Disclosed are exemplary antimicrobial emulsions having hydrophobic and/or hydrophilic antimicrobial agents, surfactants, solubilizing agents, metal chelators and optionally thickening agents. The emulsions have a small particle size and high zeta potential. The emulsions are effective in cleaning, sanitizing, and disinfecting surfaces and are effective in killing a variety of organisms. The emulsions are stable and have a long shelf life. Other example materials are also disclosed.

The invention involves liquid cleaning compositions that are cocamide DEA free. According to the invention, nonionic surfactants can be used as rheology modifiers in combination with various coupling agents to provide an environmentally friendly alternative for traditional liquid cleaning compositions that rely on cocamide DEA thickening agents.

A detergent emulsifier for laundry and other hard surface cleaning using an APE-free surfactant blend is disclosed. The emulsifier system is efficacious for removal of oily soils and greasy food removal. The compositions according to the invention include linear and branched fatty alcohol ethoxylates and ethoxylate propoxylate block copolymers. Methods of using the same are disclosed.

A decontamination composition with at least one primary neutralizing agent and at least one secondary neutralizing agent, for the removal of chemical residues, to a method for employing the composition, and the use of the composition for removing residues on materials, machines, and equipment soiled with chemicals of any type, such as a corrosive product or a chemical containing fluoride ions.

A stripper composition and a cleaning method are provided. The stripper composition includes an amine-based compound (A), a fatty acid (B) and a solvent (C). Based on a total usage amount of 100 wt % of the stripper composition, a usage amount of water is 1 wt % or less.

The present disclosure provides a sulfate-free detergent composition comprising surfactants and co-surfactants or co-solvents with improved cold temperature stability while maintaining mildness and cleaning performance. The detergent composition has a Zein score of not more than about 2% dissolved zein when tested on a 10% dilution.

A composition for cleaning a microelectronic device substrate is provided. The composition is useful for cleaning in-process microelectronic device substrates possessing exposed cobalt, molybdenum, copper, molybdenum, tungsten, and dielectric surfaces. Also provided is a method for cleaning such devices and a kit comprising one or more of the components of the composition.

A cleaning composition for an oral appliance, including (A) and (B). (A) 0.05 mass % or more and 8 mass % or less of an anionic homopolymer or copolymer which has a mass average molecular weight of 2,000 or higher and 500,000 or lower and includes a constituent unit derived from (a1) an anionic monomer having a carboxyl group, a sulfo group, or a phosphoric acid group. (B) one or more surfactants selected from the group consisting of an anionic surfactant, a nonionic surfactant, and an amphoteric surfactant.