Embodiments of the present disclosure feature an intrinsically microporous ladder-type Tröger's base polymer including a repeat unit based on a combination of W-shaped CANAL-type and V-shaped Tröger's base building blocks, methods of making the intrinsically microporous ladder-type Tröger's base polymer, and methods of using the intrinsically microporous ladder-type Tröger's base polymer to separate a chemical species from a fluid composition including a mixture of chemical species. Embodiments of the present disclosure further include ladder-type diamine monomers for reacting to form a Tröger's base in situ, and methods of making the ladder-type diamine monomers using catalytic arene-norbornene annulation.

A method for the purification of a bisphenol A dianhydride composition includes contacting the bisphenol A dianhydride composition with a halogenated solvent to form a solution, and one or more of filtering the solution to remove ionic species; washing the solution with aqueous media to remove ionic species; crystallizing bisphenol A dianhydride from the solution to remove ionic species; and contacting the solution with an adsorbent to remove ionic species. A purified bisphenol A dianhydride composition is also described. The bisphenol A dianhydride composition can be used in the preparation of a poly(etherimide), and poly (etherimides) made from the bisphenol A dianhydride composition can be useful for forming a variety of articles.

A method for producing a reactive intermediate composition, including: reacting a substituted phthalic anhydride of the formula (I) with a diamine of the formula H.sub.2N—R—NH.sub.2 in the presence of an aromatic dianhydride in an amount of 10 to 50 mole percent based on the total moles of anhydride functionality in the reaction; wherein the reacting is conducted in an aprotic solvent in a reactor, under conditions effective to produce the reactive intermediate composition; and wherein X comprises a halogen or a nitro group, and R comprises a C.sub.6-36 aromatic hydrocarbon group or a halogenated derivative thereof, a straight or branched chain C.sub.2-20 alkylene or a halogenated derivative thereof, or a C.sub.3-8 cycloalkylene or a halogenated derivative thereof. ##STR00001##

A high-flow polymer composition includes a polyetherimide (PEI), a PEEK-PEDEK copolymer, and optionally a poly(aryletherketone) (PAEK) other than the PEEK-PEDEK copolymer. The polymer composition surprisingly exhibits improved toughness and chemical resistance, making it suitable for the manufacture of shaped articles where a combination of high-flow, impact resistance, and chemical resistance are required.

The present invention relates to self-healing polymers, more particular autonomously self-healing polymers and uses thereof in various domains, such as 3D printing, flexible electronics and soft robotics. Furthermore, the present invention relates to structures comprising said polymers.

A negative photosensitive resin composition having a high resolution, mechanical strength, adhesion and the like, as well as excellent storage stability. A negative photosensitive resin composition, including: (A) one or more structures selected from a polyimide structure, a polyamide structure, a polybenzoxazole structure, a polyamideimide structure, and precursor structures thereof; (B) a photoacid generator; (C) one or more kinds of crosslinking agent selected from an amino condensate modified with formaldehyde or formaldehyde-alcohol, a phenol compound having on average two or more methylol groups or alkoxymethylol groups within one molecule, a compound in which a hydrogen atom of a hydroxyl group of polyhydric phenol is substituted with a glycidyl group or a group having a glycidyl group, a compound in which a hydrogen atom of a hydroxyl group of polyhydric phenol is substituted with a substituent represented by the formula (C-1), a compound represented by the formula (C-15), and a compound containing two or more nitrogen atoms having a glycidyl group represented by the formula (C-2); (D) an onium salt represented by the formula (1); and (E) a solvent.

The present invention provides a separation membrane suitable for separating water from a liquid mixture containing an alcohol and water, the separation membrane being capable of reducing a decrease in separation performance regardless of long-term use. A separation membrane 10 of the present invention includes a polyimide having a structural unit X represented by the following formula (1) and a structural unit Y represented by following formula (2).

##STR00001##

##STR00002##

A.sup.1 is a linking group including no arylene group in a main chain and having a solubility parameter, in accordance with a Fedors method, of more than 5.0 (cal/cm.sup.3).sup.½. A.sup.2 is a tetravalent organic group including an arylene group.

An article includes a composition including a high heat amorphous thermoplastic polymer having a glass transition temperature of greater than 180° C.; a poly(phenylene ether) oligomer; a flow promoter comprising a polyester, a poly (carbonate-ester), an aromatic poly ketone, poly(phenylene sulfide), or a combination thereof; and a mineral filler, wherein particular amounts of each component can be as defined herein. The article further includes a metal layer disposed on a surface of the composition. The articles of the present disclosure can be especially useful in consumer electronics applications.

A photosensitive resin composition of the invention contains (A) a polyimide precursor having a polymerizable unsaturated bond, (B) a photopolymerization initiator comprising a compound represented by the formula (11), (C) a thermal radical generator, and (D) a solvent containing γ-butyrolactone:

##STR00001##

wherein in the formula (11), R.sup.11 is a substituted or unsubstituted benzoyl group, a substituted or unsubstituted fluorenyl group, or a group comprising a substituted or unsubstituted carbazolyl group; R.sup.12 is an alkyl group including 1 to 12 carbon atoms, a group comprising a cycloalkyl group including 4 to 10 carbon atoms, a group comprising a phenyl group, or a group comprising a tolyl group; R.sup.13 is a substituted or unsubstituted aromatic hydrocarbon group including 6 to 20 carbon atoms.

A resin composition contains a polyimide resin and an ester-based resin. The ester-based resin is polycarbonate or polyarylate. The polyimide contains a structural unit represented by general formula (1). In general formula (1), X is a divalent organic group shown in group (I), and Y is a divalent group that contains one or more selected from the group consisting of a fluorine group, a trifluoromethyl group, a sulfonic group, a fluorene structure and an alicyclic structure. Each of R.sup.1 and R.sup.2 is a fluorine atom, an alkyl group having 1 to 20 carbon atoms, or a fluoroalkyl group having 1 to 20 carbon atoms, m is an integer of 1 to 4, and n is an integer of 0 to 4.

##STR00001##