C08G2261/1422

Dihetero amines in electrically conductive polymer compositions
11121324 · 2021-09-14 · ·

Disclosed are electrically conductive polymer compositions, and their use in organic electronic devices. The electrically conductive polymer compositions include an intrinsically electrically conductive polymer having Formula II: ##STR00001## where Q, R, R′, R″, m, n, and o are defined in the present disclosure.

CHARGE TRANSPORTING COMPOSITION

Provided is a charge transporting composition that gives a charge transporting thin film having high transparency and excellent flatness. Also provided is an organic EL device that exhibits excellent characteristics.

A charge transporting thin film prepared using a composition containing a polythiophene compound, metal oxide nanoparticles, a nonionic fluorine-containing surfactant and an organic solvent has high transparency and excellent flatness, and use of the charge transporting thin film as a hole injection layer allows an organic EL device having excellent characteristics to be obtained.

Metalloporphyrin 2D-sheets for efficient photo- and electro- catalytic splitting of water

The present invention disclosed a novel squaraine linked metalloporphyrin based 2D sheet polymer catalyst of formula (I), process for preparation thereof and use of said catalyst for efficient photo- and electro-catalytic splitting of water. ##STR00001##

High etch resistance spin-on carbon hard mask composition and patterning method using same

Provided is a hard mask composition having high etching resistance suitable for use in a semiconductor lithography process, and particularly to a spin-on hard mask composition including a dibenzo carbazole polymer and to a patterning method of forming a hard mask layer by applying the composition on an etching layer through spin coating and performing a baking process. The hard mask according to the present invention has effects of exhibiting high solubility and superior mechanical properties, as well as high etching resistance to withstand multiple etching processes.

COATING-TYPE COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, POLYMER, AND METHOD FOR MANUFACTURING POLYMER

The present invention provides a. coating-type composition for forming an. organic film containing: a polymer having a structure shown by the following general formula (1) as a partial structure; and an organic solvent, where in the formula (1), ring structures Ar1 and Ar2 represent a benzene rive or a naphthalene ring optionally having a substituent, and W.sub.1 represents an aryl croup having 6 to 30 carbon atoms and optionally having a substituent. This provides a coating-type composition for forming an organic film that can. form an organic film having high pattern-curving resistance and high dry-etching resistance, the composition being excellent in solvent solubility and having a low generation of defects.

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PREPARATION METHOD OF POLYMER

The present application can provide a preparation method that can effectively produce a polymer having desired molecular weight characteristics and solubility in a solvent, and having a monomer composition, which is designed freely and variously according to the purpose, without unnecessary components with excellent polymerization efficiency and conversion rates, and a dispersion comprising the polymer formed by the preparation method.

COMPOSITION, PATTERN-FORMING METHOD, AND COMPOUND-PRODUCING METHOD

A composition that enables a resist underlayer film to be formed, contains: a compound having at least one partial structure represented by formula (1); and a solvent. In the formula (1), for example, Ar.sup.1 represents a group obtained by removing (p+1) hydrogen atoms on an aromatic carbon ring from a substituted or unsubstituted arene having 6 to 30 ring atoms, or a group obtained by removing (p+1) hydrogen atoms on an aromatic heteroring from a substituted or unsubstituted heteroarene having 5 to 30 ring atoms; Ar.sup.2 represents a substituted or unsubstituted aryl group having 6 to 30 ring atoms, or a substituted or unsubstituted heteroaryl group having 5 to 30 ring atoms, and R.sup.2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and R.sup.3 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group.

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POLYIMIDE-POLYARYLENE POLYMERS

Disclosed is a bis-imide compound comprising two or more aryl moieties substituted with ethynyl moieties and the two or more aryl moieties each having one or more polar substituents. Further disclosed is a polymer composition comprising a copolymer polymerized from a monomer mixture of (a) one or more first monomers comprising a bis-imide compound comprising two or more aryl moieties substituted with ethynyl moieties and the two or more aryl moieties each having one or more polar substituents; and (b) one or more second monomers comprising two or more cyclopentadienone moieties. The polymer compositions exhibit favorable properties for use in electronics and displays applications.

TUNABLE REFRACTIVE INDEX POLYMERS

Disclosed is a coating comprising a polymeric layer, wherein the polymeric layer comprises a reaction product of a first monomer comprising two or more aromatic acetylene groups and a second monomer comprising two or more cyclopentadienone groups, or a cured product of the reaction product. The coating may or may not additionally contain a crosslinker and/or a thermal acid generator. Optical thin films made from the coatings exhibit refractive indices that make them useful as interlayers for matching refractive indices between adjacent layers of display devices; thereby improving device output efficiency.

Functional Bottlebrush Polymers
20210130525 · 2021-05-06 ·

An example of a bottlebrush polymer has a polymer backbone and a plurality of individual brush moieties bonded to the polymer backbone. The individual brush moieties include a ketone, a hydrophilic segment, and a surface adhesive terminal group. The brush moieties can be functionalized and/or cross-linked.