An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R.sub.1 and R.sub.4 each represent a hydrogen atom, an allyl or propargyl group, R.sub.2 and R.sub.5 each represent a substituent, R.sub.3 and R.sub.6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. “m” and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1≤h+j≤4, and “1” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.

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In an aspect, a plurality of artificial melanin nanoparticles are provided, wherein: each melanin nanoparticle of the plurality of artificial melanin nanoparticles comprises a plurality of melanin oligomers; each melanin oligomer comprises a plurality of covalently-bonded melanin base units; and each melanin base unit comprises substituted or unsubstituted naphthalene. In an aspect, porous artificial melanin materials and methods of synthesizing porous artificial melanin materials are provided.

The present application discloses a polyhydroxy aromatic intermediate, preparation thereof and use thereof in a polycondensate water-reducer with branched side chains. The polycondensate water-reducer with branched side chains has a branched side chain structure which provides a stronger steric hindrance. The synergistic effect of the branched side chains and the rigid skeleton of the aromatic ring greatly improves the water-reducing ability. Especially under a condition of low water/cement ratio, the improvement in water-reducing ability is more obvious. The branched polyether side chain is more conducive to the formation of a thicker water film layer, which has an obvious viscosity reduction effect. The conformation of the branched polyether side chain is less affected by different ionic environments in the pore solution in cement, and thus has a stronger adaptability to various raw materials. The water-reducer is suitable for the preparation of high-strength concrete, self-compacting concrete and concrete with low water-to-binder ratio and high volume of mineral admixtures, especially for the preparation of concrete containing machine-made sand.

A hard mask-forming composition which forms a hard mask used in lithography, including: a resin containing an aromatic ring and a polar group; and a compound containing at least one of an oxazine ring fused to an aromatic ring, and a fluorene ring.

A composition for forming an underlayer film necessary for facilitating alignment of self-assembled film into desired vertical pattern. Composition for forming an underlayer film of self-assembled film including a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound in main chain. The polymer is a polymer having unit structure containing aliphatic polycyclic structure of aliphatic polycyclic compound with aromatic ring structure of aromatic ring-containing compound or polymer chain derived from vinyl group of vinyl group-containing compound in main chain. The polymer has unit structure of Formula (1):
X—Y  Formula (1)
wherein X is single bond, divalent group having vinyl structure as polymer chain, or divalent group having aromatic ring-containing structure as polymer chain, and Y is divalent group having aliphatic polycyclic structure as polymer chain. The aliphatic polycyclic compound is bi- to hexa-cyclic diene compound. The aliphatic polycyclic compound is dicyclopentadiene or norbornadiene.

A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1A) or (1B), and an organic solvent, where Ar.sub.1 and Ar2 represent a benzene ring or naphthalene ring which optionally have a substituent; X represents a single bond or methylene group; a broken line represents a bonding arm; R represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; and W.sub.1 represents a hydroxyl group, an alkyloxy group having 1 to 10 carbon atoms, or an organic group having at least one aromatic ring optionally having a substituent. A composition for forming an organic film, the composition containing a polymer with high carbon content and thermosetting property as to enable high etching resistance and excellent twisting resistance; a patterning process using the composition; and a polymer suitable for the composition for forming an organic film. ##STR00001##

A resist underlayer film-forming composition for lithography process having characteristics of enabling wafer surface planarization after film formation, excellent planarization performance on substrate with level difference, and good embeddability in fine hole pattern. The resist underlayer film-forming composition including polymer having unit structure of Formula (1) and solvent,

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wherein each of R.sup.1 to R.sup.4 is independently hydrogen atom or methyl group, and X.sup.1 is divalent organic group having at least one arylene group optionally substituted by alkyl group, amino group, or hydroxyl group, and wherein X.sup.1 in Formula (1) is organic group of Formula (2),

##STR00002##

wherein A.sup.1 is phenylene group or naphthylene group, A.sup.2 is phenylene group, naphthylene group, or organic group of Formula (3), and dotted line is bond, and

##STR00003##

wherein each of A.sup.3 and A.sup.4 is independently phenylene group or naphthylene group, and dotted line is bond.

The present invention concerns a polymer comprising:—at least one repetitive unit (V) having the following formula (T):(T)—and preferably at least one, preferably at least two, repetitive unit(s) (U) having the following formula (D):(D).

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A method for preparing a magnetic chain structure is provided. The method comprises providing a plurality of magnetic particles; dispersing the plurality of magnetic particles in a solution comprising a dopamine-based material to form a reaction mixture; applying a magnetic field across the reaction mixture to align the magnetic particles in the reaction mixture; and polymerizing the dopamine-based material on the aligned magnetic particles to obtain the magnetic chain structure. A magnetic chain structure prepared by the method is also provided.

A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R.sup.1 and R.sup.2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R.sup.1 and R.sup.2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R.sup.1 and R.sup.2 bond. ##STR00001##