silicon on the surface of the second optically anisotropic layer on the side in contact with the first optically anisotropic layer is 0.05% to 15.00% by atom.

A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##

A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##

A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone. ##STR00001##

A method for producing a composition for forming a non-photosensitive upper layer film that is disposed on a workpiece and a photosensitive resist film, the production method includes cleaning a production device for a composition X.sub.A for forming a non-photosensitive upper layer film with a cleaning liquid to clean the production device until a concentration of a resin included in the cleaning liquid reaches 10 ppm by mass or less, discharging the cleaning liquid from the production device, and producing the composition X.sub.A for forming a non-photosensitive upper layer film using the production device. The cleaning, the discharging, and the producing are performed in this order.

A method for producing a composition for forming a non-photosensitive upper layer film that is disposed on a workpiece and a photosensitive resist film, the production method includes cleaning a production device for a composition X.sub.A for forming a non-photosensitive upper layer film with a cleaning liquid to clean the production device until a concentration of a resin included in the cleaning liquid reaches 10 ppm by mass or less, discharging the cleaning liquid from the production device, and producing the composition X.sub.A for forming a non-photosensitive upper layer film using the production device. The cleaning, the discharging, and the producing are performed in this order.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure

##STR00001##

wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

The present invention provides an energy ray-curable coating material for three-dimensional shaped articles that provides excellent toughness in the cured product, and an energy ray-curable material kit for three-dimensional shaping including the coating material. The present invention relates to an energy ray-curable coating material (A) for three-dimensional shaped articles, comprising a polymerizable compound and a polymerization initiator (c), the polymerizable compound comprising a monofunctional polymerizable compound (a), and/or a polyfunctional polymerizable compound (b) having two or more polymerizable groups per molecule, the polyfunctional polymerizable compound (b) having a Mw/n of 120 or more, where Mw is a molecular weight of the polyfunctional polymerizable compound (b), and n is the number of polymerizable groups per molecule.