Patent classifications
C08F220/36
Graft copolymer and soil resistant composition
Provided is a graft copolymer and a treatment method which give excellent antifouling property to a substrate, especially a carpet. The graft copolymer has a trunk polymer having a hydroxyl group; and a branch having a C.sub.7-40 hydrocarbon group bonded to the trunk polymer at a carbon atom substituted with the hydroxyl group, wherein the branch has a repeating unit formed from an acrylic monomer represented by the formula: CH.sub.2═C(—X)—C(═O)—Y.sup.1—Z(—Y.sup.2—R).sub.n. The treatment method include applying the graft copolymer to the substrate.
Polymers, underlayer coating compositions comprising the same, and patterning methods
A polymer comprising a first repeating unit including an amino group protected by an alkoxycarbonyl group; a second repeating unit including a nucleophilic group; and a third repeating unit including a crosslinkable group, wherein the first repeating unit, the second repeating unit, and the third repeating unit are different from each other.
Adhesive sheet for temporary fixation and method of manufacturing semiconductor device using the same
An adhesive sheet for temporary fixation which may have excellent heat resistance to exhibit a sufficient adhesive force even though it undergoes a high temperature process during a process of manufacturing a semiconductor device and may also exhibit a sufficient reduction of the adhesive force by photocuring during the step of peeling off, and a method of manufacturing a semiconductor device using the same, are provided.
Adhesive sheet for temporary fixation and method of manufacturing semiconductor device using the same
An adhesive sheet for temporary fixation which may have excellent heat resistance to exhibit a sufficient adhesive force even though it undergoes a high temperature process during a process of manufacturing a semiconductor device and may also exhibit a sufficient reduction of the adhesive force by photocuring during the step of peeling off, and a method of manufacturing a semiconductor device using the same, are provided.
Aqueous polymer dispersion and aqueous coating composition comprising thereof
An aqueous dispersion and an aqueous coating composition comprising the aqueous dispersion, and the aqueous coating composition providing coatings made therefrom with improved anti-corrosion property and good water resistance and block resistance.
Aqueous polymer dispersion and aqueous coating composition comprising thereof
An aqueous dispersion and an aqueous coating composition comprising the aqueous dispersion, and the aqueous coating composition providing coatings made therefrom with improved anti-corrosion property and good water resistance and block resistance.
Water soluble waxy support materials for three-dimensional printing applications
In one aspect, urethane waxes are described herein comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. In some embodiments, the urethane waxes are combined with other components to provide support materials for use in three-dimensional printing applications. A support material ink, for example, comprises a urethane wax comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. The support material ink, in some embodiments, further comprises monomeric curable material, oligomeric curable material, or mixtures thereof.
Water soluble waxy support materials for three-dimensional printing applications
In one aspect, urethane waxes are described herein comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. In some embodiments, the urethane waxes are combined with other components to provide support materials for use in three-dimensional printing applications. A support material ink, for example, comprises a urethane wax comprising a reaction product between monofunctional polyethylene oxide and polyisocyanate. The support material ink, in some embodiments, further comprises monomeric curable material, oligomeric curable material, or mixtures thereof.
COMBINATION OF CROSSLINKERS TO IMPROVE COATING PROPERTIES
Multiphase polymers comprising crosslinking monomers and polyfunctional amine are disclosed. The multiphase polymer comprises a first phase polymer having a Tg from 60° C. to 240° C., a second phase polymer having a Tg from 40° C. to 240° C., and a soft phase polymer having a Tg from -25° C. to 30° C. The crosslinking monomers include a triacrylate such as trimethylol propane triacrylate, an unsaturated alkoxysilane, and an unsaturated keto monomer reactive with the polyfunctional amine. In contrast to conventional knowledge, incorporation of trimethylolpropane triacrylate reduces the minimum film forming temperature of multiphase polymers. This unusual reduction in MFFT helps to reduce the VOC requirement to form a good film at low VOC. The other crosslinking monomers including unsaturated alkoxy silane and unsaturated keto monomer which react with the polyfunctional amine improve print resistance, block resistance and lower the tackiness of paint films. The multiphase polymer is particularly suitable for use in deep base paints.
COMBINATION OF CROSSLINKERS TO IMPROVE COATING PROPERTIES
Multiphase polymers comprising crosslinking monomers and polyfunctional amine are disclosed. The multiphase polymer comprises a first phase polymer having a Tg from 60° C. to 240° C., a second phase polymer having a Tg from 40° C. to 240° C., and a soft phase polymer having a Tg from -25° C. to 30° C. The crosslinking monomers include a triacrylate such as trimethylol propane triacrylate, an unsaturated alkoxysilane, and an unsaturated keto monomer reactive with the polyfunctional amine. In contrast to conventional knowledge, incorporation of trimethylolpropane triacrylate reduces the minimum film forming temperature of multiphase polymers. This unusual reduction in MFFT helps to reduce the VOC requirement to form a good film at low VOC. The other crosslinking monomers including unsaturated alkoxy silane and unsaturated keto monomer which react with the polyfunctional amine improve print resistance, block resistance and lower the tackiness of paint films. The multiphase polymer is particularly suitable for use in deep base paints.