Polymeric materials and methods for making the polymeric materials utilizing bisphenolic stillbottoms, lignosulfonates, or both are disclosed. In one embodiment, a polymer is provided that includes a condensate of bisphenolic stillbottoms, an optional phenolic compound independent of bisphenolic stillbottoms, an aldehyde, and a lignosulfonate compound. The condensate may further include an amino compound, a catalyst, or combinations thereof. Alternatively, the polymer may be free of a phenolic compound independent of bisphenolic stillbottoms. The polymers may be used in the manufacture of articles including composites, laminates and paper products.

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

A flame retardant composition comprising graphene nanoplatelets and a condensation product of a sulfonated aromatic compound with formaldehyde, wherein the w/w ratio between the graphene and the condensation product is in the range of 1:15 to 4:1. The composition may be in the form of a water dispersion applied to the surface of the article to be treated. The composition has optimal flame retardant properties even when applied in relatively modest quantities.

The present invention is a dispersant composition for a hydraulic composition, which includes (A) a cement dispersant composed of a polymer having a naphthalene ring-containing monomer unit, and (B) one or more specific alkylene oxide-added compounds represented by the general formula (B1), wherein a molar ratio of a total amount of (B) to the naphthalene ring-containing monomer unit in (A) is 3% or more and 16% or less.

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

A composition includes an addition condensation product of an aromatic compound and a carbonyl compound, and a thiol compound. The composition described above includes, for example, 0.01 parts by mass or more and 100 parts by mass or less of a thiol compound per 100 parts by mass of an aromatic compound. In the compositions described above, the addition condensation product may include a first type of addition condensation product having a first average molecular weight and a second type of addition condensation product having a second average molecular weight. In the composition described above, the first average molecular weight and the second average molecular weight are different from each other.

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

Polymeric materials and methods for making the polymeric materials utilizing bisphenolic stillbottoms, lignosulfonates, or both are disclosed. In one embodiment, a polymer is provided that includes a condensate of bisphenolic stillbottoms, an optional phenolic compound independent of bisphenolic stillbottoms, an aldehyde, and a lignosulfonate compound. The condensate may further include an amino compound, a catalyst, or combinations thereof. Alternatively, the polymer may be free of a phenolic compound independent of bisphenolic stillbottoms. The polymers may be used in the manufacture of articles including composites, laminates and paper products.

Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.

A combination of antioxidants and method of incorporating the antioxidants into an asphalt binder to make a modified asphalt binder are described. The antioxidants comprise a thioester and an aldehyde. The aldehyde and thioester, in a ratio between about 1:100 and about 100:1 parts by weight, are added to an asphalt binder. An acidic catalyst is also added in a concentration between about 0.1 wt % and about 18 wt % of the asphalt binder. The antioxidants, asphalt binder, and catalyst are mixed at a temperature between about 85 C. and about 135 C. for a time between about 30 minutes and about 6 hours. The antioxidants are capable of improving the performance grade of the asphalt binder. The modified asphalt binder possesses superior resistance to oxidative age hardening compared to other modified asphalt binder compositions that incorporate various antioxidants.