A benzocyclobutene-containing polyimide resin and a benzocyclobutene-containing polyimide resin composition are provided. The composition includes: (a) a filler: hollow silica, a perfluoroalkoxy alkane resin, or a combination thereof, and (b) a benzocyclobutene-containing polyimide resin with characteristics of high heat resistance, low dielectric property, low elastic modulus, and suitable for manufacturing a redistribution layer and a polyamide film of a semiconductor packaging material in a high-speed and high-frequency field.

Provided is a polyimide precursor composition including a polyimide precursor including a siloxane structure and a solvent having a negative partition coefficient (log P). The polyimide precursor composition may be used to alleviate thermal expansion-contraction behavior, thereby producing a polyimide film with minimal curling.

Compositions including a polyimide and one or more thermally conductive fillers, and compaction rollers for an automated fiber placement machine incorporating the compositions are provided. The polyimide may be a polymeric reaction product of a dianhydride and one or more diamines. The one or more diamines may include a fluorine-containing alkyl ether diamine. The one or more thermally conductive fillers may include one or more of a carbon-based filler, boron nitride, a metal, or combinations thereof. The compositions may have a thermal conductivity of from about 0.2 to about 50 Watts per meter Kelvin (Wm.sup.−1 K.sup.−1).

The present invention provides an amic acid ester oligomer having a structure of Formula (1) or (1′): ##STR00001## wherein G, P, R, R.sub.x, D, E and m are those as defined in the specification. The present invention also provides a polyimide precursor composition or a photosensitive polyimide precursor composition comprising the amic acid ester oligomer, as well as a polyimide prepared from the composition.

To provide a polyimide film and a metal-clad laminate that are excellent in low hygroscopic dielectric properties, the polyimide film has a dielectric loss tangent of less than 0.010 after being immersed in water at 25° C. for 24 hours.

Copoly(imide oxetane) materials are disclosed that can exhibit a low surface energy while possessing the mechanical, thermal, chemical and optical properties associated with polyimides. The copoly(imide oxetane)s are prepared using a minor amount of fluorinated oxetane-derived oligomer with sufficient fluorine-containing segments of the copoly(imide oxetane)s migrate to the exterior surface of the polymeric material to yield low surface energies. Thus the coatings and articles of manufacture made with the copoly(imide oxetane)s of this invention are characterized as having an anisotropic fluorine composition. The low surface energies can be achieved with very low content of fluorinated oxetane-derived oligomer. The copolymers of this invention can enhance the viability of polyimides for many applications and may be acceptable where homopolyimide materials have been unacceptable.

Copoly(imide oxetane) materials are disclosed that can exhibit a low surface energy while possessing the mechanical, thermal, chemical and optical properties associated with polyimides. The copoly(imide oxetane)s are prepared using a minor amount of fluorinated oxetane-derived oligomer with sufficient fluorine-containing segments of the copoly(imide oxetane)s migrate to the exterior surface of the polymeric material to yield low surface energies. Thus the coatings and articles of manufacture made with the copoly(imide oxetane)s of this invention are characterized as having an anisotropic fluorine composition. The low surface energies can be achieved with very low content of fluorinated oxetane-derived oligomer. The copolymers of this invention can enhance the viability of polyimides for many applications and may be acceptable where homopolyimide materials have been unacceptable.

The present invention provides a polyimide film comprising an inorganic filler, which comprises a first filler group having a diameter (D50) of 2-2.7 μm and a second filler group having an average diameter (D50) of 1-1.7 μm, wherein the polyimide film satisfies relation 1: 0.7≤(D90−D10)/(D50)≤1.2, which is about the respective diameters of the first filler group and the second filler group.

A polyimide laminated film includes a porous polyimide layer that has a porosity of from 30% to 90% and pores having a spherical shape and a non-porous polyimide layer that has a porosity of 5% or less.

A modified polyamic acid, a preparation method thereof, and a preparation method of a composite film are provided. The modified polyamic acid includes polyamic acid and polyvinylidene fluoride. The modified polyamic acid is formed by introducing polyvinylidene fluoride having good thermal stability, high dielectric constant, excellent piezoelectric, and ferroelectric properties, so the dielectric constant and structural adjustability of the modified polyamic acid are improved.