Provided is a composition for shrinking a photoresist pattern, which is capable of shrinking a photoresist pattern using a photoresist during the fabrication of a semiconductor, and to a method of shrinking a pattern using the composition, whereby a pattern to be formed can be shrunken in a photoresist-patterning process, thus remarkably decreasing the number of steps of a semiconductor fabrication process and reducing the fabrication time and costs.

Hard surface, in particular glass, cleaners having an ease in wipe-out while providing good cleaning with a streak-free, glossy shine are described. The cleaner includes at least one fluorosurfactant including a fluorinated functional group with 2 to 6 carbon atoms, and a hydrophilic moiety; at least one non-fluorinated surfactant; a combination of solvents; a combination of cleaning agents; and water.

Provided is a cleaning composition contained in an aerosol spray can, methods of making and using the cleaning composition, which comprises: a liquid cleaning mixture, comprising: a) a solvent selected from the group consisting of isohexane, isoheptane, and n-heptane and mixtures thereof; b) a de-aromatized hydrocarbon solvent having 7 to 8 carbon atoms in its molecule; c) a branched aliphatic alkane having 10 to 11 carbon atoms; d) from 5 to 15 parts by weight of ethanol, e) from 1 to 15 parts by weight of isopropanol, f) from 1 to 10 parts by weight of acetone, and g) from 0.01 to 0.2 parts by weight of iso-tridecanol polyoxyethylene ether having a HLB value of 12 to 13, and a gas propellant.

An aqueous cleaning composition comprising: a) from 0.01 to 0.5% by weight of the composition of a controlled-emulsification system having a turbidity of less than 500, as measured in a homogenized aqueous solution comprising 0.003% by weight of the solution of canola oil and 0.5% by weight of the solution of the controlled-emulsification system; b) a shine polymer comprising at least one monomer comprising a substantially planar 5-7 membered ring, said monomer preferably being selected from the group consisting of vinylpyrrolidone, vinylimidazoline, maleimide, styrene sulfonate and vinylcaprolactam; and c) optionally an antimicrobial agent.

The present invention comprises a hard surface cleaning composition including an environmentally friendly alkyl amide solvent, derived from renewable bio-based resources that works at least as well as d-limonene. In one embodiment, the present invention is a cleaning composition including an anionic surfactant salt, a saturated C.sub.8 to C.sub.10 alkyl amide solvent, a cosolvent and water. The composition is substantially free of d-limonene and can remove red food soils with up to 20 percent protein, and also functions as an asphalt removal composition.

A cleaner composition consisting essentially of (A) 90.0-99.9 wt % of an organic solvent and (B) 0.1-10.0 wt % of a C.sub.3-C.sub.6 alcohol, and containing (C) 20-300 ppm of sodium and/or potassium is effective for cleaning a surface of a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.

The present invention relates to fabric enhancer compositions as well as the methods of making and using same. Such fabric enhancer compositions comprise a quaternary ammonium ester fabric softening active, a branched, ethoxylated nonionic surfactant and perfume. Such fabric enhancer compositions exhibit improved freeze-thaw stability while also delivering the softening benefits that are desired by consumers.

A hand sanitizing composition including one or more alcohols, a solubilizer, water, and unsaponifiable oil fractions of fatty triglyceride oils. The unsaponifiable oil fractions of fatty triglyceride oils may include a combination of any of the following: squalane, squalene, glycolipids, and phytosterols.

The present disclosure relates to cleaning compositions in general, and cleaning compositions that are well suited for use by individuals, who experience adverse health effects that may occur upon exposure to certain chemicals. This condition, characterized as multiple chemical sensitivities (MCS), makes it virtually impossible for certain individuals to use commercially available cleaning products without inducing immunological responses. The disclosure presents and describes protocols for the formulation and evaluation of a variety of cleaning products and dilutable cleaning product concentrates using a combination of .sup.14C assay, head space analysis and screening of both ingredients and final products for governmentally-regulated materials. The methods and compositions newly presented herein avoid causing adverse health responses in individuals and are suitable for use by any person, particularly individuals who experience MCS.

Surfactant mixture comprising (i) 50%-99% C1 comprising for 100% of its weight: (a) 65%-90% of a compound R1-C(O)NHCH(COOH)(CH2CH2)-COOH, R1 represents C7-C17, (b) 10%-35% of a compound R1-C(O)OH (ii) 1%-50% C2 comprising for 100% of its weight: (c) 37.5%-100% R3-O-(G3)p-H, R3 represents C12-C16, G3 represents the residue of a reducing sugar, 1.05p5, (d) 0%-37.5% of an alcohol R3-OH, (e) 0%-12.5% of R4-O-(G4)q-H, R4 represents C4-C7, G4 represents the residue of a reducing sugar, 1.05q5, (f) 0%-12.5% of an alcohol R4-OH. Use of the surfactant mixture as constituent of a fire-fighting foam liquid. Method for extinguishing a fire.